Abstract: A method is described of treating a gas stream exhausted from an atomic layer deposition (ALD) process chamber to which two or more gaseous precursors are alternately supplied. Between the process chamber and a vacuum pump used to draw the gas stream from the chamber, the gas stream is conveyed to a gas mixing chamber, to which a reactant is supplied for reacting with one of the gaseous precursors to form solid material. The gas stream is then conveyed to a cyclone separator to separate solid material from the gas stream. By deliberately reacting a non-reacted precursor to form solid material upstream from the pump, reaction within the pump of the non-reacted precursor and a second non-reacted precursor subsequently drawn from the chamber by the pump can be inhibited.

Abstract: A trap device (18) for removing species from a gas stream drawn from an enclosure by a vacuum pump is described, the device (18) comprising a casing having an inlet (16) for receiving the gas stream, an outlet (20) for exhausting the gas stream from the casing, and first and second chambers (136, 138) each for receiving the gas stream from the inlet and conveying the gas stream to the outlet; means (170, 174) for selectively diverting the gas stream from the inlet to a selected one of the chambers; a first plurality of cartridges (32) each being removably insertable into the casing to provide a plurality of flow passages for gas passing through the first chamber; and a second plurality of cartridges (132) each being removably insertable into the casing to provide a plurality of flow passages for gas passing through the second chamber, each flow passage extending between an inlet and an outlet of a respective cartridge, each cartridge housing means for removing species from the gas passing therethrough as soli

Abstract: A method is described of treating a gas stream exhausted from an atomic layer deposition (ALD) process chamber to which two or more gaseous precursors are alternately supplied. Between the process chamber and a vacuum pump used to draw the gas stream from the chamber, the gas stream is conveyed to a gas mixing chamber, to which a reactant is supplied for reacting with one of the gaseous precursors to form solid material. The gas stream is then conveyed to a cyclone separator to separate solid material from the gas stream. By deliberately reacting a non-reacted precursor to form solid material upstream from the pump, reaction within the pump of the non-reacted precursor and a second non-reacted precursor subsequently drawn from the chamber by the pump can be inhibited.

Abstract: A trap device (18) is described for removing species from a gas stream drawn from an enclosure by a vacuum pump. The trap comprises a casing (28) having an inlet (16) connectable to the enclosure for receiving the gas stream therefrom and an outlet (20) connectable to the vacuum pump for exhausting the gas stream from the casing. A plurality of cartridges are each removably insertable into the casing through a respective aperture (36) of the casing (28) and provide a respective flow passage between an inlet and an outlet thereof for gas passing through the casing, each cartridge housing means for removing species from the gas passing therethrough as solid material collecting within the cartridge.

Abstract: A trap device (18) for removing species from a gas stream drawn from an enclosure by a vacuum pump is described, the device (18) comprising a casing having an inlet (16) for receiving the gas stream, an outlet (20) for exhausting the gas stream from the casing, and first and second chambers (136, 138) each for receiving the gas stream from the inlet and conveying the gas stream to the outlet; means (170, 174) for selectively diverting the gas stream from the inlet to a selected one of the chambers; a first plurality of cartridges (32) each being removably insertable into the casing to provide a plurality of flow passages for gas passing through the first chamber; and a second plurality of cartridges (132) each being removably insertable into the casing to provide a plurality of flow passages for gas passing through the second chamber, each flow passage extending between an inlet and an outlet of a respective cartridge, each cartridge housing means for removing species from the gas passing therethrough as soli

Abstract: A method is described of treating a gas stream exhausted from an atomic layer deposition (ALD) process chamber to which two or more gaseous precursors are alternately supplied. Between the process chamber and a vacuum pump used to draw the gas stream from the chamber, the gas stream is conveyed to a gas mixing chamber, to which a reactant is supplied for reacting with one of the gaseous precursors to form solid material. The gas stream is then conveyed to a cyclone separator to separate solid material from the gas stream. By deliberately reacting a non-reacted precursor to form solid material upstream from the pump, reaction within the pump of the non-reacted precursor and a second non-reacted precursor subsequently drawn from the chamber by the pump can be inhibited.

Abstract: A valve actuator comprises a stem extending through the actuator body for coupling to a valve such that axial movement of the stem opens and closes the valve. An outer shaft is arranged coaxially around, and in threaded engagement with the stem and is coupled to an electric motor for conveying rotational drive to the shaft and thus axial movement of the shaft relative to the stem against a spring bias. The shaft is releasably retained in a predetermined position by a solenoid-actuated latching mechanism with the spring in a compressed state, such that further rotation of the shaft causes axial movement of the stem relative to the shaft to actuate the valve. Deactuation of the mechanism releases the shaft to allow axial movement of both the shaft and the stem, under action of the spring in order to close the valve.