Patents by Inventor David E. Noga

David E. Noga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9815941
    Abstract: Techniques and mechanisms to reduce toxicity in manufacturing of a polyamideimide and polyamide amic acid resin polymer. In an embodiment, a polyamideimide is produced using at least one aprotic dialkylamide solvent and at least one co-solvent. In another embodiment, the at least one co-solvent is selected from the group consisting of methyl actetate, n-propyl acetate, t-butyl acetate, iso-butyl acetate, ethyl acetate, isopropyl acetate, methyl lactate, ethyl lactate, n-propyl lactate, isopropyl lactate, n-butyl lactate, isobutyl lactate, t-butyl lactate, cyclohexanone, cyclopentanone, n-butyl acetate, methyl alcohol, ethyl alcohol, isopropyl alcohol, n-acetyl morpholine, ?-caprolactone and methylcyclohexane.
    Type: Grant
    Filed: April 15, 2015
    Date of Patent: November 14, 2017
    Assignee: CYMER-DAYTON, LLC
    Inventors: Carissa M. Kelly, David E. Noga, John E. Sidenstick, Limor Ben-Asher, Atuso Kondo
  • Patent number: 9725617
    Abstract: A polyamideimide and polyamide amic acid resin polymer that allows for reduced levels of toxicity in manufacturing. In an embodiment, a coating composition comprises at least one polyamideimide resin, at least one aprotic dialkylamide solvent and at least one co-solvent. In another embodiment, the at least one co-solvent is selected from a group consisting of methyl acetate, n-propyl acetate, t-butyl acetate, iso-butyl acetate, ethyl acetate, isopropyl acetate, methyl lactate, ethyl lactate, n-propyl lactate, isopropyl lactate, n-butyl lactate, isobutyl lactate, t-butyl lactate, cyclohexanone, cyclopentanone, n-butyl acetate, methyl alcohol, ethyl alcohol, isopropyl alcohol, n-acetyl morpholine, ?-caprolactone and methylcyclohexane.
    Type: Grant
    Filed: April 15, 2015
    Date of Patent: August 8, 2017
    Assignee: FUJIFILM Hunt Chemicals U.S.A., Inc.
    Inventors: Carissa M. Kelly, David E. Noga, John E. Sidenstick, Limor Ben-Asher, Atsuo Kondo
  • Publication number: 20150299393
    Abstract: Techniques and mechanisms to reduce toxicity in manufacturing of a polyamideimide and polyamide amic acid resin polymer. In an embodiment, a polyamideimide is produced using at least one aprotic dialkylamide solvent and at least one co-solvent. In another embodiment, the at least one co-solvent is selected from the group consisting of methyl actetate, n-propyl acetate, t-butyl acetate, iso-butyl acetate, ethyl acetate, isopropyl acetate, methyl lactate, ethyl lactate, n-propyl lactate, isopropyl lactate, n-butyl lactate, isobutyl lactate, t-butyl lactate, cyclohexanone, cyclopentanone, n-butyl acetate, methyl alcohol, ethyl alcohol, isopropyl alcohol, n-acetyl morpholine, ?-caprolactone and methylcyclohexane.
    Type: Application
    Filed: April 15, 2015
    Publication date: October 22, 2015
    Inventors: Carissa M. Kelly, David E. Noga, John E. Sidenstick, Limor Ben-Asher, Atsuo Kondo
  • Publication number: 20150299513
    Abstract: A polyamideimide and polyamide amic acid resin polymer that allows for reduced levels of toxicity in manufacturing. In an embodiment, a coating composition comprises at least one polyamideimide resin, at least one aprotic dialkylamide solvent and at least one co-solvent. In another embodiment, the at least one co-solvent is selected from a group consisting of methyl actetate, n-propyl acetate, t-butyl acetate, iso-butyl acetate, ethyl acetate, isopropyl acetate, methyl lactate, ethyl lactate, n-propyl lactate, isopropyl lactate, n-butyl lactate, isobutyl lactate, t-butyl lactate, cyclohexanone, cyclopentanone, n-butyl acetate, methyl alcohol, ethyl alcohol, isopropyl alcohol, n-acetyl morpholine, ?-caprolactone and methylcyclohexane.
    Type: Application
    Filed: April 15, 2015
    Publication date: October 22, 2015
    Inventors: Carissa M. Kelly, David E. Noga, John E. Sidenstick, Limor Ben-Asher, Atsuo Kondo