Patents by Inventor David G. Mikolas

David G. Mikolas has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Particle processing apparatus and methods
    Patent number: 7196337
    Abstract: This invention relates to an apparatus for processing particles. The apparatus comprises a particle source having an exist aperture; an extraction electrode located at the exist aperture; an acceleration electrode adjacent to the extraction electrode; a processing compartment adjacent to the acceleration electrode; and a deceleration electrode located adjacent to the processing compartment. The invention also relates to methods of processing particles and to particles processed by the apparatus and methods of the invention.
    Type: Grant
    Filed: April 22, 2004
    Date of Patent: March 27, 2007
    Assignee: Cabot Microelectronics Corporation
    Inventor: David G. Mikolas
  • Global planarization method
    Patent number: 6884729
    Abstract: Methods for manufacturing substrates with difficult to polish features using reverse mask etching and chemical mechanical planarization techniques.
    Type: Grant
    Filed: July 11, 2002
    Date of Patent: April 26, 2005
    Assignee: Cabot Microelectronics Corporation
    Inventors: Jui-Kun Lee, Chris C. Yu, David G. Mikolas
  • Particle processing apparatus and methods
    Publication number: 20040238753
    Abstract: This invention relates to an apparatus for processing particles. The apparatus comprises a particle source having an exist aperture; an extraction electrode located at the exist aperture; an acceleration electrode adjacent to the extraction electrode; a processing compartment adjacent to the acceleration electrode; and a deceleration electrode located adjacent to the processing compartment. The invention also relates to methods of processing particles and to particles processed by the apparatus and methods of the invention.
    Type: Application
    Filed: April 22, 2004
    Publication date: December 2, 2004
    Applicant: Cabot Microelectronics Corporation
    Inventor: David G. Mikolas
  • Dielectric-in-dielectric damascene process for manufacturing planar waveguides
    Publication number: 20040188379
    Abstract: Photonic light circuits including one or more optical waveguides and one or more waveguide features and methods for manufacturing photonic light circuits including one or more optical waveguides.
    Type: Application
    Filed: March 26, 2004
    Publication date: September 30, 2004
    Applicant: Cabot Microelectronics Corporation
    Inventor: David G. Mikolas
  • Dielectric particles in optical waveguides for improved performance
    Publication number: 20040013376
    Abstract: A multimode optical waveguide having reduced modal dispersion. The optical waveguide comprises a core, a cladding surrounding the core, and a plurality of optical scattering elements dispersed in the core.
    Type: Application
    Filed: July 16, 2002
    Publication date: January 22, 2004
    Applicant: Cabot Microelectronics Corp.
    Inventor: David G. Mikolas
  • Method and apparatus for endpoint detection
    Publication number: 20040005769
    Abstract: This invention relates to methods of detecting a planarization endpoint in chemical mechanical planarization of a substrate wherein a detectable target is located at the endpoint and then detected during the CMP planarization. The invention also relates to layered substrates that contain a detectable target located between a first layer of material and a second layer of material. The invention also relates to methods of chemical mechanical planarization of a substrate.
    Type: Application
    Filed: July 3, 2002
    Publication date: January 8, 2004
    Applicant: Cabot Microelectronics Corp.
    Inventor: David G. Mikolas
  • Global planarization method
    Publication number: 20030151020
    Abstract: Methods for manufacturing substrates with difficult to polish features using reverse mask etching and chemical mechanical planarization techniques.
    Type: Application
    Filed: July 11, 2002
    Publication date: August 14, 2003
    Applicant: Cabot Microelectronics Corporation
    Inventors: Jui-Kun Lee, Chris C. Yu, David G. Mikolas
  • Microlens array fabrication using CMP
    Publication number: 20030136759
    Abstract: Methods for fabricating a variety of microlens array structures on substrates using chemical mechanical polishing techniques.
    Type: Application
    Filed: July 10, 2002
    Publication date: July 24, 2003
    Applicant: Cabot Microelectronics Corp.
    Inventor: David G. Mikolas
  • Self-aligned lens formed on a single mode optical fiber using CMP and thin film deposition
    Publication number: 20030138201
    Abstract: Methods, including chemical mechanical polishing methods, for creating a focusing surface on the exposed end of one or more single mode fiber cores which focusing surface is self-aligned to the fiber core axis.
    Type: Application
    Filed: July 10, 2002
    Publication date: July 24, 2003
    Applicant: Cabot Microelectronics Corp.
    Inventor: David G. Mikolas