Patents by Inventor David F. Vela
David F. Vela has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220153616Abstract: A system and method for monitoring disinfectant levels in non-human animal drinking water using ORP and optionally pH measurements and adding disinfectant or pH adjusting agents as needed. Sensors obtain measurements of the water upstream of a point of consumption and a controller compares measurements to predetermined thresholds, ranges, or previous measurements to determine if the disinfectant and optionally pH levels are within a desired range or above or below a desired minimum or a desired maximum value. A disinfectant dosing system preferably automatically adds disinfectant to the supply line based on the measurement comparison. A flow switch preferably keeps the system from activating disinfectant addition when water in the supply line is static (non-flowing). An alert is preferably triggered when a measurement indicates the disinfectant level is too low or too high or when a volume of disinfectant in the dosing system is below a predetermined volume threshold.Type: ApplicationFiled: November 16, 2021Publication date: May 19, 2022Inventors: Haibo Cao, David F. Vela, Rongxian Liang, Joshua R. Medford, Chris Zetena, Anuchit Numsri, Gabriel F.K. Everett
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Publication number: 20220128453Abstract: A system and method for monitoring or detecting a level of biofilm growth in a fluid system and controlling operating parameters of the fluid system based a measured level of growth. The monitoring system and method comprises a dye injection system for periodically injecting dye into a portion of fluid from the fluid system, passing the portion of fluid though a narrow lumen tube to achieve laminar flow and using a light source and optical sensor to detect a transmission or emission indicating a level of biofilm growth in the tube corresponding to a level of growth on components in the fluid system. Information based upon the measurements or calculations made by the monitoring system may be used to manually or automatically alter various operating parameters to control the fluid system and aid in maintaining stable operation of the fluid system within preferred specifications.Type: ApplicationFiled: January 6, 2022Publication date: April 28, 2022Inventors: David F. Vela, Adrian J. Denvir, Matthew C. Holloway
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Patent number: 10934182Abstract: A system and method for treating flowing water systems with a plasma discharge to remove or control growth of microbiological species. The system and method protect other components of the water system from being damaged by excess energy from the electrohydraulic treatment. The system and method also recycle ozone gas generated by a high voltage generator that powers the plasma discharge to further treat the water. A gas infusion system upstream of or inside a plasma reaction chamber may be used to create fine bubbles of ozone, air, or other gases in the water being treated to aid in plasma generation.Type: GrantFiled: September 22, 2017Date of Patent: March 2, 2021Assignee: NCH CorporationInventors: Adrian J. Denvir, David F. Vela, Matt C. Holloway
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Patent number: 10023478Abstract: A system and method for treating flowing water systems with a plasma discharge to remove or control growth of microbiological species. Components of the water system are protected from being damaged by excess energy from the electrohydraulic treatment. Ozone gas generated by a high voltage generator that powers the plasma discharge is recycled to further treat the water. A gas infusion system may be used to create fine bubbles of ozone, air, or other gases in the water being treated to aid in plasma generation, particularly when the conductivity of the water is high. An electrode mounting assembly maintains a high voltage electrode and ground electrode at a fixed distance from each other to optimize plasma generation. An open support structure for the high voltage generator circuit physically separates spark gap electrodes and resists metal deposits that may disrupt discharge of a high voltage pulse to create the plasma.Type: GrantFiled: January 30, 2018Date of Patent: July 17, 2018Assignee: NCH CorporationInventors: Adrian J. Denvir, David F. Vela, Matthew C. Holloway, William P. Boesch, Jose E. Evaro
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Publication number: 20180155220Abstract: A system and method for treating flowing water systems with a plasma discharge to remove or control growth of microbiological species. Components of the water system are protected from being damaged by excess energy from the electrohydraulic treatment. Ozone gas generated by a high voltage generator that powers the plasma discharge is recycled to further treat the water. A gas infusion system may be used to create fine bubbles of ozone, air, or other gases in the water being treated to aid in plasma generation, particularly when the conductivity of the water is high. An electrode mounting assembly maintains a high voltage electrode and ground electrode at a fixed distance from each other to optimize plasma generation. An open support structure for the high voltage generator circuit physically separates spark gap electrodes and resists metal deposits that may disrupt discharge of a high voltage pulse to create the plasma.Type: ApplicationFiled: January 30, 2018Publication date: June 7, 2018Inventors: Adrian J. Denvir, David F. Vela, Matthew C. Holloway, William Boesch, Jose E. Evaro
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Patent number: 9932252Abstract: A system and method for treating flowing water systems with a plasma discharge to remove or control growth of microbiological species. Components of the water system are protected from being damaged by excess energy from the electrohydraulic treatment. Ozone gas generated by a high voltage generator that powers the plasma discharge is recycled to further treat the water. A gas infusion system may be used to create fine bubbles of ozone, air, or other gases in the water being treated to aid in plasma generation, particularly when the conductivity of the water is high. An electrode mounting assembly maintains a high voltage electrode and ground electrode at a fixed distance from each other to optimize plasma generation. An open support structure for the high voltage generator circuit physically separates spark gap electrodes and resists metal deposits that may disrupt discharge of a high voltage pulse to create the plasma.Type: GrantFiled: April 24, 2015Date of Patent: April 3, 2018Assignee: NCH CorporationInventors: Adrian J. Denvir, David F. Vela, Matthew C. Holloway, William P. Boesch, Jose E. Evaro
