Abstract: A system for producing plasma tubes that can withstand a wide variety of physical and environmental stressors within a plasma processing system is disclosed. Within such a plasma processing system, a plasma tube structure has a central body portion—having a fixed outer diameter. At a first end of the plasma tube structure, an outwardly extending flange may be provided. At a second end of the plasma tube, an edge portion is provided—having an outer diameter that is less than the fixed outer diameter of the central body portion. The edge portion is formed to facilitate easy and secure engagement of the plasma tube structure with a compression mechanism. The plasma tube structure is formed of material that provides sufficient structural integrity and degradation resistance.

Abstract: An apparatus with an edge ring configured to surround a perimeter of a semiconductor wafer in a semiconductor process, the edge ring having a plurality of protrusions located on an upper surface of the edge ring, the protrusions capable of preventing the semiconductor wafer from moving outside the bounds of a process plane. There is also an apparatus having a semiconductor process chamber and an electrostatic chuck, a semiconductor wafer, and an edge ring. There is also a method including providing a semiconductor process chamber, semiconductor wafer disposed within the semiconductor process chamber, and an edge ring, the edge ring having a plurality of protrusions located on an upper surface of the edge ring, the protrusions capable of preventing the semiconductor wafer from moving outside the bounds of a process plane. The method also includes performing an etch process on the semiconductor wafer.

Abstract: A system for producing plasma tubes that can withstand a wide variety of physical and environmental stressors within a plasma processing system is disclosed. Within such a plasma processing system, a plasma tube structure has a central body portion—having a fixed outer diameter. At a first end of the plasma tube structure, an outwardly extending flange may be provided. At a second end of the plasma tube, an edge portion is provided—having an outer diameter that is less than the fixed outer diameter of the central body portion. The edge portion is formed to facilitate easy and secure engagement of the plasma tube structure with a compression mechanism. The plasma tube structure is formed of material that provides sufficient structural integrity and degradation resistance.