Abstract: The embodiments herein describe authenticating a photomask used to fabricate an IC or a wafer. Because the IC may have been fabricated at a third-party IC manufacturer, the customer may want to ensure the manufacturer did not mistakenly use an incorrect mask, or that the mask was not altered or replaced with a rogue mask by a nefarious actor. That is, the embodiments herein can be used to identify when an IC manufacture (whether trusted or not) mistakenly used the wrong photomask, or to verify that a third-party IC manufacturer did not tamper with or replace the authentic photomask with a rogue mask. Advantageously, the embodiments herein can create a secure IC fabrication process to catch mistakes as well as ensure that non-trusted third-parties did not introduce defects into the IC.

Abstract: A computer-implemented method of ensuring integrity of an integrated circuit (IC) is provided. The computer-implemented method includes providing a design layer that meets design rule checks (DRCs), identifying a first critical dimension (CD) distribution of the design layer and using retargeting shapes in the design layer to enable a biasing of CDs of targets to enable a provision of two different CD distributions, which are DRC clean and which are separate from one another and which cannot be expressed by a single Gaussian distribution.

Abstract: The embodiments herein describe authenticating a photomask used to fabricate an IC or a wafer. Because the IC may have been fabricated at a third-party IC manufacturer, the customer may want to ensure the manufacturer did not mistakenly use an incorrect mask, or that the mask was not altered or replaced with a rogue mask by a nefarious actor. That is, the embodiments herein can be used to identify when an IC manufacture (whether trusted or not) mistakenly used the wrong photomask, or to verify that a third-party IC manufacturer did not tamper with or replace the authentic photomask with a rogue mask. Advantageously, the embodiments herein can create a secure IC fabrication process to catch mistakes as well as ensure that non-trusted third-parties did not introduce defects into the IC.

Abstract: The invention relates to a method for sending data to at least one device. According to the invention, a data sending control server sends to at least one data storage server at least one predetermined rule or a first request for sending data to at least one data processing server. The data storage server sends, based upon the at least one predetermined rule or the first request for sending data, data to the data processing server. The data sending control server sends to the data processing server a second request for sending to the device the data received or to be received by the data processing server. The data processing server sends, based upon the second request for sending the data, the received data to the at least one device.

Abstract: The invention relates to a method for sending data to at least one device. According to the invention, a data sending control server sends to at least one data storage server at least one predetermined rule or a first request for sending data to at least one data processing server. The data storage server sends, based upon the at least one predetermined rule or the first request for sending data, data to the data processing server. The data sending control server sends to the data processing server a second request for sending to the device the data received or to be received by the data processing server. The data processing server sends, based upon the second request for sending the data, the received data to the at least one device.

Abstract: The present invention relates to a method to manage subscriptions in a provisioning server (PS) able to communicate with a Hardware Security Module (HSM) having an HSM key (K). Said method being such that the HSM comprising a load and a reload function, the secure device key ((Ke1)K) and the storage key ((Ks)K) as encrypted and stored are provided (S1) to one of said functions, said functions outputting, the storage key ((Ks)Ke1)K) encrypted using the provided secure device (SE1) key (Ke1) and the HSM key K, and an APDU_putkey command ((APDU_PUTKEY((Ks)Ke1))Ke1), encrypted using the provided secure device (SE1) key (Ke1), to put the retrieved storage key ((Ks)Ke1) also encrypted using the provided secure device key (Ke1), the storage key as previously stored ((Ks)K) is overwritten (S6) with the storage key (((Ks)Ke1)K) encrypted using the secure device key (Ke1) and the HSM key (K) returned by the function.

Abstract: The present invention relates to a method to manage subscriptions in a provisioning server (PS) able to communicate with a Hardware Security Module (HSM) having an HSM key (K). Said method being such that the HSM comprising a load and a reload function, the secure device key ((Ke1)K) and the storage key ((Ks)K) as encrypted and stored are provided (S1) to one of said functions, said functions outputting, the storage key ((Ks)Ke1)K) encrypted using the provided secure device (SE1) key (Ke1) and the HSM key K, and an APDU_putkey command ((APDU_PUTKEY((Ke1))Ke1), encrypted using the provided secure device (SE1) key (Ke1), to put the retrieved storage key ((Ks)Ke1) also encrypted using the provided secure device key (Ke1), the storage key as previously stored ((Ks)K) is overwritten (S6) with the storage key (((Ks)Ke1)k) encrypted using the secure device key (Ke1) and the HSM key (K) returned by the function.

Abstract: In order to broadcast a commercial content corresponding to the centers of interest of a user of a communicating object, the disclosed method involves generating a message including at least one piece of commercial content associated with at least one piece of meta-information characterising the subject concerned by the commercial content. The method is implemented by the object for extracting a piece of commercial content from the message only if the piece of meta-information of the content corresponds to a piece of meta-information characterising a center of interest of the user.

