Patents by Inventor David Gerard MIKOLAS

David Gerard MIKOLAS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Laser interference lithography apparatus using fiber as spatial filter and beam expander
    Patent number: 9025133
    Abstract: In a laser interference lithography apparatus, a laser source provides a first laser beam, and an optics assembly is optically coupled to the laser source and receives and processes the first laser beam into one or multiple second laser beams. An exposure stage carries a to-be-exposed object. The fiber assembly receives and processes the second laser beam(s) into one or multiple single mode and stable coherent third laser beams without spatial noise. An interference pattern is generated on the to-be-exposed object using the third laser beam(s). The apparatus is configured without a pin hole spatial filter and a beam expander being disposed on an optical path from an output end of the laser source to the exposure stage.
    Type: Grant
    Filed: March 13, 2013
    Date of Patent: May 5, 2015
    Assignee: National Tsing Hua University
    Inventors: Chien-Chung Fu, Yi-Lin Sun, David Gerard Mikolas, Pao-Te Lin, En-Chiang Chang, Tze-Bin Huang
  • Laser Interference Lithography Apparatus Using Fiber as Spatial Filter and Beam Expander
    Publication number: 20140118715
    Abstract: In a laser interference lithography apparatus, a laser source provides a first laser beam, and an optics assembly is optically coupled to the laser source and receives and processes the first laser beam into one or multiple second laser beams. An exposure stage carries a to-be-exposed object. The fiber assembly receives and processes the second laser beam(s) into one or multiple single mode and stable coherent third laser beams without spatial noise. An interference pattern is generated on the to-be-exposed object using the third laser beam(s). The apparatus is configured without a pin hole spatial filter and a beam expander being disposed on an optical path from an output end of the laser source to the exposure stage.
    Type: Application
    Filed: March 13, 2013
    Publication date: May 1, 2014
    Applicant: NATIONAL TSING HUA UNIVERSITY
    Inventors: Chien-Chung FU, Yi-Lin SUN, David Gerard MIKOLAS, Pao-Te LIN, En-Chiang CHANG, Tze-Bin HUANG