Patents by Inventor David Klaus

David Klaus has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method for providing information in a vehicle
    Patent number: 7944343
    Abstract: A system for providing information to a vehicle occupant includes a haptic control element which is provided in the vehicle and is configured to generate a haptic signal. An electronic control unit is operatively connected to the haptic control element and activates the haptic control element in order to indicate with a haptic signal that information is available for retrieval.
    Type: Grant
    Filed: October 7, 2007
    Date of Patent: May 17, 2011
    Assignees: Audi AG, The Board of Trustees of the Leland Stanford Junior University
    Inventors: Uwe Koser, Tilo Koch, Markus Hörwick, Tim Horenburg, Anton Obermüller, Johannes Schmid, David Jackson, Michael Shyh-Yen Ho, Edith Arnold, David Klaus
  • System and method for providing information in a vehicle
    Publication number: 20090091432
    Abstract: A system for providing information to a vehicle occupant includes a haptic control element which is provided in the vehicle and is configured to generate a haptic signal. An electronic control unit is operatively connected to the haptic control element and activates the haptic control element in order to indicate with a haptic signal that information is available for retrieval.
    Type: Application
    Filed: October 7, 2007
    Publication date: April 9, 2009
    Applicants: Audi AG, The Board of Trustees of the Leland Stanford Junior University
    Inventors: Uwe Koser, Tilo Koch, Markus Horwick, Tim Horenburg, Anton Obermuller, Johannes Schmid, David Jackson, Michael Shyh-Yen Ho, Edith Arnold, David Klaus
  • High resolution silicon-containing resist
    Publication number: 20060275694
    Abstract: Non-chemically amplified radiation sensitive resist compositions containing silicon are especially useful for lithographic applications, especially E-beam lithography. More particularly, radiation-sensitive resist compositions comprising a polymer having at least one silicon-containing moiety and at least one radiation-sensitive moiety cleavable upon radiation exposure to form aqueous base soluble moiety can be used to pattern sub-50 nm features with little or no blur.
    Type: Application
    Filed: June 7, 2005
    Publication date: December 7, 2006
    Applicant: International Business Machines Corporation
    Inventors: James Bucchignano, Wu-Song Huang, David Klaus, Lidija Sekaric, Raman Viswanathan