Patents by Inventor DAVID GAGE

DAVID GAGE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11948885
    Abstract: Methods and apparatus for creating a dual metal interconnect on a substrate. In some embodiments, a first liner of a first nitride material is deposited into at least one 1X feature and at least one wider than 1X feature, the first liner has a thickness of less than or equal to approximately 12 angstroms; a second liner of a first metal material is deposited into the at least one 1X feature and at least one wider than 1X feature; the first metal material is reflowed such that the at least one 1X feature is filled with the first metal material and the at least one wider than 1X feature remains unfilled with the first metal material; a second metal material is deposited on the first metal material, and the second metal material is reflowed such that the at least one wider than 1X feature is filled with the second metal material.
    Type: Grant
    Filed: June 24, 2021
    Date of Patent: April 2, 2024
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Suketu A. Parikh, Rong Tao, Roey Shaviv, Joung Joo Lee, Seshadri Ganguli, Shirish Pethe, David Gage, Jianshe Tang, Michael A Stolfi
  • Publication number: 20230115544
    Abstract: A tip light laryngoscope adapted for the trans-tissue illumination during insertion of the laryngoscope, preferably in the mucosal fold between tongue base and the epiglottis referred to as the vallecula, includes a handle and a blade with a tip at the end of the blade and a distal light source at the tip to enlighten the environment in front of the tip. The tip light laryngoscope is designed to make direct contact with the mucosa.
    Type: Application
    Filed: January 22, 2021
    Publication date: April 13, 2023
    Inventors: Peter BIRO, David GAGE, Quentin BOEHLER
  • Publication number: 20210321857
    Abstract: An articulated segmented instrument with an elongate body in the longitudinal direction with a plurality of interconnected links. Each link has a central working channel and at least three thru holes for angulation wires to direct a distal tip segment of the instrument in a predetermined direction. Two radially opposite protrusions and two opposite receptions in the cylindrical sleeve have pivot concave contact surfaces complementary to convex pivot contact surfaces. The reception adjacent surface of the cylindrical sleeve creates an articulating angle with the protrusion adjacent surface of the cylindrical sleeve of the adjacent link through inclination of at least one of the reception adjacent surface or the protrusion adjacent surface of said adjacent link towards the body of the link or the adjacent link, respectively.
    Type: Application
    Filed: August 7, 2019
    Publication date: October 21, 2021
    Inventors: Bradley Nelson, Christophe Chautems, Peter Biro, Quentin Boehler, David Gage
  • Publication number: 20210320064
    Abstract: Methods and apparatus for creating a dual metal interconnect on a substrate. In some embodiments, a first liner of a first nitride material is deposited into at least one 1X feature and at least one wider than 1X feature, the first liner has a thickness of less than or equal to approximately 12 angstroms; a second liner of a first metal material is deposited into the at least one 1X feature and at least one wider than 1X feature; the first metal material is reflowed such that the at least one 1X feature is filled with the first metal material and the at least one wider than 1X feature remains unfilled with the first metal material; a second metal material is deposited on the first metal material, and the second metal material is reflowed such that the at least one wider than 1X feature is filled with the second metal material.
    Type: Application
    Filed: June 24, 2021
    Publication date: October 14, 2021
    Inventors: SUKETU A. PARIKH, RONG TAO, ROEY SHAVIV, JOUNG JOO LEE, SESHADRI GANGULI, SHIRISH PETHE, DAVID GAGE, JIANSHE TANG, MICHAEL A STOLFI
  • Patent number: 11075165
    Abstract: Methods and apparatus for creating a dual metal interconnect on a substrate. In some embodiments, a first liner of a first nitride material is deposited into at least one 1× feature and at least one wider than 1× feature, the first liner has a thickness of less than or equal to approximately 12 angstroms; a second liner of a first metal material is deposited into the at least one 1× feature and at least one wider than 1× feature; the first metal material is reflowed such that the at least one 1× feature is filled with the first metal material and the at least one wider than 1× feature remains unfilled with the first metal material; a second metal material is deposited on the first metal material, and the second metal material is reflowed such that the at least one wider than 1× feature is filled with the second metal material.
    Type: Grant
    Filed: July 19, 2019
    Date of Patent: July 27, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Suketu A Parikh, Rong Tao, Roey Shaviv, Joung Joo Lee, Seshadri Ganguli, Shirish Pethe, David Gage, Jianshe Tang, Michael A Stolfi
  • Publication number: 20210020569
    Abstract: Methods and apparatus for creating a dual metal interconnect on a substrate. In some embodiments, a first liner of a first nitride material is deposited into at least one 1× feature and at least one wider than 1× feature, the first liner has a thickness of less than or equal to approximately 12 angstroms; a second liner of a first metal material is deposited into the at least one 1× feature and at least one wider than 1× feature; the first metal material is reflowed such that the at least one 1× feature is filled with the first metal material and the at least one wider than 1× feature remains unfilled with the first metal material; a second metal material is deposited on the first metal material, and the second metal material is reflowed such that the at least one wider than 1× feature is filled with the second metal material.
    Type: Application
    Filed: July 19, 2019
    Publication date: January 21, 2021
    Inventors: SUKETU A. PARIKH, RONG TAO, ROEY SHAVIV, JOUNG JOO LEE, SESHADRI GANGULI, SHIRISH PETHE, DAVID GAGE, JIANSHE TANG, MICHAEL A. STOLFI