Patents by Inventor David Irby

David Irby has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Systems, masks, and methods for manufacturable masks using a functional representation of polygon pattern
    Patent number: 7698665
    Abstract: Photomask patterns are represented using contours defined by mask functions or other formats. Given target pattern, contours may be optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimized patterns or blocks may be simplified for mask manufacturing.
    Type: Grant
    Filed: October 6, 2005
    Date of Patent: April 13, 2010
    Assignee: Luminescent Technologies, Inc.
    Inventors: Daniel S. Abrams, David Irby
  • Systems, masks, and methods for manufacturable masks
    Publication number: 20070009808
    Abstract: Photomask patterns are represented using contours defined by mask functions or other formats. Given target pattern, contours may be optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimized patterns or blocks may be simplified for mask manufacturing.
    Type: Application
    Filed: October 6, 2005
    Publication date: January 11, 2007
    Inventors: Daniel Abrams, David Irby