Abstract: A method for manufacturing hybrid optical coatings and hybrid mirror assemblies, including: a) providing a first optical coating having layers of alternating high and low refractive indices of crystalline materials on a first host substrate via an epitaxial growth technique; b) providing a second optical coating having layers of alternating high and low refractive indices of dielectric materials on a second host substrate via a physical vapor deposition (PVD) technique; c) directly bonding the first optical coating to the second optical coating; and d) removing the first host substrate.

Abstract: A method for manufacturing a capacitor structure for quantum integrated circuits, in particular superconducting quantum integrated circuits, comprising: providing a first wafer structure comprising a first substrate; providing a second wafer structure comprising a second substrate; a heterostructure on the second substrate, the heterostructure comprising a buried etch stop layer, a dielectric layer on the etch stop layer, and a second metal film deposited on the etch stop layer of the heterostructure; bonding the first wafer structure and the second wafer structure together using the second metal film as bonding medium, thereby forming a bonded layer stack sandwiched between the first and the second substrate, the bonded layer stack comprising the buried etch stop layer, the dielectric layer and the second metal film; stripping the second substrate from the second wafer structure, stopping on the buried etch stop layer; selectively removing the buried etch stop layer from the bonded layer stack, thereby expos