Abstract: An information handling system may include at least one processor, and an information handling resource communicatively coupled to the at least one processor. The information handling system may be configured to cause the information handling resource to enter a low-power state, and further configured to cause the information handling resource to enter a full-power state. The information handling system may also be configured to cause at least one communication link of the information handling resource to remain inactive until detection of a specified event.

Abstract: An information handling system may include at least one processor, and an information handling resource communicatively coupled to the at least one processor. The information handling system may be configured to cause the information handling resource to enter a low-power state, and further configured to cause the information handling resource to enter a full-power state. The information handling system may also be configured to cause at least one communication link of the information handling resource to remain inactive until detection of a specified event.

Abstract: An ion source is capable of generating and/or emitting an ion beam which may be used to deposit a layer on a substrate or to perform other functions. In certain example embodiments, techniques for reducing the costs associated with producing ion sources and/or elements thereof are provided. Such techniques may include, for example, forming the inner and/or outer cathode(s) from 1018 mild steel and/or segmented pieces. Such techniques also or instead include, for example, forming the ion source body from a single steel U-channel, or from segmented pieces making up the same. These techniques may be used alone or in various combinations.

Abstract: An ion source is provided which is capable of generating and/or emitting an ion beam which may be used to deposit a layer on a substrate or to perform other functions. In certain example embodiments, a magnet yoke assembly used in the ion source is provided, and the magnet yoke assembly includes a lower yoke and an upper yoke. At least one magnet is disposed between the lower yoke and the upper yoke, with the at least one magnet having a substantially rectangular shape in certain example embodiments. The at least one magnet may be adhered to the lower yoke and/or the upper yoke.

Abstract: An ion source is capable of generating and/or emitting an ion beam which may be used to deposit a layer on a substrate or to perform other functions. In certain example embodiments, techniques for reducing the costs associated with producing ion sources and/or elements thereof are provided. Such techniques may include, for example, forming the inner and/or outer cathode(s) from 1018 mild steel and/or segmented pieces. Such techniques also or instead include, for example, forming the ion source body from a single steel U-channel, or from segmented pieces making up the same. These techniques may be used alone or in various combinations.

Abstract: An ion source is provided which is capable of generating and/or emitting an ion beam which may be used to deposit a layer on a substrate or to perform other functions. In certain example embodiments, a magnet yoke assembly used in the ion source is provided, and the magnet yoke assembly includes a lower yoke and an upper yoke. At least one magnet is disposed between the lower yoke and the upper yoke, with the at least one magnet having a substantially rectangular shape in certain example embodiments. The at least one magnet may be adhered to the lower yoke and/or the upper yoke.