Patents by Inventor David Daniel Bernhard

David Daniel Bernhard has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PHOTORESIST REMOVAL
    Publication number: 20120302483
    Abstract: Disclosed herein is a composition and method for semiconductor processing. In one embodiment, a wet-cleaning composition for removal of photoresist is provided. The composition comprises a strong base; an oxidant; and a polar solvent. In another embodiment, a method for removing photoresist is provided. The method comprises the steps of applying a wet-cleaning composition comprising about 0.1 to about 30 weight percent strong base; about one to about 30 weight percent oxidant; about 20 to about 95 weight percent polar solvent; and removing the photoresist.
    Type: Application
    Filed: August 7, 2012
    Publication date: November 29, 2012
    Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.
    Inventors: David W. Minsek, Melissa K. Rath, David Daniel Bernhard, Thomas H. Baum
  • Photoresist removal
    Patent number: 8236485
    Abstract: Disclosed herein is a composition and method for semiconductor processing. In one embodiment, a wet-cleaning composition for removal of photoresist is provided. The composition comprises a strong base; an oxidant; and a polar solvent. In another embodiment, a method for removing photoresist is provided. The method comprises the steps of applying a wet-cleaning composition comprising about 0.1 to about 30 weight percent strong base; about one to about 30 weight percent oxidant; about 20 to about 95 weight percent polar solvent; and removing the photoresist.
    Type: Grant
    Filed: March 14, 2003
    Date of Patent: August 7, 2012
    Assignee: Advanced Technology Materials, Inc.
    Inventors: David W. Minsek, Melissa K. Murphy, David Daniel Bernhard, Thomas H. Baum
  • Mixture composition and method useful for topical and internal application
    Patent number: 7678393
    Abstract: A mixture composition useful in wound healing comprising solvent extraction of anthrocyanin/proanthrocyanidin sources, ascorbic acid source, tannin or gallic acid source or polymeric gallic acid source, microbe source, protein source, fat source, acidification agent or buffer and sulfur absorbing compound.
    Type: Grant
    Filed: April 23, 2007
    Date of Patent: March 16, 2010
    Assignee: DB Laboratories LLC
    Inventors: Bradford Ray Duncan, David Daniel Bernhard
  • Photoresist removal
    Publication number: 20040180300
    Abstract: Disclosed herein is a composition and method for semiconductor processing. In one embodiment, a wet-cleaning composition for removal of photoresist is provided. The composition comprises a strong base; an oxidant; and a polar solvent. In another embodiment, a method for removing photoresist is provided. The method comprises the steps of applying a wet-cleaning composition comprising about 0.1 to about 30 weight percent strong base; about one to about 30 weight percent oxidant; about 20 to about 95 weight percent polar solvent; and removing the photoresist.
    Type: Application
    Filed: March 14, 2003
    Publication date: September 16, 2004
    Inventors: David W. Minsek, Melissa K. Murphy, David Daniel Bernhard, Thomas H. Baum
  • Chemical method for removal and analysis of boron impurities in tetraethylorthosilicate (TEOS)
    Patent number: 6458984
    Abstract: A method of purifying tetraethylorthosilicate (TEOS) to remove boron impurities therefrom, and a related method of analyzing TEOS to determine concentration of boron impurities therein.
    Type: Grant
    Filed: March 31, 2000
    Date of Patent: October 1, 2002
    Assignee: Advanced Technology Materials, Inc.
    Inventors: Thomas H. Baum, Chongying Xu, Frank R. Hedges, David Daniel Bernhard, Brian L. Benac, Scott L. Battle, John M. Lansdown