Patents by Inventor David D. Wang

David D. Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Replicating a nanoscale pattern
    Patent number: 6375870
    Abstract: A method of replicating a nanoscale pattern which comprises forming the pattern on the outer surface of a cylindrical roller, providing a surface upon which the pattern is to be replicated, and transferring the nanoscale pattern from the cylindrical roller onto the surface to provide at least one replication of the pattern on that surface. The roller is adapted to carry the pattern on its outer surface and transfer the pattern to a substrate. The ultimate product may be a grating polarizer.
    Type: Grant
    Filed: November 17, 1999
    Date of Patent: April 23, 2002
    Assignee: Corning Incorporated
    Inventors: Nick J. Visovsky, David D. Wang