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Publication number: 20180016163Abstract: A system and method for treating flowing water systems with a plasma discharge to remove or control growth of microbiological species. The system and method protect other components of the water system from being damaged by excess energy from the electrohydraulic treatment. The system and method also recycle ozone gas generated by a high voltage generator that powers the plasma discharge to further treat the water. A gas infusion system upstream of or inside a plasma reaction chamber may be used to create fine bubbles of ozone, air, or other gases in the water being treated to aid in plasma generation.Type: ApplicationFiled: September 22, 2017Publication date: January 18, 2018Inventors: Adrian J. Denvir, David F. Vela, Matt C. Holloway
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Patent number: 9868653Abstract: A system and method for treating flowing water systems with a plasma discharge to remove or control growth of microbiological species. The system and method protect other components of the water system from being damaged by excess energy from the electrohydraulic treatment. The system and method also recycle ozone gas generated by a high voltage generator that powers the plasma discharge to further treat the water. A gas infusion system upstream of or inside a plasma reaction chamber may be used to create fine bubbles of ozone, air, or other gases in the water being treated to aid in plasma generation.Type: GrantFiled: April 24, 2014Date of Patent: January 16, 2018Assignee: NCH CorporationInventors: Adrian J. Denvir, David F. Vela, Matt C. Holloway
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Publication number: 20170008785Abstract: A system and method of treating water systems with amoebas produced on-site to reduce biological contaminants, such as algae, bacteria and biofilms, without requiring the use of, or reducing the amount of, chemical treatments that produce harmful by-products. The system and method comprise generating an amoeba treatment solution using an on-site biogenerator and discharging the treatment solution in the water system at predetermined discharge intervals. The operating parameters of the biogenerator are monitored and controlled to maintain one or more operating conditions, such as dissolved gas levels, temperature, or pH inside a growth tank within desired ranges. An amount of amoeba starter material sufficient to supply the biogenerator for a prolonged treatment cycle, such as 30 days, is provided and stored in a temperature controlled environment near the biogenerator to maintain the viability of the amoebas prior to generating each dose of treatment solution.Type: ApplicationFiled: July 7, 2016Publication date: January 12, 2017Inventors: Adrian J. Denvir, David F. Vela, Matthew C. Holloway, Angela Hutson
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Patent number: 9452457Abstract: A composition for treating a water system to remove scale, microorganisms and biofilm, and corrosion by-products. The composition comprises chelating agents and a surfactant. Depending on the water system being treated, the composition may be a solid dissolved by water in the system being treated or may be a pre-mixed foam or aerosol. A treatment system particularly suitable for flowing water systems comprises a container for holding such a treatment composition and mixing it with a portion of water from the water system, a filter for removing solids dislodged during treatment, and a corrosion monitor. A method for using such a treatment composition comprises draining substantially all existing water in the water system, filling or rinsing the system with fresh water, contacting the treatment composition with substantially all parts of the water system, and draining the treatment composition from the system before resuming normal operations.Type: GrantFiled: January 18, 2013Date of Patent: September 27, 2016Assignee: NCH CorporationInventors: Adrian Denvir, David F Vela, Christina B Burton, Katrell D Copeland, Scott M Boyette, Robert C Pearce, III
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Publication number: 20150232353Abstract: A system and method for treating flowing water systems with a plasma discharge to remove or control growth of microbiological species. Components of the water system are protected from being damaged by excess energy from the electrohydraulic treatment. Ozone gas generated by a high voltage generator that powers the plasma discharge is recycled to further treat the water. A gas infusion system may be used to create fine bubbles of ozone, air, or other gases in the water being treated to aid in plasma generation, particularly when the conductivity of the water is high. An electrode mounting assembly maintains a high voltage electrode and ground electrode at a fixed distance from each other to optimize plasma generation. An open support structure for the high voltage generator circuit physically separates spark gap electrodes and resists metal deposits that may disrupt discharge of a high voltage pulse to create the plasma.Type: ApplicationFiled: April 24, 2015Publication date: August 20, 2015Inventors: Adrian J. Denvir, David F. Vela, Matthew C. Holloway, William P. Boesch, Jose E. Evaro
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Publication number: 20140326681Abstract: A system and method for treating flowing water systems with a plasma discharge to remove or control growth of microbiological species. The system and method protect other components of the water system from being damaged by excess energy from the electrohydraulic treatment. The system and method also recycle ozone gas generated by a high voltage generator that powers the plasma discharge to further treat the water. A gas infusion system upstream of or inside a plasma reaction chamber may be used to create fine bubbles of ozone, air, or other gases in the water being treated to aid in plasma generation.Type: ApplicationFiled: April 24, 2014Publication date: November 6, 2014Applicant: NCH CORPORATIONInventors: Adrian J. Denvir, David F. Vela, Matt M. Holloway
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Publication number: 20130239991Abstract: A composition for treating a water system to remove scale, microorganisms and biofilm, and corrosion by-products. The composition comprises chelating agents and a surfactant. Depending on the water system being treated, the composition may be a solid dissolved by water in the system being treated or may be a pre-mixed foam or aerosol. A treatment system particularly suitable for flowing water systems comprises a container for holding such a treatment composition and mixing it with a portion of water from the water system, a filter for removing solids dislodged during treatment, and a corrosion monitor. A method for using such a treatment composition comprises draining substantially all existing water in the water system, filling or rinsing the system with fresh water, contacting the treatment composition with substantially all parts of the water system, and draining the treatment composition from the system before resuming normal operations.Type: ApplicationFiled: January 18, 2013Publication date: September 19, 2013Applicant: NCH CorporationInventors: Adrian Denvir, David F. Vela, Christina B. Burton, Katrell D. Copeland, Scott M. Boyette, Robert C. Pearce, III