Patents by Inventor David Goodstein

David Goodstein has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for accurate e-beam metrology
    Patent number: 7098456
    Abstract: One embodiment disclosed relates to a method for accurate electron beam metrology. A substrate with a target feature is loaded into a scanning electron microscope. An electron beam is scanned over the target feature, and scattered electrons are detected therefrom. A characteristic of the target feature is measured by finding optimal values for parameters of a mathematical model which accounts for substrate charging effects. Principal component analysis may be used to advantageously result in reduced requirements for processing time and/or computational speed.
    Type: Grant
    Filed: August 13, 2004
    Date of Patent: August 29, 2006
    Assignee: KLA-Tencor Technologies Corporation
    Inventors: Gian Francesco Lorusso, Paola De Cecco, Luca Grella, David L. Adler, David Goodstein, Chris Bevis