Patents by Inventor David Debruyne

David Debruyne has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20260002251
    Abstract: A target for sputtering in mid-frequency AC sputtering processes, or DC sputtering processes includes a target material layer mainly including M-doped LixPOy, wherein x is from 2.5 to 3.5 and wherein y is from 2.5 to 4.5, wherein M represents up to 40 wt. % of the target material layer, and wherein M is least one chemical element from groups 13 to 15 of the periodic table, wherein M is selected for providing electrical conductivity to the target material layer such that an electrical resistivity of the target material layer is at most 1000 ?·cm at room temperature, and wherein the target material layer has a lamellar structure consisting of microscopic splats of material.
    Type: Application
    Filed: September 1, 2023
    Publication date: January 1, 2026
    Inventors: Ignacio CARETTI GIANGASPRO, David DEBRUYNE, Freddy FACK, Wilmert DE BOSSCHER
  • Patent number: 12359304
    Abstract: A target for sputtering, use of the target and method of manufacture of the target is provided. The target has a single piece target material for sputter deposition, with at least 1 mm thickness of material for sputtering, having a lamellar structure and comprising a metal oxide with at least 50 wt. % or more of tungsten oxide. The atomic ratio of oxygen over tungsten results in a compound with oxygen deficiency with respect to the stoichiometric tungsten oxide. The method includes spraying metallic tungsten and/or tungsten oxide powder in amounts so as to provide a layer of material for sputtering being at least 1 mm thick and comprising non-stoichiometric tungsten oxide.
    Type: Grant
    Filed: March 4, 2022
    Date of Patent: July 15, 2025
    Assignee: SOLERAS ADVANCED COATINGS BV
    Inventors: Ignacio Caretti Giangaspro, David Debruyne, Freddy Fack, Wilmert De Bosscher
  • Patent number: 12091715
    Abstract: Methods and compositions for making DNA libraries for massive parallel next generation sequencing (NGS), comprises two parts. These methods may be referred to as Triseq sequencing. The first part includes ligating a UMI adapter, amplifying the DNA fragments in the presence of dUTP, enriching the target molecules through primer extension by using a panel of both forward and reverse primers, and removing the dU-containing template DNA. The DNA molecules are organized to primary clones and subclones, labeled by the UMI on 5? and 3? end of the DNA fragments, respectively. The second part includes sequencing the DNA library by NGS, deducing consensus sequence from each subclone, and from within each primary clone, and between the consensus sequences obtained from both forward and reverse primers.
    Type: Grant
    Filed: March 8, 2023
    Date of Patent: September 17, 2024
    Assignee: Paragon Genomics, Inc.
    Inventors: Zhitong Liu, David Debruyne, Jack Dong, Michael Clark, Yutao Fu, Vidushi Kapoor, Kalyani Patankar, Fang Xie, Logan Tom
  • Publication number: 20240229226
    Abstract: A target for sputtering, use of the target and method of manufacture of the target is provided. The target has a single piece target material for sputter deposition, with at least 1 mm thickness of material for sputtering, having a lamellar structure and comprising a metal oxide with at least 50 wt. % or more of tungsten oxide. The atomic ratio of oxygen over tungsten results in a compound with oxygen deficiency with respect to the stoichiometric tungsten oxide. The method includes spraying metallic tungsten and/or tungsten oxide powder in amounts so as to provide a layer of material for sputtering being at least 1 mm thick and comprising non-stoichiometric tungsten oxide.
    Type: Application
    Filed: March 4, 2022
    Publication date: July 11, 2024
    Inventors: Ignacio CARETTI GIANGASPRO, David DEBRUYNE, Freddy FACK, Wilmert DE BOSSCHER
  • Publication number: 20240133024
    Abstract: A target for sputtering, use of the target and method of manufacture of the target is provided. The target has a single piece target material for sputter deposition, with at least 1 mm thickness of material for sputtering, having a lamellar structure and comprising a metal oxide with at least 50 wt. % or more of tungsten oxide. The atomic ratio of oxygen over tungsten results in a compound with oxygen deficiency with respect to the stoichiometric tungsten oxide. The method includes spraying metallic tungsten and/or tungsten oxide powder in amounts so as to provide a layer of material for sputtering being at least 1 mm thick and comprising non-stoichiometric tungsten oxide.
