Patents by Inventor David Lou
David Lou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11564038Abstract: An audio system includes an equatorial acoustic sensor array (EASA) that may be coupled to an object. The audio system is configured to detect, via the EASA, signals corresponding to a portion of a sound field in a local area. The detected signals are converted into a plurality of corresponding abstract representations that describe the portion of the sound field. Effects of scattering of the object are removed from the abstract representations to create adjusted abstract representations. A set of spherical harmonic (SH) coefficients is determined using the adjusted abstract representations. The set of SH coefficients describe an entirety of the sound field. And the set of SH coefficients and head related transfer functions of a user are used for binaural rendering of the reconstructed sound field to the user.Type: GrantFiled: March 19, 2021Date of Patent: January 24, 2023Assignee: Meta Platforms Technologies, LLCInventors: Jens Ahrens, Hannes Helmholz, David Lou Alon, Sebastià Vicenç Amengual Garí
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Patent number: 11345852Abstract: The present invention relates to an etchant composition, in particular to an aqueous masking layer etchant composition for use in the removal of tungsten-doped carbon masking layers from a surface of a substrate, such as a semiconductor wafer. The composition comprises (a) 10 to 40 wt. %, based on the total weight of the composition, of hydrogen peroxide; and (b) 0.1 to 2.0 wt. %, based on the total weight of the composition, of one or more corrosion inhibitors.Type: GrantFiled: August 15, 2019Date of Patent: May 31, 2022Assignee: LAM RESEARCH CORPORATIONInventors: Angela Hecke, Hongzhi Wang, David Lou
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Publication number: 20210277308Abstract: The present invention relates to an etchant composition, in particular to an aqueous masking layer etchant composition for use in the removal of tungsten-doped carbon masking layers from a surface of a substrate, such as a semiconductor wafer. The composition comprises (a) 10 to 40 wt. %, based on the total weight of the composition, of hydrogen peroxide; and (b) 0.1 to 2.0 wt. %, based on the total weight of the composition, of one or more corrosion inhibitors.Type: ApplicationFiled: August 15, 2019Publication date: September 9, 2021Inventors: Angela HECKE, Hongzhi WANG, David LOU
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Patent number: 11082794Abstract: An audio system captures audio data of test sounds through a microphone of a headset worn by a user. The test sounds are played by an external speaker, and the audio data includes audio data captured for different orientations of the headset with respect to the external speaker. A set of head-related transfer function (HRTFs) is calculated based at least in part on the audio data of the test sounds at the different orientations of the headset. A portion of the set of HRTFs is discarded to create an intermediate set of HRTFs. The discarded portion corresponding to one or more distortion regions that are based in part on wearing the headset. One or more HRTFs are generated that correspond to the discarded portion using at least some of the intermediate set of HRTFs to create an individualized set of HRTFs for the user.Type: GrantFiled: August 28, 2020Date of Patent: August 3, 2021Assignee: Facebook Technologies, LLCInventors: David Lou Alon, Maria Cuevas Rodriguez, Ravish Mehra, Philip Robinson
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Publication number: 20200396558Abstract: An audio system captures audio data of test sounds through a microphone of a headset worn by a user. The test sounds are played by an external speaker, and the audio data includes audio data captured for different orientations of the headset with respect to the external speaker. A set of head-related transfer function (HRTFs) is calculated based at least in part on the audio data of the test sounds at the different orientations of the headset. A portion of the set of HRTFs is discarded to create an intermediate set of HRTFs. The discarded portion corresponding to one or more distortion regions that are based in part on wearing the headset. One or more HRTFs are generated that correspond to the discarded portion using at least some of the intermediate set of HRTFs to create an individualized set of HRTFs for the user.Type: ApplicationFiled: August 28, 2020Publication date: December 17, 2020Inventors: David Lou Alon, Maria Cuevas Rodriguez, Ravish Mehra, Philip Robinson
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Patent number: 10798515Abstract: An audio system captures audio data of test sounds through a microphone of a headset worn by a user. The test sounds are played by an external speaker, and the audio data includes audio data captured for different orientations of the headset with respect to the external speaker. A set of head-related transfer function (HRTFs) is calculated based at least in part on the audio data of the test sounds at the different orientations of the headset. A portion of the set of HRTFs is discarded to create an intermediate set of HRTFs. The discarded portion corresponding to one or more distortion regions that are based in part on wearing the headset. One or more HRTFs are generated that correspond to the discarded portion using at least some of the intermediate set of HRTFs to create an individualized set of HRTFs for the user.Type: GrantFiled: September 6, 2019Date of Patent: October 6, 2020Assignee: Facebook Technologies, LLCInventors: David Lou Alon, Maria Cuevas Rodriguez, Ravish Mehra, Philip Robinson
