Patents by Inventor David Jen Hwang

David Jen Hwang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Arbitrary pattern direct nanostructure fabrication methods and system
    Patent number: 8728720
    Abstract: Methods of producing a nanostructure in a target film are provided. The method includes selectively irradiating at least one focusing element of a near-field focusing array that is in near-field focusing relationship with a target film in a manner sufficient to produce a nanostructure from the target film. Also provided are systems for practicing methods of the invention, as well as objects produced thereby.
    Type: Grant
    Filed: June 8, 2011
    Date of Patent: May 20, 2014
    Assignee: The Regents of the University of California
    Inventors: David Jen Hwang, Costas P. Grigoropoulos
  • High-Resolution Laser Induced Breakdown Spectroscopy Devices and Methods
    Publication number: 20120206722
    Abstract: Provided are laser induced breakdown spectroscopy (LIBS) devices. Embodiments of the devices are configured to obtain a spatial resolution of 10 ?m or less. Also provided are methods of using the subject LIBS devices to determine whether one or more elements of interest are present in a target sample. The devices and methods find use in a variety of applications, e.g., submicron and nanoscale chemical analysis applications.
    Type: Application
    Filed: June 7, 2011
    Publication date: August 16, 2012
    Inventors: Costas P. Grigoropoulos, David Jen Hwang, Jong Hyun Yoo, Richard E. Russo
  • ARBITRARY PATTERN DIRECT NANOSTRUCTURE FABRICATION METHODS AND SYSTEM
    Publication number: 20110318695
    Abstract: Methods of producing a nanostructure in a target film are provided. The method includes selectively irradiating at least one focusing element of a near-field focusing array that is in near-field focusing relationship with a target film in a manner sufficient to produce a nanostructure from the target film. Also provided are systems for practicing methods of the invention, as well as objects produced thereby.
    Type: Application
    Filed: June 8, 2011
    Publication date: December 29, 2011
    Inventors: David Jen Hwang, Costas P. Grigoropoulos
  • Method for patterning crystalline indium tin oxide using femtosecond laser
    Patent number: 7994029
    Abstract: A method for patterning crystalline indium tin oxide (ITO) using femtosecond laser is disclosed, which comprises steps of: (a) providing a substrate with an amorphous ITO layer thereon; (b) transferring the amorphous ITO layer in a predetermined area into a crystalline ITO layer by emitting a femtosecond laser beam to the amorphous ITO layer in the predetermined area; and (c) removing the amorphous ITO layer on the substrate using an etching solution.
    Type: Grant
    Filed: January 22, 2009
    Date of Patent: August 9, 2011
    Assignees: Industrial Technology Research Institute, The Regents of the University of California
    Inventors: Chung-Wei Cheng, Costas P. Grigoropoulos, David Jen Hwang, Moosung Kim
  • Method for producing active glass nanoparticles by laser ablation
    Patent number: 7985367
    Abstract: A method for producing active glass nanoparticles that exhibit upconversion is described. The method employs pulsed-laser ablation of an active glass substrate using, for example, a high repetition rate ultra-short pulse duration laser under normal atmospheric conditions or in a liquid environment.
    Type: Grant
    Filed: July 31, 2009
    Date of Patent: July 26, 2011
    Assignee: The Regents of the University of California
    Inventors: Kuniaki Hiromatsu, David Jen Hwang, Costas P. Grigoropoulos
  • METHOD FOR PRODUCING ACTIVE GLASS NANOPARTICLES BY LASER ABLATION
    Publication number: 20100072645
    Abstract: A method for producing active glass nanoparticles that exhibit upconversion is described. The method employs pulsed-laser ablation of an active glass substrate using, for example, a high repetition rate ultra-short pulse duration laser under normal atmospheric conditions or in a liquid environment.
    Type: Application
    Filed: July 31, 2009
    Publication date: March 25, 2010
    Applicant: THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
    Inventors: Kuniaki Hiromatsu, David Jen Hwang, Costas P. Grigoropoulos
  • METHOD FOR PATTERNING CRYSTALLINE INDIUM TIN OXIDE USING FEMTOSECOND LASER
    Publication number: 20090221141
    Abstract: A method for patterning crystalline indium tin oxide (ITO) using femtosecond laser is disclosed, which comprises steps of: (a) providing a substrate with an amorphous ITO layer thereon; (b) transferring the amorphous ITO layer in a predetermined area into a crystalline ITO layer by emitting a femtosecond laser beam to the amorphous ITO layer in the predetermined area; and (c) removing the amorphous ITO layer on the substrate using an etching solution.
    Type: Application
    Filed: January 22, 2009
    Publication date: September 3, 2009
    Applicants: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE, THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
    Inventors: CHUNG-WEI CHENG, COSTAS P. GRIGOROPOULOS, DAVID JEN HWANG, MOOSUNG KIM