    Type: Application
    Filed: March 4, 2022
    Publication date: April 25, 2024
    Inventors: Ignacio CARETTI GIANGASPRO, David DEBRUYNE, Freddy FACK, Wilmert DE BOSSCHER
  • Publication number: 20230340588
    Abstract: Methods and compositions for making DNA libraries for massive parallel next generation sequencing (NGS), comprises two parts. These methods may be referred to as Triseq sequencing. The first part includes ligating a UMI adapter, amplifying the DNA fragments in the presence of dUTP, enriching the target molecules through primer extension by using a panel of both forward and reverse primers, and removing the dU-containing template DNA. The DNA molecules are organized to primary clones and subclones, labeled by the UMI on 5? and 3? end of the DNA fragments, respectively. The second part includes sequencing the DNA library by NGS, deducing consensus sequence from each subclone, and from within each primary clone, and between the consensus sequences obtained from both forward and reverse primers.
    Type: Application
    Filed: March 8, 2023
    Publication date: October 26, 2023
    Inventors: Zhitong LIU, David DEBRUYNE, Jack DONG, Michael CLARK, Yutao FU, Vidushi KAPOOR, Kalyani PATANKAR, Fang XIE, Logan TOM
  • Patent number: 11680293
    Abstract: Methods, apparatuses and compositions for generating highly sensitive and accurate sequencing results of massive parallel sequencing (NGS). The methods and compositions may be referred to as SubDivision-Seq, and may comprise two parts. The first part includes making a target-enriched DNA library, organizing the UMIs on DNA molecules to form primary clones and subdividing the primary clones into subclones. The second part includes sequencing the DNA library by NGS, deducing consensus sequence from each subclone, then deducing consensus sequence in each primary clone.
    Type: Grant
    Filed: April 21, 2022
    Date of Patent: June 20, 2023
    Assignee: Paragon Genomics, Inc.
    Inventors: Zhitong Liu, David Debruyne, Jack Dong, Michael Clark, Yutao Fu, Chenyu Li, Vidushi Kapoor, Kalyani Patankar
  • Publication number: 20210363517
    Abstract: High throughput methods and compositions (e.g., kits) for the amplification of RNA fragments, including in particular, for the detection of fusion mutations in a high volume of samples, e.g., by high throughput sequencing method. These methods may include barcoding cDNA preparations with template switching reactions, indexing pools of libraries and intensive use of automatic liquid handling, and providing a ready-to-sequence library mix.
    Type: Application
    Filed: March 8, 2021
    Publication date: November 25, 2021
    Inventors: Zhitong LIU, Chenyu LI, David DEBRUYNE, Guoying LIU, Julia SPENCER, Lucie LEE
  • Publication number: 20210180051
    Abstract: Methods, compositions and systems to amplify targets from RNA samples. The methods comprise designing target-specific primers, converting RNA into cDNA by reverse transcription, adding a universal primer by using template switching, and amplifying the targets by using multiplex PCR. The methods, compositions and systems described herein may further include, or include the use of, next generation sequencing (NGS) to analyze the sequences and various mutations of the amplified targets.
    Type: Application
    Filed: December 16, 2019
    Publication date: June 17, 2021
    Inventors: Zhitong LIU, Chenyu LI, David DEBRUYNE, Julia SPENCER
  • Patent number: 10941453
    Abstract: Laboratory-based high throughput methods and compositions (e.g., kits) for the detection of pathogen mRNA, including in particular, for the detection of SARS-CoV-2 RNA from up to 85,000 samples in one Illumina NovaSeq sequencing run. These methods may include barcoding cDNA, indexing pools of libraries and intensive use of automatic liquid handling, providing a ready-to-sequence library mix. These methods and compositions may allow a very inexpensive per sample cost and an assay that may be performed in about one day or less.
    Type: Grant
    Filed: May 20, 2020
    Date of Patent: March 9, 2021
    Assignee: Paragon Genomics, Inc.
    Inventors: Zhitong Liu, Chenyu Li, David Debruyne, Guoying Liu