Patents by Inventor David Malcolm Camm
David Malcolm Camm has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 9627244Abstract: Apparatuses and methods for supporting a workpiece such as a semiconductor wafer. A support system is configured to support the workpiece while allowing thermally-induced motion of the workpiece, which may include thermal bowing or thermal bending. The system may include a support member having a moveable engagement portion engageable with the workpiece, the engagement portion being moveable to allow the thermally-induced motion of the workpiece while supporting the workpiece. The moveable engagement portion may include a plurality of moveable engagement portions of a plurality of respective support members, which may be resiliently engageable with the workpiece. The support members may include flexible support members each having an unconstrained portion and a constrained portion, and the moveable engagement portions may include the unconstrained portions.Type: GrantFiled: December 19, 2003Date of Patent: April 18, 2017Assignee: Mattson Technology, Inc.Inventors: David Malcolm Camm, Guillaume Sempere, Ljubomir Kaludjercic, Gregory Stuart, Mladen Bumbulovic, Tim Tran, Sergiy Dets, Tony Komasa, Marc Rudolph, Joseph Cibere
-
Patent number: 9482468Abstract: A first heat-treating method involves monitoring at least one thermal efficiency parameter associated with an irradiance system configured to produce an irradiance flash incident on a surface of a workpiece, and automatically updating control information used by the irradiance system to produce the irradiance flash, in response to the monitoring of the thermal efficiency parameter. A second method involves predicting a heating effect of an irradiance flash to be incident upon a surface of a workpiece, in response to a measurement of a heating parameter of the surface, and pre-adjusting the irradiance flash, in response to the predicted heating effect. A third method involves measuring a temperature of a surface of a workpiece during an initial portion of an irradiance flash incident on the surface, and controlling a power of a remaining portion of the irradiance flash, in response to the temperature.Type: GrantFiled: September 14, 2006Date of Patent: November 1, 2016Assignee: Mattson Technology, Inc.Inventors: David Malcolm Camm, Sergiy Dets, Kevin McDonnell, Greg Stuart, Tilman Thrum, Igor Rudic, Ljubomir Kaludjercic
-
Patent number: 9279727Abstract: A method and system for determining a shape of an irradiance pulse to which a semiconductor wafer is to be exposed during a thermal cycle are disclosed. The method includes receiving, with a processor circuit, thermal cycle parameters specifying requirements of the thermal cycle, and determining, with the processor circuit, a shape of a heating portion of the irradiance pulse. Determining includes optimizing at least one parameter of a flux profile model of the heating portion of the irradiance pulse to satisfy the requirements while minimizing frequency-domain energy spectral densities of the flux profile model at resonant frequencies of the wafer, to minimize vibration of the wafer at the resonant frequencies when the wafer is exposed to the irradiance pulse.Type: GrantFiled: October 14, 2011Date of Patent: March 8, 2016Assignee: Mattson Technology, Inc.Inventors: Joseph Cibere, David Malcolm Camm
-
Patent number: 9245730Abstract: An apparatus for generating electromagnetic radiation includes an envelope, a vortex generator configured to generate a vortexing flow of liquid along an inside surface of the envelope, first and second electrodes within the envelope configured to generate a plasma arc therebetween, and an insulative housing associated surrounding at least a portion of an electrical connection to one of the electrodes. The apparatus further includes a shielding system configured to block electromagnetic radiation emitted by the arc to prevent the electromagnetic radiation from striking all inner surfaces of the insulative housing. The apparatus further includes a cooling system configured to cool the shielding system.Type: GrantFiled: February 24, 2012Date of Patent: January 26, 2016Assignee: Mattson Technology, Inc.Inventors: Amar B. Kamdar, David Malcolm Camm, Mladen Bumbulovic, Peter Lembesis
-
Patent number: 9070590Abstract: Methods and apparatus for heat-treating a workpiece are disclosed. An illustrative method includes measuring deformation of a workpiece during heat-treating thereof, and taking an action in relation to the heat-treating of the workpiece, in response to the measuring of the deformation of the workpiece. The workpiece may include a semiconductor wafer. Taking an action may include applying a deformation correction to a temperature or reflectivity measurement of the wafer during thermal processing, or may include modifying the heat-treating of the wafer, for example.Type: GrantFiled: May 15, 2009Date of Patent: June 30, 2015Assignee: Mattson Technology, Inc.Inventors: David Malcolm Camm, Joseph Cibere, Greg Stuart, Steve McCoy
