Abstract: A radio frequency (RF) sensor that measures RF current includes a substrate that has an inner perimeter that defines an aperture. A conductor extends through the aperture. Sensor pads are arranged on the aperture and are connected to form two sensor loops. The loops generate an electrical signal that represents RF current flow through the center conductor. Additionally, a plurality of circular conductive rings may be included in the RF sensor to generate a signal representing the voltage of the conductor.

Abstract: A radio frequency (RF) system includes a control module that allocates M predetermined frequency intervals. The system also includes N RF sources that each applies first RF power to electrodes within a plasma chamber at frequencies within an assigned respective one of the M predetermined frequency intervals. The N RF sources also each respond to second RF power including feedback from the plasma chamber. The N RF sources each include a processing module that adjusts the first RF power based on the second RF power and the respective one of the M predetermined frequency intervals. M and N are integers greater than 1.

Abstract: An arc detection system for a plasma generation system includes a radio frequency (RF) sensor that generates first and second signals based on a respective electrical properties of (RF) power that is in communication with a plasma chamber. A correlation module generates an arc detect signal based on the first and second signals. The arc detect signal indicates whether an arc is occurring in the plasma chamber and is employed to vary an aspect of the RF power to extinguish the arc.

Abstract: A radio frequency (RF) system includes a control module that allocates M predetermined frequency intervals. The system also includes N RF sources that each applies first RF power to electrodes within a plasma chamber at frequencies within an assigned respective one of the M predetermined frequency intervals. The N RF sources also each respond to second RF power including feedback from the plasma chamber. The N RF sources each include a processing module that adjusts the first RF power based on the second RF power and the respective one of the M predetermined frequency intervals. M and N are integers greater than 1.

Abstract: Controlling a phase and/or a frequency of a RF generator. The RF generator includes a power source, a sensor, and a sensor signal processing unit. The sensor signal processing unit is coupled to the power source and to the sensor. The sensor signal processing unit controls the phase and/or the frequency of a RF generator.

Abstract: A radio frequency (RF) sensor that measures RF current includes a substrate that has an inner perimeter that defines an aperture. A conductor extends through the aperture. Sensor pads are arranged on the aperture and are connected to form two sensor loops. The loops generate an electrical signal that represents RF current flow through the center conductor. Additionally, a plurality of circular conductive rings may be included in the RF sensor to generate a signal representing the voltage of the conductor.

Abstract: Controlling a phase and/or a frequency of a RF generator. The RF generator includes a power source, a sensor, and a sensor signal processing unit. The sensor signal processing unit is coupled to the power source and to the sensor. The sensor signal processing unit controls the phase and/or the frequency of a RF generator.

Abstract: An arc detection system for a plasma generation system includes a radio frequency (RF) sensor that generates first and second signals based on a respective electrical properties of (RF) power that is in communication with a plasma chamber. A correlation module generates an arc detect signal based on the first and second signals. The arc detect signal indicates whether an arc is occurring in the plasma chamber and is employed to vary an aspect of the RF power to extinguish the arc.

Abstract: An arc detection system for a plasma generation system includes a radio frequency (RF) sensor that generates first and second signals based on a respective electrical properties of (RF) power that is in communication with a plasma chamber. A correlation module generates an arc detect signal based on the first and second signals. The arc detect signal indicates whether an arc is occurring in the plasma chamber and is employed to vary an aspect of the RF power to extinguish the arc.

Abstract: A metrology system monitors radio frequency (RF) power at a plurality of locations in a circuit. The system includes a plurality of RF sensors that generate respective analog signals based on electrical properties of the RF power, a multiplexing module that generates an output signal based on the analog signals, and an analysis module that generates messages based on the output signal. The messages contain information regarding the electrical properties that are sensed by the plurality of RF sensors.

Abstract: A system for field substitution of components of a RF metrology system. The system includes a sensor/cable combination and an analysis unit. Parameters of the RF metrology system are determined prior to placing the RF metrology system in the field. From these parameters, either component, the cable/sensor combination or the analysis module, may be substituted in the field by recalibrating the system for the substituted unit. Such recalibration is carried out utilizing the parameters determined prior to placing the RF metrology system in the field.

Abstract: An RF generator is provided for use in an RF plasma system. The RF generator includes: a power source that is operable to generate RF power signals at a tuned frequency; a sensor unit that is adapted to detect the RF power signals and operable to generate analog signals representative of the RF power signals, where the analog signals include a frequency of interest and a plurality of interfering frequency components; and a sensor signal processing unit that is adapted to receive the analog signals from the sensor unit and to band limit the analog signals within a predefined bandwidth that passes the frequency of interest and rejects interfering frequency components.

