Patents by Inventor David James Shuman

David James Shuman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6978654
    Abstract: A method of calibrating an AFM scanner head of an AFM machine to determine the arc functions of the scanner head are provided. A method of measuring the actual orientation of an AFM tip in conjunction with the arc functions provides a way to know and control the actual AFM tip orientation for performing better AFM scans, obtaining more accurate depth measurements into a deep feature, and obtaining better portrayals of specific portions of a deep feature in AFM images. AFM images focusing on portraying specific portions of a deep feature structure may be combined to form a composite image of a representative deep feature for a sample.
    Type: Grant
    Filed: July 29, 2004
    Date of Patent: December 27, 2005
    Assignee: Infineon Technologies AG
    Inventor: David James Shuman
  • Publication number: 20050000275
    Abstract: A method of calibrating an AFM scanner head of an AFM machine to determine the arc functions of the scanner head are provided. A method of measuring the actual orientation of an AFM tip in conjunction with the arc functions provides a way to know and control the actual AFM tip orientation for performing better AFM scans, obtaining more accurate depth measurements into a deep feature, and obtaining better portrayals of specific portions of a deep feature in AFM images. AFM images focusing on portraying specific portions of a deep feature structure may be combined to form a composite image of a representative deep feature for a sample.
    Type: Application
    Filed: July 29, 2004
    Publication date: January 6, 2005
    Inventor: David James Shuman
  • Patent number: 6823713
    Abstract: A method of calibrating an AFM scanner head of an AFM machine to determine the arc functions of the scanner head are provided. A method of measuring the actual orientation of an AFM tip in conjunction with the arc functions provides a way to know and control the actual AFM tip orientation for performing better AFM scans, obtaining more accurate depth measurements into a deep feature, and obtaining better portrayals of specific portions of a deep feature in AFM images. AFM images focusing on portraying specific portions of a deep feature structure may be combined to form a composite image of a representative deep feature for a sample.
    Type: Grant
    Filed: April 11, 2003
    Date of Patent: November 30, 2004
    Assignee: Infineon Technologies AG
    Inventor: David James Shuman
  • Publication number: 20040200261
    Abstract: A method of calibrating an AFM scanner head of an AFM machine to determine the arc functions of the scanner head are provided. A method of measuring the actual orientation of an AFM tip in conjunction with the arc functions provides a way to know and control the actual AFM tip orientation for performing better AFM scans, obtaining more accurate depth measurements into a deep feature, and obtaining better portrayals of specific portions of a deep feature in AFM images. AFM images focusing on portraying specific portions of a deep feature structure may be combined to form a composite image of a representative deep feature for a sample.
    Type: Application
    Filed: April 11, 2003
    Publication date: October 14, 2004
    Inventor: David James Shuman
  • Patent number: 6715346
    Abstract: A method of scanning a deep feature using an atomic force microscopy (AFM) tip, which includes: locating and mapping the deep feature with a surface survey scan; analyzing the scan data to identify an initial optimum location; moving the AFM tip to the initial optimum location; and repeating a first procedure until the AFM tip reaches a bottom of the deep feature, which includes: (a) lowering the AFM tip in a first direction by a first distance increment; (b) measuring atomic force interactions exerted on the AFM tip to determine whether the bottom of the deep feature has been reached; (c) moving the AFM tip in a geometric pattern and within a current plane; (d) measuring atomic force interactions exerted on the AFM tip at various locations in the geometric pattern to determine a new optimum location where the atomic force interactions are minimum; and (e) moving the AFM tip to the new optimum location, repeating (a-e) until bottom has been reached, (f) then measure the depth.
    Type: Grant
    Filed: August 13, 2002
    Date of Patent: April 6, 2004
    Assignee: Infineon Technologies AG
    Inventor: David James Shuman
  • Publication number: 20040031315
    Abstract: A method of scanning a deep feature using an atomic force microscopy (AFM) tip, which includes: locating and mapping the deep feature with a surface survey scan; analyzing the scan data to identify an initial optimum location; moving the AFM tip to the initial optimum location; and repeating a first procedure until the AFM tip reaches a bottom of the deep feature, which includes: (a) lowering the AFM tip in a first direction by a first distance increment; (b) measuring atomic force interactions exerted on the AFM tip to determine whether the bottom of the deep feature has been reached; (c) moving the AFM tip in a geometric pattern and within a current plane; (d) measuring atomic force interactions exerted on the AFM tip at various locations in the geometric pattern to determine a new optimum location where the atomic force interactions are minimum; and (e) moving the AFM tip to the new optimum location, repeating (a-e) until bottom has been reached, (f) then measure the depth.
    Type: Application
    Filed: August 13, 2002
    Publication date: February 19, 2004
    Applicant: Infineon Technologies North America Corp.
    Inventor: David James Shuman