Patents by Inventor David G. Watson
David G. Watson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8071942Abstract: A sample holder apparatus and method for reducing the energy of charged particles entering an annular-acceptance analyzer includes use of an electrically isolated sample support member having a sample receiving surface configured to receive a sample and electrically connect the sample to the sample support member (e.g., wherein the sample support member is configured for application of a retarding bias potential). A grounded sample aperture member defining an aperture relative to the sample support member but electrically isolated therefrom is provided such that the aperture is proximate the sample receiving surface to expose at least a portion of a surface of a sample received thereon to be analyzed (e.g., wherein applying a retarding bias potential to the sample support member produces an electrical retarding field about the aperture that reduces the energy of emitted particles from a sample before they enter an annular-acceptance analyzer).Type: GrantFiled: February 12, 2010Date of Patent: December 6, 2011Assignee: Physical Electronics USA, Inc.Inventors: David G. Watson, Paul E. Larson, Dennis F. Paul, Ronald E. Negri
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Publication number: 20100237240Abstract: A sample holder apparatus and method for reducing the energy of charged particles entering an annular-acceptance analyzer includes use of an electrically isolated sample support member having a sample receiving surface configured to receive a sample and electrically connect the sample to the sample support member (e.g., wherein the sample support member is configured for application of a retarding bias potential). A grounded sample aperture member defining an aperture relative to the sample support member but electrically isolated therefrom is provided such that the aperture is proximate the sample receiving surface to expose at least a portion of a surface of a sample received thereon to be analyzed (e.g., wherein applying a retarding bias potential to the sample support member produces an electrical retarding field about the aperture that reduces the energy of emitted particles from a sample before they enter an annular-acceptance analyzer).Type: ApplicationFiled: February 12, 2010Publication date: September 23, 2010Applicant: Physical Electronics USA, Inc.Inventors: David G. Watson, Paul E. Larson, Dennis F. Paul, Ronald E. Negri
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Publication number: 20090005437Abstract: The present invention relates generally to the field of pharmaceuticals and medicine. More particularly, the present invention relates to certain compounds (e.g., ?-ketoglutarate compounds; compounds that activate HIF? hydroxylase; compounds that increases the level of ?-ketoglutarate, etc.) and their use in medicine, for example, in the treatment of cancer (e.g., cancer in which the activity of one of the enzymes in the tricarboxylic acid (TCA) cycle is down regulated), in the treatment of angiogenesis (e.g., hypoxia-induced angiogenesis). One preferred class of compounds are ?-ketoglutarate compounds having a hydrophobic moiety that is, or is part of, an ester group formed from one of the acid groups of ?-ketogluartic acid; and pharmaceutically acceptable salts, solvates, amides, esters, ethers, N-oxides, chemically protected forms, and prodrugs thereof.Type: ApplicationFiled: August 9, 2005Publication date: January 1, 2009Inventors: Eyal Gottlieb, Mary A. Selak, Elaine D. MacKenzie, David G. Watson
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Patent number: 7449682Abstract: Characterization of a sample, e.g., a depth profile, may be attained using one or more of the following parameters in an electron spectroscopy method or system. The one or more parameters may include using low ion energy ions for removing material from the sample to expose progressively deeper layers of the sample, using an ion beam having a low ion angle to perform such removal of sample material, and/or using an analyzer positioned at a high analyzer angle for receiving photoelectrons escaping from the sample as a result of x-rays irradiating the sample. Further, a correction algorithm may be used to determine the concentration of components (e.g., elements and/or chemical species) versus depth within the sample, e.g., thin film formed on a substrate. Such concentration determination may include calculating the concentration of components (e.g, elements and/or chemical species) at each depth of a depth profile by removing from depth profile data collected at a particular depth (i.e.Type: GrantFiled: October 24, 2002Date of Patent: November 11, 2008Assignee: Revera IncorporatedInventors: Paul E. Larson, John F. Moulder, David G. Watson, David S. Perloff
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Patent number: 7054014Abstract: A method of estimating toner consumption of a input digital image when printed, the digital image comprised of an array of pixels and wherein each pixel is assigned a digital value representing marking information, the method comprising the steps of identifying each pixel as background pixels or foreground pixels; adding the digital values of foreground pixels together; and, estimating toner usage based on the sum of the added values. The rendering of the present invention occurs post RIP.Type: GrantFiled: February 23, 2004Date of Patent: May 30, 2006Assignee: Eastman Kodak CompanyInventors: Thomas J. Foster, Anne F. Lairmore, Edward M. Eck, David G. Watson
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Patent number: 6891158Abstract: The present invention provides for characterization of a film (e.g., thickness determination for a silicon oxynitride film) using collected spectral data. For example, an acquired spectrum may be cumulatively integrated and the geometric properties of the integrated spectrum may be used to determine component concentration information. Thickness measurements for the film may be provided based on the component concentration information.Type: GrantFiled: December 27, 2002Date of Patent: May 10, 2005Assignee: ReVera IncorporatedInventors: Paul E. Larson, David G. Watson
