Patents by Inventor David E. Gutierrez

David E. Gutierrez has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus for etching high aspect ratio features
    Patent number: 8475625
    Abstract: Embodiments of the invention provide a method and apparatus, such as a processing chamber, suitable for etching high aspect ratio features. Other embodiments include a showerhead assembly for use in the processing chamber. In one embodiment, a processing chamber includes a chamber body having a showerhead assembly and substrate support disposed therein. The showerhead assembly includes at least two fluidly isolated plenums, a region transmissive to an optical metrology signal, and a plurality of gas passages formed through the showerhead assembly fluidly coupling the plenums to the interior volume of the chamber body.
    Type: Grant
    Filed: May 3, 2006
    Date of Patent: July 2, 2013
    Assignee: Applied Materials, Inc.
    Inventors: Sharma Pamarthy, Huutri Dao, Xiaoping Zhou, Kelly A. McDonough, Jivko Dinev, Farid Abooameri, David E. Gutierrez, Jim Zhongyi He, Robert S. Clark, Dennis M. Koosau, Jeffrey William Dietz, Declan Scanlan, Subhash Deshmukh, John P. Holland, Alexander Paterson