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Publication number: 20200245091Abstract: An audio system captures audio data of test sounds through a microphone of a headset worn by a user. The test sounds are played by an external speaker, and the audio data includes audio data captured for different orientations of the headset with respect to the external speaker. A set of head-related transfer function (HRTFs) is calculated based at least in part on the audio data of the test sounds at the different orientations of the headset. A portion of the set of HRTFs is discarded to create an intermediate set of HRTFs. The discarded portion corresponding to one or more distortion regions that are based in part on wearing the headset. One or more HRTFs are generated that correspond to the discarded portion using at least some of the intermediate set of HRTFs to create an individualized set of HRTFs for the user.Type: ApplicationFiled: September 6, 2019Publication date: July 30, 2020Inventors: David Lou Alon, Maria Cuevas Rodriguez, Ravish Mehra, Philip Robinson
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Patent number: 10483010Abstract: A system for reducing surface and embedded charge in a substrate includes a substrate support configured to support a substrate. A vacuum ultraviolet (VUV) assembly is arranged adjacent to the substrate and includes a housing and a VUV lamp that is connected to the housing and that generates and directs ultraviolet (UV) light at the substrate. A movement device is configured to move at least one of the VUV assembly and the substrate support during exposure of the substrate to the UV light to reduce surface and embedded charge in the substrate.Type: GrantFiled: September 7, 2016Date of Patent: November 19, 2019Assignee: LAM RESEARCH AGInventors: Rafal Dylewicz, Reinhold Schwarzenbacher, Xia Man, Kenichi Sano, David Lou, Milan Pliska
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Publication number: 20180068754Abstract: A system for reducing surface and embedded charge in a substrate includes a substrate support configured to support a substrate. A vacuum ultraviolet (VUV) assembly is arranged adjacent to the substrate and includes a housing and a VUV lamp that is connected to the housing and that generates and directs ultraviolet (UV) light at the substrate. A movement device is configured to move at least one of the VUV assembly and the substrate support during exposure of the substrate to the UV light to reduce surface and embedded charge in the substrate.Type: ApplicationFiled: September 7, 2016Publication date: March 8, 2018Inventors: Rafal Dylewicz, Reinhold Schwazenbacher, Xia Man, Kenichi Sano, David Lou, Milan Pliska
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Patent number: 9846235Abstract: There are provided methods and systems for producing a wave-beam having substantially constant lateral extent over a desired range of distances, and interrogation and response system and methods utilizing the same. The method for producing a wave-beam having substantially constant lateral extent includes generating a plurality of at least partially incoherent constituent wave-beams having different divergences and directing the plurality constituent wave-beams to propagate along substantially parallel propagation axes such that the constituent wave-beams at least partially overlap and superpose to form a combined wave-beam. The divergences and intensities of the constituent wave-beams are selected such that the combined wave-beam has a desired substantially constant extent over a desired range of distances along said propagation axes.Type: GrantFiled: August 8, 2013Date of Patent: December 19, 2017Assignee: Israel Aerospace Industries Ltd.Inventors: Abraham Aharoni, David Lou Alon, Aharon Yifrach
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Publication number: 20150168554Abstract: There are provided methods and systems for producing a wave-beam having substantially constant lateral extent over a desired range of distances, and interrogation and response system and methods utilizing the same. The method for producing a wave-beam having substantially constant lateral extent includes generating a plurality of at least partially incoherent constituent wave-beams having different divergences and directing the plurality constituent wave-beams to propagate along substantially parallel propagation axes such that the constituent wave-beams at least partially overlap and superpose to form a combined wave-beam. The divergences and intensities of the constituent wave-beams are selected such that the combined wave-beam has a desired substantially constant extent over a desired range of distances along said propagation axes.Type: ApplicationFiled: August 8, 2013Publication date: June 18, 2015Inventors: Abraham Aharoni, David Lou Alon, Aharon Yifrach
