Patents by Inventor David John Perello

David John Perello has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20260206496
    Abstract: A surface treatment for use in fabrication of superconductor devices is disclosed. The surface treatment may include an isotropic chemical etch that removes native surface oxide layers and other contaminants, followed by a conformal deposition of a thin dielectric film. The surface treatment may be performed one or more times, at any of several stages in the fabrication of a superconductor device. Applying the surface treatment to a substrate prior to junction formation may provide improved within-wafer uniformity and wafer-to-wafer reproducibility of the resistance targeting. Applying the surface treatment on top of finished junctions and ground plane materials may provide reduced microwave losses, in addition to the increased within-wafer uniformity and wafer-to-wafer reproducibility of the junction resistance.
    Type: Application
    Filed: March 31, 2025
    Publication date: July 16, 2026
    Inventors: Neha Bharat MAHULI, Jefferson Earl ROSE, Ignace JARRIGE, Omar REYNA, Joaquin MINGUZZI ARANIS, David John PERELLO, Jiansong GAO, William Maxwell JONES, Gregory Scott MACCABE, Guillaume MARCAUD, Victor LY, Matthew MATHENY, Loren SWENSON, Matthew Sullivan HUNT, Rassul KARABALIN, Oskar Jon PAINTER, Sandra Milena DIEZ PINZON
  • Publication number: 20250374833
    Abstract: A fabrication method and associated apparatus is disclosed where an electromechanical resonator made out of lithium niobate is fabricated on the same substrate as a Josephson Junction-based transmon qubit. The starting material may be a high resistivity silicon wafer with a thin layer of lithium niobate (LiNbO¬3). The fabrication method may include removing lithium niobate selectively from the substrate to preserve the quality of the substrate. The selective removal maintains defect free qualities of the silicon surface, thus enabling the fabrication of high performance Josephson Junction-based transmon qubit on the surface.
    Type: Application
    Filed: August 8, 2025
    Publication date: December 4, 2025
    Applicant: Amazon Technologies, Inc.
    Inventors: Rassul Karabalin, William Maxwell Jones, Patricio Arrangoiz Arriola, Nasser Alidoust, Gregory Scott MacCabe, David John Perello, Matthew Sullivan Hunt, Andrew Joseph Keller, Gregory Peairs, Hesam Moradinejad, Oskar Jon Painter
  • Patent number: 12408561
    Abstract: A fabrication method and associated apparatus is disclosed where an electromechanical resonator made out of lithium niobate is fabricated on the same substrate as a Josephson Junction-based transmon qubit. The starting material may be a high resistivity silicon wafer with a thin layer of lithium niobate (LiNbO¬3). The fabrication method may include removing lithium niobate selectively from the substrate to preserve the quality of the substrate. The selective removal maintains defect free qualities of the silicon surface, thus enabling the fabrication of high performance Josephson Junction-based transmon qubit on the surface.
    Type: Grant
    Filed: September 30, 2021
    Date of Patent: September 2, 2025
    Assignee: Amazon Technologies, Inc.
    Inventors: Rassul Karabalin, William Maxwell Jones, Patricio Arrangoiz Arriola, Nasser Alidoust, Gregory Scott MacCabe, David John Perello, Matthew Sullivan Hunt, Andrew Joseph Keller, Gregory Peairs, Hesam Moradinejad, Oskar Jon Painter