Abstract: An apparatus for providing activated carbon that has a reactor vessel for containing carbon based feedstock and a processor that encloses the reactor vessel. An insulating barrier is disposed between the reactor vessel and the processor for defining generally vertical outer and inner pathways that are communicably interconnected. The reactor vessel has a gas receiving intake port in communication with the inner pathway. First and second inlet conduits are formed through the processor and into the reactor for respectively introducing a first ignition gas into the reactor to ignite the feedstock and a second gas into the first pathway. The second gas circulates through the outer and inner pathways and enters the reactor vessel through the gas receiving intake port. The exhaust gas is circulated through a catalyst chamber/cartridge/bed. At least one exhaust port discharges gas from the vessel exteriorly of the processor.

Abstract: Preferred embodiments of a purge gas port, laser beam attenuating input window, and laser shutter constitute subsystems of a UV laser optical system in which a laser beam is completely enclosed to reduce contamination of the optical system components. Purge gas is injected through multiple locations in a beam tube assembly to ensure that the optical component surfaces sensitive to contamination are in the flow path of the purge gas. The input window functions as a fixed level attenuator to limit photopolymerization of airborne molecules and particles. Periodically rotating optical elements asymmetrically in their holders reduces burn damage to the optics.

Abstract: A method of suppressing distortion of a working laser beam directed for incidence on a target specimen presented for processing by a laser link processing system uses a spatial filter to remove stray light-induced distortion from the working laser beam.

Abstract: A system determines relative positions of a semiconductor substrate and a plurality of laser beam spots on or within the semiconductor substrate in a machine for selectively irradiating structures on or within the substrate using a plurality of laser beams. The system comprises a laser source, first and second laser beam propagation paths, first and second reflection sensors, and a processor. The laser source produces at least the first and second laser beams, which propagate toward the substrate along the first and second propagation paths, respectively, which have respective first and second axes that intersects the substrate at respective first and second spots. The reflection sensors are positioned to detect reflection of the spots, as the spots moves relative to the substrate, thereby generating reflection signals. The processor is configured to determine, based on the reflection signals, positions of the spots on or within the substrate.

Abstract: A laser beam switching system employs a laser coupled to a beam switching device that causes a laser beam to switch between first and second beam positioning heads such that while the first beam positioning head is directing the laser beam to process a workpiece target location, the second beam positioning head is moving to another target location and vice versa. A preferred beam switching device includes first and second AOMs positioned such that the laser beam passes through the AOMs without being deflected. When RF is applied to the first AOM, the laser beam is diffracted toward the first beam positioning head, and when RF is applied to the second AOM, the laser beam is diffracted toward the second beam positioning head.