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Publication number: 20120115332Abstract: A method for processing a substrate includes etching a surface of the substrate using an etching chemistry in a plasma chamber, the etching configured to define one or more features on the surface of the substrate. The features have some etch polymer residues as a result of the etching. The etching is terminated. A dry flash chemistry is applied into the plasma chamber. The plasma chamber is powered for a period of time between about 5 seconds and about 10 seconds to perform a dry flash etch. During the dry flash etch, the chamber is set to a low pressure of between about 5 mTorr and about 40 mTorr. The dry flash etch acts to weaken adhesion of the etch polymer residues to the features. The substrate is moved from plasma chamber and into a wet clean chamber for cleaning which removes the etch polymer residues during fluid cleaning.Type: ApplicationFiled: January 19, 2012Publication date: May 10, 2012Applicant: LAM RESEARCH CORPORATIONInventors: Seokmin Yun, Mark Wilcoxson, Ji Zhu, Kevin Chuang, Hsiao Wei Chang, David Lou
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Publication number: 20090211596Abstract: A system and method for removing post-etch polymer residue from a surface of a substrate includes identifying a dry flash chemistry for removing the post-etch polymer residue from the surface of the substrate. The dry flash chemistry is configured to selectively remove the post-etch polymer residue left behind by an etch operation in a region where a feature was formed through a low-k dielectric film layer. The identified dry flash chemistry is applied using a short flash process to remove at least a portion of the post-etch polymer residue while minimizing the damage to the dielectric film layer. A wet cleaning chemistry is then applied to the surface of the substrate. The application of the wet cleaning chemistry aids in substantially removing the remaining post-etch polymer residue left behind by the short flash process.Type: ApplicationFiled: July 11, 2007Publication date: August 27, 2009Applicant: LAM RESEARCH CORPORATIONInventors: Seokmin Yun, Mark Wilcoxson, Ji Zhu, Kevin Chuang, Hsiao Wei Chang, David Lou
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Publication number: 20040226619Abstract: A pressure control valve with a hydraulic system of an automatic transmission for a motor vehicle includes a valve body defining a control chamber, fluid ports communicating with the control chamber, and a valve spool having spaced pressure control lands located in the control chamber, the valve spool urged by a compression spring in an opposite direction from an electromagnetic force developed on the spool when a solenoid is energized. In one embodiment a control land is formed with a pressure feedback orifice that communicates a control port with a feedback chamber. The valve spool can be formed with different sized control lands. The feedback orifice is substantially insensitive to fluid temperature variation.Type: ApplicationFiled: February 21, 2002Publication date: November 18, 2004Inventor: Zheng David Lou
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Publication number: 20030164193Abstract: A pressure control valve with a hydraulic system of an automatic transmission for a motor vehicle includes a valve body defining a control chamber, fluid ports communicating with the control chamber, and a valve spool having spaced pressure control lands located in the control chamber, the valve spool urged by a compression spring in an opposite direction from an electromagnetic force developed on the spool when a solenoid is energized. In one embodiment a control land is formed with a pressure feedback orifice that communicates a control port with a feedback chamber. The valve spool can be formed with different sized control lands. The feedback orifice is substantially insensitive to fluid temperature variation.Type: ApplicationFiled: February 21, 2002Publication date: September 4, 2003Inventor: Zheng David Lou
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Patent number: 6435213Abstract: A pressure control valve with a hydraulic system of an automatic transmission for a motor vehicle includes a valve body defining a control chamber, fluid ports communicating with the control chamber, and a valve spool having spaced pressure control lands located in the control chamber, the valve spool urged by a compression spring in an opposite direction from an electromagnetic force developed on the spool when a solenoid is energized. In one embodiment a control land is formed with a pressure feedback orifice that communicates a control port with a feedback chamber. The valve spool can be formed with different sized control lands. The feedback orifice is substantially insensitive to fluid temperature variation.Type: GrantFiled: April 23, 1999Date of Patent: August 20, 2002Assignee: Visteon Global Technologies, Inc.Inventor: Zheng David Lou
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Publication number: 20020007857Abstract: A pressure control valve with a hydraulic system of an automatic transmission for a motor vehicle includes a valve body defining a control chamber, fluid ports communicating with the control chamber, and a valve spool having spaced pressure control lands located in the control chamber, the valve spool urged by a compression spring in an opposite direction from an electromagnetic force developed on the spool when a solenoid is energized. In one embodiment a control land is formed with a pressure feedback orifice that communicates a control port with a feedback chamber. The valve spool can be formed with different sized control lands. The feedback orifice is substantially insensitive to fluid temperature variation.Type: ApplicationFiled: April 23, 1999Publication date: January 24, 2002Inventor: ZHENG DAVID LOU