-
Publication number: 20150035436Abstract: An apparatus for generating electromagnetic radiation includes an envelope, a vortex generator configured to generate a vortexing flow of liquid along an inside surface of the envelope, first and second electrodes within the envelope configured to generate a plasma arc therebetween, and an insulative housing associated surrounding at least a portion of an electrical connection to one of the electrodes. The apparatus further includes a shielding system configured to block electromagnetic radiation emitted by the arc to prevent the electromagnetic radiation from striking all inner surfaces of the insulative housing. The apparatus further includes a cooling system configured to cool the shielding system.Type: ApplicationFiled: February 24, 2012Publication date: February 5, 2015Applicant: MATTSON TECHNOLOGY, INC.Inventors: Amar B. Kamdar, David Malcolm Camm, Mladen Bumbulovic, Peter Lembesis
-
Patent number: 8693857Abstract: A method of heat-treating a workpiece includes generating an initial heating portion and a subsequent sustaining portion of an irradiance pulse incident on a target surface area of the workpiece. A combined duration of the initial heating portion and the subsequent sustaining portion is less than a thermal conduction time of the workpiece. The initial heating portion heats the target surface area to a desired temperature and the subsequent sustaining portion maintains the target surface area within a desired range from the desired temperature. Another method includes generating such an initial heating portion and subsequent sustaining portion of an irradiance pulse, monitoring at least one parameter indicative of a presently completed amount of a desired thermal process during the irradiance pulse, and modifying the irradiance pulse in response to deviation of the at least one parameter from an expected value.Type: GrantFiled: July 13, 2011Date of Patent: April 8, 2014Assignee: Mattson Technology, Inc.Inventors: David Malcolm Camm, Steve McCoy, Greg Stuart
-
Publication number: 20130306871Abstract: A method and system for determining a shape of an irradiance pulse to which a semiconductor wafer is to be exposed during a thermal cycle are disclosed. The method includes receiving, with a processor circuit, thermal cycle parameters specifying requirements of the thermal cycle, and determining, with the processor circuit, a shape of a heating portion of the irradiance pulse. Determining includes optimizing at least one parameter of a flux profile model of the heating portion of the irradiance pulse to satisfy the requirements while minimizing frequency-domain energy spectral densities of the flux profile model at resonant frequencies of the wafer, to minimize vibration of the wafer at the resonant frequencies when the wafer is exposed to the irradiance pulse.Type: ApplicationFiled: October 14, 2011Publication date: November 21, 2013Applicant: Mattson Technology, Inc.Inventors: Joseph Cibere, David Malcolm Camm
-
Patent number: 8454356Abstract: An apparatus for supporting a workpiece during heat-treating includes a support plate having a non-planar upper surface, and a support system. The support system is configured to support the workpiece above the support plate during heat-treating of the workpiece, such that a lower surface of an initial shape of the workpiece is supported at a non-uniform spacing above the non-planar upper surface of the support plate, said non-uniform spacing including an edge gap beneath an outer perimeter of the workpiece, and a central gap at a central axis of the workpiece.Type: GrantFiled: November 15, 2007Date of Patent: June 4, 2013Assignee: Mattson Technology, Inc.Inventors: David Malcolm Camm, Joseph Cibere, Mladen Bumbulovic
-
Patent number: 8434341Abstract: An apparatus for supporting a semiconductor workpiece includes a heating system configured to cause thermally-induced motion of the semiconductor workpiece by heating a surface of the workpiece relative to a bulk of the workpiece. The thermally-induced motion includes vertical motion of an outer edge region of the workpiece and a center of the workpiece relative to each other. The apparatus further includes a support system configured to allow the thermally-induced motion including the vertical motion of the outer edge region of the workpiece and the center of the workpiece relative to each other while supporting the workpiece.Type: GrantFiled: January 27, 2012Date of Patent: May 7, 2013Assignee: Mattson Technology, Inc.Inventors: David Malcolm Camm, Guillaume Sempere, Ljubomir Kaludjercic, Gregory Stuart, Mladen Bumbulovic, Tim Tran, Sergiy Dets, Tony Komasa, Marc Rudolph, Joseph Cibere
