Patents by Inventor David F. Hurley

David F. Hurley has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and system for performing post-etch annealing of a workpiece
    Patent number: 10319905
    Abstract: A method for performing post-etch annealing of a workpiece in an annealing system is described. In particular, the method includes disposing one or more workpieces in an annealing system, each of the one or more workpieces having a multilayer stack of thin films that has been patterned using an etching process sequence to form an electronic device characterized by a cell critical dimension (CD), wherein the multilayer stack of thin films includes at least one patterned layer containing magnetic material. Thereafter, the patterned layer containing magnetic material on the one or more workpieces is annealed in the annealing system via an anneal process condition, wherein the anneal process condition is selected to adjust a property of the patterned layer containing magnetic material.
    Type: Grant
    Filed: January 12, 2015
    Date of Patent: June 11, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: David F. Hurley, Doni Parnell, Shigeru Tahara, Toru Ishii
  • METHOD AND SYSTEM FOR PERFORMING POST-ETCH ANNEALING OF A WORKPIECE
    Publication number: 20150214473
    Abstract: A method for performing post-etch annealing of a workpiece in an annealing system is described. In particular, the method includes disposing one or more workpieces in an annealing system, each of the one or more workpieces having a multilayer stack of thin films that has been patterned using an etching process sequence to form an electronic device characterized by a cell critical dimension (CD), wherein the multilayer stack of thin films includes at least one patterned layer containing magnetic material. Thereafter, the patterned layer containing magnetic material on the one or more workpieces is annealed in the annealing system via an anneal process condition, wherein the anneal process condition is selected to adjust a property of the patterned layer containing magnetic material.
    Type: Application
    Filed: January 12, 2015
    Publication date: July 30, 2015
    Inventors: David F. Hurley, Doni Parnell, Shigeru Tahara, Toru Ishii