Abstract: A method of identifying an alteration in a locus copy number is provided. The method is effected by determining a methylation state of at least one gene in the locus, wherein a methylation state differing from a predetermined methylation state of the at least one gene is indicative of an alteration in the locus copy number.

Abstract: The present invention provides compositions, methods and kits for diagnosing cancer, specifically the diagnosis of colorectal cancer (CRC). More specifically, the invention provides simple assays, with high sensitivity and specificity for CRC, wherein a panel of microRNA (miRNA) are used as biomarkers.

Abstract: The invention relates to a method for the enrichment of an electronic directory stored in a first electronic communication device, based on the changes in a second electronic communication device and by the application of decisional rules. The changes can also be related to a change in the hardware or software functionalities or to a modification of data contained in said second device.

Abstract: Photolithography compositions and methods. A first layer of a first photoresist is formed on a substrate. A second layer of a second photoresist is formed directly onto the first layer. The second polymer of the second photoresist includes an absorbing moiety. The second layer is patternwise imaged and developed, resulting in removal of base-soluble regions. A relief pattern from the second layer remains. The relief pattern and the first layer are exposed to a second dose of the radiation. The polymer in the relief pattern absorbs a portion of the second dose. A fraction of the second dose passes through the at least one region of the relief pattern and exposes at least one region of the first layer. The relief pattern and base-soluble regions of the first layer are removed. A relief pattern from the first layer remains. A second photolithography method and a photoresist composition are also included.

Abstract: In order to broadcast a commercial content corresponding to the centres of interest of a user of a communicating object, the disclosed method involves generating a message including at least one piece of commercial content associated with at least one piece of meta-information characterising the subject concerned by the commercial content. The method is implemented by the object for extracting a piece of commercial content from the message only if the piece of meta-information of the content corresponds to a piece of meta-information characterising a centre of interest of the user.

Abstract: A method of identifying an alteration in a locus copy number is provided. The method is effected by determining a methylation state of at least one gene in the locus, wherein a methylation state differing from a predetermined methylation state of the at least one gene is indicative of an alteration in the locus copy number.

Abstract: Photolithography compositions and methods. A first layer of a first photoresist is formed on a substrate. A second layer of a second photoresist is formed directly onto the first layer. The second polymer of the second photoresist includes an absorbing moiety. The second layer is patternwise imaged and developed, resulting in removal of base-soluble regions. A relief pattern from the second layer remains. The relief pattern and the first layer are exposed to a second dose of the radiation. The polymer in the relief pattern absorbs a portion of the second dose. A fraction of the second dose passes through the at least one region of the relief pattern and exposes at least one region of the first layer. The relief pattern and base-soluble regions of the first layer are removed. A relief pattern from the first layer remains. A second photolithography method and a photoresist composition are also included.

Abstract: A method of identifying an alteration in a locus copy number is provided. The method is effected by determining a methylation state of at least one gene in the locus, wherein a methylation state differing from a predetermined methylation state of the at least one gene is indicative of an alteration in the locus copy number.

Abstract: A lithographic structure and method of fabrication and use thereof having a plurality of layers at least one of which is a an RCHX layer which comprises a material having structural formula R:C:H:X, wherein R is selected from the group consisting of Si, Ge, B, Sn, Fe, Ti and combinations thereof and wherein X is not present or is selected from the group consisting of one or more of O, N, S, and F and a layer of an energy active material. The RCHX layers are useful as hardmask layers, anti-reflection layers and hardmask anti-reflection layers. The RCHX layer can be vapor-deposited and patterned by patterning the energy active material and transferring the pattern to the RCHX layer.

Abstract: A lithographic structure and method of fabrication and use thereof having a plurality of layers at least one of which is a an RCHX layer which comprises a material having structural formula R:C:H:X, wherein R is selected from the group consisting of Si, Ge, B, Sn, Fe, Ti and combinations thereof and wherein X is not present or is selected from the group consisting of one or more of O, N, S, and F and a layer of an energy active material. The RCHX layers are useful as hardmask layers, anti-reflection layers and hardmask anti-reflection layers. The RCHX layer can be vapor-deposited and patterned by patterning the energy active material and transferring the pattern to the RCHX layer.

Abstract: A lithographic structure and method of fabrication and use thereof having a plurality of layers at least one of which is a an RCHX layer which comprises a material having structural formula R:C:H:X, wherein R is selected from the group consisting of Si, Ge, B, Sn, Fe, Ti and combinations thereof and wherein X is not present or is selected from the group consisting of one or more of O, N, S, and F and a layer of an energy active material. The RCHX layers are useful as hardmask layers, anti-reflection layers and hardmask anti-reflection layers. The RCHX layer can be vapor-deposited and patterned by patterning the energy active material and transferring the pattern to the RCHX layer.