Abstract: A method is disclosed, which comprises estimating a first value of a parameter of a component, prior to a use of the component in a reactor. In an example, the parameter of the component is to change during the use of the component in the reactor. The component may be treated, subsequent to the use of the component in the reactor. A second value of the parameter of the component may be estimated, subsequent to treating the component. The second value may be compared with the first value, where a reuse of the component in the reactor is to occur in response to the second value being within a threshold range of the first value.

Abstract: A method is disclosed, which comprises estimating a first value of a parameter of a component, prior to a use of the component in a reactor. In an example, the parameter of the component is to change during the use of the component in the reactor. The component may be treated, subsequent to the use of the component in the reactor. A second value of the parameter of the component may be estimated, subsequent to treating the component. The second value may be compared with the first value, where a reuse of the component in the reactor is to occur in response to the second value being within a threshold range of the first value.

Abstract: A method is disclosed, which comprises estimating a first value of a parameter of a component, prior to a use of the component in a reactor. In an example, the parameter of the component is to change during the use of the component in the reactor. The component may be treated, subsequent to the use of the component in the reactor. A second value of the parameter of the component may be estimated, subsequent to treating the component. The second value may be compared with the first value, where a reuse of the component in the reactor is to occur in response to the second value being within a threshold range of the first value.

Abstract: Following use of a reactive process chamber, a component of the chamber, such as an edge ring that is to surround a workpiece during an etching process, may be refurbished through one or more residue removal operations followed by a surface texturing operation. The texturing operation may entail media blasting with a gaseous media propellant comprising a smaller fraction of O2 than air, such as high purity dry N2. The more inert gaseous media propellant may advantageously control oxygen contamination of a bulk metal, such as aluminum. Reconditioning may further entail a chemical treatment, which thins or completely removes, a surface oxide present after the texturing operation. The conditioned surface may then have a surface composition and texture that is capable of matching the performance of a previously unused chamber component.

Abstract: Disposable liners for shielding semiconductor reactor chamber components from erosion in the reactor chamber. More specifically, disposable metal liners and a method of forming such liners wherein the disposable liners have a dielectric material on a surface of the liners to protect semiconductor reactor chamber components from erosion. The disposable liners are formed from a metal sheet that conforms to a surface of a chamber component wherein the metal sheet is subsequently oxidized in an electrolyte free from contaminants using plasma electrolytic oxidation.

Abstract: Described are methods of cleaning debris from semiconductor etch chambers or chamber components, one method comprising directing atomized abrasive slurry onto at least some internal surfaces of such a chamber or chamber components. Apparatus for carrying out the methods are also described.

Abstract: An improved process for predictably treating a substrate surface is provided comprising the use of a pre-selected thixotropic etchants to achieve a superior and predetermined substrate surface.

Abstract: A process of producing a clean substrate for use in semi-conductor processing in which the substrate is roughened to produce microfissures therein and then treated with a high concentration of a strong acid followed by coating with a material containing at least one metal oxide.