Patents by Inventor David M. Johns

David M. Johns has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190267810
    Abstract: Methods and systems for HVDC and/or MVDC power transmission and/or distribution, using circuit breakers where a series-connected stack of fully-bidirectional bipolar junction transistors is the initial interrupter in the current path. Preferably these transistors are operated with two pre-turnoff phases, to deplete minority carrier population and thus provide a faster transition to complete turnoff.
    Type: Application
    Filed: February 27, 2019
    Publication date: August 29, 2019
    Applicant: Ideal Power, Inc.
    Inventor: David M. Johns
  • Patent number: 8467208
    Abstract: The magnitude and wave shape of instantaneous alternating current and power delivered from a converter's single phase alternating current output is controlled by a closed loop power control scheme independent of the direct current input voltage to the converter. A fast averaging methodology for the value of control magnitude and wave shape of the instantaneous power delivered from the alternating current output can be used in the closed loop power control scheme to limit the magnitude of delivered power. The closed loop power control scheme can be used in both power grid-tied applications and stand-alone non-powered load line applications.
    Type: Grant
    Filed: December 27, 2010
    Date of Patent: June 18, 2013
    Assignee: Excelitas Technologies Corp.
    Inventor: David M. Johns
  • Patent number: 7859872
    Abstract: The magnitude and wave shape of instantaneous power draw from a single phase alternating current power source to a power converter is controlled by a closed loop power control scheme independent of the direct current output voltage of the converter. A fast averaging methodology for the value of control magnitude and wave shape of the instantaneous power draw by the converter from the alternating current source can be used in the closed loop power control scheme to limit the magnitude of power draw.
    Type: Grant
    Filed: May 24, 2009
    Date of Patent: December 28, 2010
    Assignee: Kaiser Systems, Inc.
    Inventor: David M. Johns
  • Patent number: 7209373
    Abstract: A high voltage pulse generator utilizes an even number of Marx cells using L-C inversion topology. Each Marx cell is associated with an individual inverter transformer having a primary winding connected to the output of an ac power supply such as a series resonant inverter. The secondary of each inverter transformer is half-wave rectified to charge the energy storage capacitors in each Marx cell. A distributed voltage sensing scheme can be provided for accurate feedback to the inverter's controller. An inductive element can be used to achieve a magnetic diode effect in the L-C inversion circuit to reduce component stress and improve efficiency. A transformer-coupled floating gate drive circuit is used to provide local power conditioning and trigger timing for discharge of the energy storage capacitors.
    Type: Grant
    Filed: December 28, 2004
    Date of Patent: April 24, 2007
    Assignee: Kaiser Systems, Inc.
    Inventors: Jeffrey Alan Oicles, David M. Johns
  • Patent number: 6882674
    Abstract: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
    Type: Grant
    Filed: December 21, 2001
    Date of Patent: April 19, 2005
    Assignee: Cymer, Inc.
    Inventors: Christian J. Wittak, William N. Partlo, Richard L. Sandstrom, Paul C. Melcher, David M. Johns, Robert B. Saethre, Richard M. Ness, Curtis L. Rettig, Robert A. Shannon, Richard C. Ujazdowski, Shahryar Rokni, Scott T. Smith, Stuart L. Anderson, John M. Algots, Ronald L. Spangler, Igor V. Fomenkov, Thomas D. Steiger, Jerome A. Emilo, Clay C. Titus, Alex P. Ivaschenko, Paolo Zambon, Gamaralalage G. Padmabandu, Mark S. Branham, Sunjay Phatak, Raymond F. Cybulski
  • Patent number: 6757316
    Abstract: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
    Type: Grant
    Filed: May 11, 2001
    Date of Patent: June 29, 2004
    Assignee: Cymer, Inc.
    Inventors: Peter C. Newman, Thomas P. Duffey, William N. Partlo, Richard L. Sandstrom, Paul C. Melcher, David M. Johns, Robert B. Saethre, Vladimir B. Fleurov, Richard M. Ness, Curtis L. Rettig, Robert A. Shannon, Richard C. Ujazdowski, Shahryar Rokni, Xiaojiang J. Pan, Vladimir Kulgeyko, Scott T. Smith, Stuart L. Anderson, John M. Algots, Ronald L. Spangler, Igor V. Fomenkov
  • Publication number: 20030118072
    Abstract: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
    Type: Application
    Filed: December 21, 2001
    Publication date: June 26, 2003
    Inventors: Christian J. Wittak, William N. Partlo, Richard L. Sandstrom, Paul C. Melcher, David M. Johns, Robert B. Saethre, Richard M. Ness, Curtis L. Rettig, Robert A. Shannon, Richard C. Ujazdowski, Shahryar Rokni, Scott T. Smith, Stuart L. Anderson, John M. Algots, Ronald L. Spangler, Igor V. Fomenkov, Thomas D. Steiger, Jerome A. Emilo, Clay C. Titus, Alex P. Ivaschenko, Paolo Zambon, Gamaralalage G. Padmabandu, Mark S. Branham, Sunjay Phatak, Raymond F. Cybulski
  • Publication number: 20020021728
    Abstract: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
    Type: Application
    Filed: May 11, 2001
    Publication date: February 21, 2002
    Inventors: Peter C. Newman, Thomas P. Duffey, William N. Partlo, Richard L. Sandstrom, Paul C. Melcher, David M. Johns, Robert B. Saethre, Vladimir B. Fleurov, Richard M. Ness, Curtis L. Rettig, Robert A. Shannon, Richard C. Ujazdowski, Shahryar Rokni, Xiaojiang J. Pan, Vladimir Kulgeyko, Scott T. Smith, Stuart L. Anderson, John M. Algots, Ronald L. Spangler, Igor V. Fomenkov
  • Patent number: 6327286
    Abstract: An improvement over prior art voltage timing compensation circuits is achieved by incorporating a function generator to provide a more accurate non-linear compensation to pulse timing delay, which is typically a non-linear function of voltage. An improvement over prior art temperature timing compensation circuits is achieved by providing for actual temperature measurements to be made and used to drive the timing compensation circuitry for a more accurate temperature timing compensation than provided by prior art temperature synthesis, while still using a relatively simple compensating circuit. In some embodiments a timing compensation circuit combines both voltage and temperature timing compensation.
    Type: Grant
    Filed: December 21, 1999
    Date of Patent: December 4, 2001
    Assignee: Cymer, Inc.
    Inventors: Richard M. Ness, William N. Partlo, Richard L. Sandstrom, David M. Johns