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Publication number: 20040238735Abstract: Characterization of a sample, e.g., a depth profile, may be attained using one or more of the following parameters in an electron spectroscopy method or system. The one or more parameters may include using low ion energy ions for removing material from the sample to expose progressively deeper layers of the sample, using an ion beam having a low ion angle to perform such removal of sample material, and/or using an analyzer positioned at a high analyzer angle for receiving photoelectrons escaping from the sample as a result of x-rays irradiating the sample. Further, a correction algorithm may be used to determine the concentration of components (e.g., elements and/or chemical species) versus depth within the sample, e.g., thin film formed on a substrate. Such concentration determination may include calculating the concentration of components (e.g, elements and/or chemical species) at each depth of a depth profile by removing from depth profile data collected at a particular depth (i.e.Type: ApplicationFiled: April 22, 2004Publication date: December 2, 2004Inventors: Paul E. Larson, David G Watson, John F Moulder, David S Perloff
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Publication number: 20040196479Abstract: A method of estimating toner consumption of a input digital image when printed, the digital image comprised of an array of pixels and wherein each pixel is assigned a digital value representing marking information, the method comprising the steps of identifying each pixel as background pixels or foreground pixels; adding the digital values of foreground pixels together; and, estimating toner usage based on the sum of the added values. The rendering of the present invention occurs post RIP.Type: ApplicationFiled: February 23, 2004Publication date: October 7, 2004Inventors: Thomas J. Foster, Anne F. Lairmore, Edward M. Eck, David G. Watson
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Patent number: 6800852Abstract: The present invention provides for characterization of a film (e.g., thickness determination for a silicon oxynitride film) using a comparison process (e.g., a fitting process) to compare measured peak shapes for elemental and/or chemical species (e.g., Si peak shapes previously measured for a particular process to be monitored) to collected spectral data (e.g., using a non-linear least squares fitting algorithm).Type: GrantFiled: December 27, 2002Date of Patent: October 5, 2004Assignee: ReVera IncorporatedInventors: Paul E. Larson, David G. Watson, John F. Moulder
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Publication number: 20040135081Abstract: The present invention provides for characterization of a film (e.g., thickness determination for a silicon oxynitride film) using a comparison process (e.g., a fitting process) to compare measured peak shapes for elemental and/or chemical species (e.g., Si peak shapes previously measured for a particular process to be monitored) to collected spectral data (e.g., using a non-linear least squares fitting algorithm).Type: ApplicationFiled: December 27, 2002Publication date: July 15, 2004Applicant: Physical Electronics, Inc.Inventors: Paul E. Larson, David G. Watson, John F. Moulder
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Publication number: 20040125913Abstract: The present invention provides for characterization of a film (e.g., thickness determination for a silicon oxynitride film) using collected spectral data. For example, an acquired spectrum may be cumulatively integrated and the geometric properties of the integrated spectrum may be used to determine component concentration information. Thickness measurements for the film may be provided based on the component concentration information.Type: ApplicationFiled: December 27, 2002Publication date: July 1, 2004Applicant: Physical Electronics, Inc.Inventors: Paul E. Larson, David G. Watson
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Publication number: 20030080291Abstract: Characterization of a sample, e.g., determination of a component's concentration in a thin film, may be attained by providing calibration information representative of surface spectrum measurements for a plurality of samples correlated with depth profile information for the plurality of samples. The plurality of samples are formed under a same set of process conditions. One or more surface spectrum measurements are provided for a sample to be characterized that also was formed under the same set of process conditions. At least one characteristic of the sample to be characterized (e.g., concentration of a component) is determined based on the one or more surface spectrum measurements for the sample to be characterized and the calibration information.Type: ApplicationFiled: October 26, 2001Publication date: May 1, 2003Applicant: Physical Electronics, Inc.Inventors: Paul E. Larson, John F. Moulder, David G. Watson, David S. Perloff
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Publication number: 20030080292Abstract: Characterization of a sample, e.g., a depth profile, may be attained using one or more of the following parameters in an electron spectroscopy method or system. The one or more parameters may include using low ion energy ions for removing material from the sample to expose progressively deeper layers of the sample, using an ion beam having a low ion angle to perform such removal of sample material, and/or using an analyzer positioned at a high analyzer angle for receiving photoelectrons escaping from the sample as a result of x-rays irradiating the sample. Further, a correction algorithm may be used to determine the concentration of components (e.g., elements and/or chemical species) versus depth within the sample, e.g., thin film formed on a substrate. Such concentration determination may include calculating the concentration of components (e.g, elements and/or chemical species) at each depth of a depth profile by removing from depth profile data collected at a particular depth (i.e.Type: ApplicationFiled: October 26, 2001Publication date: May 1, 2003Applicant: Physical Electronics, Inc.Inventors: David G. Watson, Paul E. Larson