Patents by Inventor David L. Rentkiewicz

David L. Rentkiewicz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist compositions
    Patent number: 8252503
    Abstract: Photoresist compositions are disclosed.
    Type: Grant
    Filed: August 24, 2007
    Date of Patent: August 28, 2012
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Srinivasan Chakrapani, Munirathna Padmanaban, Muthiah Thiyagarajan, Takanori Kudo, David L. Rentkiewicz
  • Photoactive compounds
    Patent number: 7547501
    Abstract: The present application relates to photoactive materials having the formula wherein C1+ is a cation; each of R30, R31, R32, R33, R34, R35, R36, R37, R38, R39, R40, and R41 are selected from hydrogen, alkyl, alkyl chain optionally containing one or more O atoms, halide, aryl, aralkyl, alkoxyalkyl, cycloalkyl, hydroxyl, and alkoxy, the alkyl, alkyl chain optionally containing one or more O atoms, aryl, aralkyl, alkoxyalkyl, cycloalkyl, and alkoxy groups being unsubstituted or substituted.
    Type: Grant
    Filed: October 5, 2006
    Date of Patent: June 16, 2009
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Ralph R. Dammel, M. Dalil Rahman, David L. Rentkiewicz, Karl van Werden
  • PHOTORESIST COMPOSITIONS
    Publication number: 20090053652
    Abstract: Photoresist compositions are disclosed.
    Type: Application
    Filed: August 24, 2007
    Publication date: February 26, 2009
    Inventors: Srinivasan Chakrapani, Munirathna Padmanaban, Muthiah Thiyagarajan, Takanori Kudo, David L. Rentkiewicz
  • Photoactive compounds
    Patent number: 7390613
    Abstract: The present application relates to a compound of formula Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formula ?O3S—CF2CF2OCF2CF2—SO3?. The compounds are useful as photoactive materials.
    Type: Grant
    Filed: December 4, 2006
    Date of Patent: June 24, 2008
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: M. Dalil Rahman, David L. Rentkiewicz
  • Photoactive Compounds
    Publication number: 20080131810
    Abstract: The present application relates to a compound of formula Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formula ?O3S—CF2CF2OCF2CF2—SO3?. The compounds are useful as photoactive materials.
    Type: Application
    Filed: December 4, 2006
    Publication date: June 5, 2008
    Inventors: M. Dalil Rahman, David L. Rentkiewicz
  • PHOTOACTIVE COMPOUNDS
    Publication number: 20080085463
    Abstract: The present application relates to photoactive materials having the formula wherein C1+ is a cation; each of R30, R31, R32, R33, R34, R35, R36, R37, R38, R39, R40, and R41 are selected from hydrogen, alkyl, alkyl chain optionally containing one or more O atoms, halide, aryl, aralkyl, alkoxyalkyl, cycloalkyl, hydroxyl, and alkoxy, the alkyl, alkyl chain optionally containing one or more O atoms, aryl, aralkyl, alkoxyalkyl, cycloalkyl, and alkoxy groups being unsubstituted or substituted.
    Type: Application
    Filed: October 5, 2006
    Publication date: April 10, 2008
    Inventors: Ralph R. Dammel, M. Dalil Rahman, David L. Rentkiewicz, Karl van Werden