Patents by Inventor David Kaimon Lee

David Kaimon Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8826515
    Abstract: A write head includes a first pole P1, a P1 pedestal, a first back gap layer plated on top of the first pole P1 leaving a region between the P1 pedestal and the first back gap layer for plating a coil. Further, a first insulation layer is applied on top of the P1 pedestal and the first back gap layer and the region between the P1 pedestal and the first back gap layer. The write head further includes a coil, patterned at least partially on top of the P1 pedestal and the first back gap layer and the region between the P1 pedestal and the first back gap layer, copper plated in the coil patterns, and a second insulation layer is applied to fill the spaces in between the coil turns. The resulting structure is planarized via chemical mechanical polishing.
    Type: Grant
    Filed: April 2, 2010
    Date of Patent: September 9, 2014
    Assignee: HGST Netherlands B.V.
    Inventors: Terence Tin-Lok Lam, David Kaimon Lee, Edward Hin Pong Lee, Changqing Shi
  • Publication number: 20100187199
    Abstract: In one embodiment of the present invention, a write head includes a first pole P1, a P1 pedestal, a first back gap layer plated on top of the first pole P1 leaving a region between the P1 pedestal and the first back gap layer for plating a coil, a first insulation layer applied on top of the P1 pedestal and the first back gap layer and the region between the P1 pedestal and the first back gap layer. The write head further includes a coil, patterned at least partially on top of the P1 pedestal and the first back gap layer and the region between the P1 pedestal and the first back gap layer, copper plated in the coil patterns, and a second insulation layer applied to fill the spaces in between the coil turns. The resulting structure is planarized via chemical mechanical polishing.
    Type: Application
    Filed: April 2, 2010
    Publication date: July 29, 2010
    Applicant: HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V.
    Inventors: Terence Tin-Lok Lam, David Kaimon Lee, Edward Hin Pong Lee, Changqing Shi
  • Patent number: 7085100
    Abstract: A magnetic head having improved overwrite capabilities and reduced fringing fields are described along with methods of making the same. The magnetic head has a first pole piece and a second pole piece. The first pole piece includes a first bottom pole piece layer, a pedestal portion formed over the first bottom pole piece layer, and a notched top pole portion formed over the pedestal portion. A gap layer separates the second pole piece from the notched top pole portion. The pedestal portion has a first saturation magnetization MS1 and the top pole portion has a second saturation magnetization MS2 that is greater than the first saturation magnetization MS1. The top pole portion has a substantially planar top surface over which a portion of the gap layer and the second pole piece are formed.
    Type: Grant
    Filed: March 19, 2002
    Date of Patent: August 1, 2006
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Tom King Harris, III, Wen-chien David Hsiao, Gautam Mohan Khera, David Kaimon Lee, Edward Hin Pong Lee, Hugo Alberto Emilio Santini, Samuel Wei-san Yuan
  • Publication number: 20030179497
    Abstract: A magnetic head having improved overwrite capabilities and reduced fringing fields are described along with methods of making the same. The magnetic head has a first pole piece and a second pole piece. The first pole piece includes a first bottom pole piece layer, a pedestal portion formed over the first bottom pole piece layer, and a notched top pole portion formed over the pedestal portion. A gap layer separates the second pole piece from the notched top pole portion. The pedestal portion has a first saturation magnetization MS1 and the top pole portion has a second saturation magnetization MS2 that is greater than the first saturation magnetization MS1. The top pole portion has a substantially planar top surface over which a portion of the gap layer and the second pole piece are formed.
    Type: Application
    Filed: March 19, 2002
    Publication date: September 25, 2003
    Inventors: Tom King Harris, Wen-chien David Hsiao, Gautam Mohan Khera, David Kaimon Lee, Edward Hin Pong Lee, Hugo Alberto Emilio Santini, Samuel Wei-san Yuan