Patents by Inventor David HENRIKS

David HENRIKS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process and apparatus for treating surfaces of wafer-shaped articles
    Patent number: 9870933
    Abstract: An apparatus and method for processing wafer-shaped articles utilizes at least first and second liquid-dispensing nozzles, wherein a first liquid-dispensing nozzle is positioned closer to an axis of rotation than the second liquid-dispensing nozzle. A liquid supply system supplies heated process liquid to the nozzles such that process liquid dispensed from the first nozzle has a temperature that differs by an amount within a predetermined range from a temperature of process liquid dispensed from the second liquid-dispensing nozzle.
    Type: Grant
    Filed: February 8, 2013
    Date of Patent: January 16, 2018
    Assignee: LAM RESEARCH AG
    Inventors: Philipp Engesser, David Henriks, Anders Joel Bjoerk
  • LIQUID DISPENSER WITH IMPROVED DRIP PREVENTION
    Publication number: 20160114359
    Abstract: In an apparatus for treating a wafer-shaped article, a spin chuck is provided for holding and rotating a wafer-shaped article. A liquid dispenser comprises a supply conduit that divides to form a first branch extending toward a dispensing outlet of the liquid dispenser and a second branch communicating with a vent opening of the liquid dispenser. The second branch extends upwardly relative to the first branch over at least a portion of its length.
    Type: Application
    Filed: October 28, 2014
    Publication date: April 28, 2016
    Inventors: Anders Joel BJORK, David HENRIKS, Alex EDER
  • PROCESS AND APPARATUS FOR TREATING SURFACES OF WAFER-SHAPED ARTICLES
    Publication number: 20140227884
    Abstract: An apparatus and method for processing wafer-shaped articles utilizes at least first and second liquid-dispensing nozzles, wherein a first liquid-dispensing nozzle is positioned closer to an axis of rotation than the second liquid-dispensing nozzle. A liquid supply system supplies heated process liquid to the nozzles such that process liquid dispensed from the first nozzle has a temperature that differs by an amount within a predetermined range from a temperature of process liquid dispensed from the second liquid-dispensing nozzle.
    Type: Application
    Filed: February 8, 2013
    Publication date: August 14, 2014
    Applicant: LAM RESEARCH AG
    Inventors: Philipp ENGESSER, David HENRIKS, Anders Joel BJOERK