Abstract: An RF generator is provided for use in an RF plasma system. The RF generator includes: a power source that is operable to generate RF power signals at a tuned frequency; a sensor unit that is adapted to detect the RF power signals and operable to generate analog signals representative of the RF power signals, where the analog signals include a frequency of interest and a plurality of interfering frequency components; and a sensor signal processing unit that is adapted to receive the analog signals from the sensor unit and to band limit the analog signals within a predefined bandwidth that passes the frequency of interest and rejects interfering frequency components.

Abstract: An adaptive plasma characterization system and method characterize a semiconductor plasma process using fuzzy logic and neural networks. The method includes the step of collecting input and output training data, where the input training data is based on variables associated with electrical power used to control a plasma chamber and results from execution of the plasma process. The method further includes the step of generating fuzzy logic-based input and output membership functions based on the training data. The membership functions enable estimation of an output parameter value of the plasma process, such that the membership functions characterize the plasma process with regard to the output parameter. Modifying the membership functions based on a neural network learning algorithm and output data provides ability to learn. Thus, etching process parameters such as etch rate, end point detection, and chamber maintenance can all be characterized in a manner that allows the system to operate autonomously.

Abstract: A radio frequency (RF) probe head apparatus is provided for measuring voltage and current of an RF signal in a sampled transmission line. The probe head apparatus includes a conductive housing, a bus inside the conductive housing, a pair of connectors mounted on the conductive housing and configured to pass an RF signal into and out of the housing via the bus, a voltage pick-up board within the housing, and a current pickup board within the housing. The voltage pickup board has an analog processor responsive to an electric field around the bus to produce a first DC output indicative of a root-mean-square (RMS) value of the electric field. The current pick-up board has a second analog processor responsive to a magnetic field around the bus to produce a second DC output indicative of an RMS value of the magnetic field.

Abstract: A radio frequency (RF) probe head apparatus is provided for measuring voltage and current of an RF signal in a sampled transmission line. The probe head apparatus includes a conductive housing, a bus inside the conductive housing, a pair of connectors mounted on the conductive housing and configured to pass an RF signal into and out of the housing via the bus, a voltage pick-up board within the housing, and a current pickup board within the housing. The voltage pickup board has an analog processor responsive to an electric field around the bus to produce a first DC output indicative of a root-mean-square (RMS) value of the electric field. The current pick-up board has a second analog processor responsive to a magnetic field around the bus to produce a second DC output indicative of an RMS value of the magnetic field.

Abstract: A probe interface for an RF probe head improves the dissipation of heat resulting from RF power. The interface includes a conductor for transmitting RF power to a plasma chamber, and a sensing board for generating an analog signal based on the RF power. An electrically insulative bushing is disposed between the conductor and the sensing board, where the bushing is thermally conductive such that the bushing dissipates heat resulting from the RF power. By enabling the bushing to be thermally conductive, thermal instability is reduced and the overall RF power handling capacity increases.

Abstract: A radio frequency (RF) probe analysis system has a broadband design. The analysis system includes a sampling unit for generating digital power signals based on a plurality of analog signals. The analog signals characterize power delivered from an RF power delivery system to a plasma chamber. The analysis system further includes a digital processing unit for generating a digital spectrum signal based on the digital power signals. The sampling unit simultaneously samples a first plurality of frequencies from the analog signals such the that digital spectrum signal defines signal levels for the first plurality of frequencies. The sampling unit may also simultaneously sample a second plurality of frequencies from the analog signals such that the digital spectrum signal further defines signal levels for the second plurality of frequencies. The broadband architecture of the sampling unit enables closed loop control of power delivered to the chamber to tolerances unachievable through conventional approaches.

Abstract: A probe interface for an RF probe head improves the dissipation of heat resulting from RF power. The interface includes a conductor for transmitting RF power to a plasma chamber, and a sensing board for generating an analog signal based on the RF power. An electrically insulative bushing is disposed between the conductor and the sensing board, where the bushing is thermally conductive such that the bushing dissipates heat resulting from the RF power. By enabling the bushing to be thermally conductive, thermal instability is reduced and the overall RF power handling capacity increases.

Abstract: A radio frequency (RF) probe analysis system has a broadband design. The analysis system includes a sampling unit for generating digital power signals based on a plurality of analog signals. The analog signals characterize power delivered from an RF power delivery system to a plasma chamber. The analysis system further includes a digital processing unit for generating a digital spectrum signal based on the digital power signals. The sampling unit simultaneously samples a first plurality of frequencies from the analog signals such the that digital spectrum signal defines signal levels for the first plurality of frequencies. The sampling unit may also simultaneously sample a second plurality of frequencies from the analog signals such that the digital spectrum signal further defines signal levels for the second plurality of frequencies. The broadband architecture of the sampling unit enables closed loop control of power delivered to the chamber to tolerances unachievable through conventional approaches.