Patents by Inventor David E. Bugay

David E. Bugay has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method for matching diffraction patterns
    Patent number: 7715527
    Abstract: A method of analyzing patterns. The method comprises: receiving a first diffraction pattern; receiving a second diffraction pattern; receiving a third diffraction pattern; determining a similarity between the first and second diffraction patterns; determining a similarity between the first and third diffraction pattern; determining a similarity between the second and third diffraction pattern; and performing hierarchical cluster analysis on the first and second diffraction pattern based on the determined similarity.
    Type: Grant
    Filed: November 6, 2007
    Date of Patent: May 11, 2010
    Assignee: Aptuit (Kansas City), LLC
    Inventors: Igor Ivanisevic, Simon Bates, David E. Bugay, Barbara C. Stahly, Donald R. Hallenbeck
  • System and Method for Matching Diffraction Patterns
    Publication number: 20080120051
    Abstract: A method of analyzing patterns. The method comprises: receiving a first diffraction pattern; receiving a second diffraction pattern; receiving a third diffraction pattern; determining a similarity between the first and second diffraction patterns; determining a similarity between the first and third diffraction pattern; determining a similarity between the second and third diffraction pattern; and performing hierarchical cluster analysis on the first and second diffraction pattern based on the determined similarity.
    Type: Application
    Filed: November 6, 2007
    Publication date: May 22, 2008
    Inventors: Igor IVANISEVIC, Simon Bates, David E. Bugay, Barbara C. Stahly, Donald R. Hallenbeck
  • System and method for matching diffraction patterns
    Patent number: 7372941
    Abstract: A method of analyzing patterns. The method comprises: receiving a first diffraction pattern; receiving a second diffraction pattern; receiving a third diffraction pattern; determining a similarity between the first and second diffraction patterns; determining a similarity between the first and third diffraction pattern; determining a similarity between the second and third diffraction pattern; and performing hierarchical cluster analysis on the first and second diffraction pattern based on the determined similarity.
    Type: Grant
    Filed: August 6, 2003
    Date of Patent: May 13, 2008
    Assignee: SSCI, Inc.
    Inventors: Igor Ivanisevic, Simon Bates, David E. Bugay, Barbara C. Stahly, Donald R. Hallenbeck
  • System and method for matching diffraction patterns
    Publication number: 20040103130
    Abstract: A method of analyzing patterns. The method comprises: receiving a first diffraction pattern; receiving a second diffraction pattern; receiving a third diffraction pattern; determining a similarity between the first and second diffraction patterns; determining a similarity between the first and third diffraction pattern; determining a similarity between the second and third diffraction pattern; and performing hierarchical cluster analysis on the first and second diffraction pattern based on the determined similarity.
    Type: Application
    Filed: August 6, 2003
    Publication date: May 27, 2004
    Inventors: Igor Ivanisevic, Simon Bates, David E. Bugay, Barbara C. Stahly, Donald R. Hallenbeck