-
Patent number: 8384274Abstract: An apparatus for producing electromagnetic radiation includes a flow generator configured to generate a flow of liquid along an inside surface of an envelope, first and second electrodes configured to generate an electrical arc within the envelope to produce the electromagnetic radiation, and an exhaust chamber extending outwardly beyond one of the electrodes, configured to accommodate a portion of the flow of liquid. In another aspect, the flow generator is electrically insulated. In another aspect, the electrodes are configured to generate an electrical discharge pulse to produce an irradiance flash, and the apparatus includes a removal device configured to remove particulate contamination from the liquid, the particulate contamination being released during the flash and being different than that released by the electrodes during continuous operation.Type: GrantFiled: July 13, 2010Date of Patent: February 26, 2013Assignee: Mattson Technology, Inc.Inventors: David Malcolm Camm, Chee Chin, Rick Doolan, Tony Hewett, Arne Kjorvel, Tony Komasa, Mike Krasnich, Steve McCoy, Joseph Reyers, Igor Rudic, Ludmila Shepelev, Greg Stuart, Tilman Thrum, Alex Viel
-
Publication number: 20120118867Abstract: An apparatus for supporting a semiconductor workpiece includes a heating system configured to cause thermally-induced motion of the semiconductor workpiece by heating a surface of the workpiece relative to a bulk of the workpiece. The thermally-induced motion includes vertical motion of an outer edge region of the workpiece and a center of the workpiece relative to each other. The apparatus further includes a support system configured to allow the thermally-induced motion including the vertical motion of the outer edge region of the workpiece and the center of the workpiece relative to each other while supporting the workpiece.Type: ApplicationFiled: January 27, 2012Publication date: May 17, 2012Applicant: Mattson Technology Canada, Inc.Inventors: David Malcolm Camm, Guillaume Sempere, Ljubomir Kaludjercic, Gregory Stuart, Mladen Bumbulovic, Tim Tran, Sergiy Dets, Tony Komasa, Marc Rudolph, Joseph Cibere
-
Publication number: 20110274417Abstract: A method of heat-treating a workpiece includes generating an initial heating portion and a subsequent sustaining portion of an irradiance pulse incident on a target surface area of the workpiece. A combined duration of the initial heating portion and the subsequent sustaining portion is less than a thermal conduction time of the workpiece. The initial heating portion heats the target surface area to a desired temperature and the subsequent sustaining portion maintains the target surface area within a desired range from the desired temperature. Another method includes generating such an initial heating portion and subsequent sustaining portion of an irradiance pulse, monitoring at least one parameter indicative of a presently completed amount of a desired thermal process during the irradiance pulse, and modifying the irradiance pulse in response to deviation of the at least one parameter from an expected value.Type: ApplicationFiled: July 13, 2011Publication date: November 10, 2011Applicant: Mattson Technology Canada, Inc.Inventors: David Malcolm Camm, Steve McCoy, Greg Stuart
-
Patent number: 8005351Abstract: A method of heat-treating a workpiece includes generating an initial heating portion and a subsequent sustaining portion of an irradiance pulse incident on a target surface area of the workpiece. A combined duration of the initial heating portion and the subsequent sustaining portion is less than a thermal conduction time of the workpiece. The initial heating portion heats the target surface area to a desired temperature and the subsequent sustaining portion maintains the target surface area within a desired range from the desired temperature. Another method includes generating such an initial heating portion and subsequent sustaining portion of an irradiance pulse, monitoring at least one parameter indicative of a presently completed amount of a desired thermal process during the irradiance pulse, and modifying the irradiance pulse in response to deviation of the at least one parameter from an expected value.Type: GrantFiled: March 21, 2008Date of Patent: August 23, 2011Assignee: Mattson Technology Canada, Inc.Inventors: David Malcolm Camm, Steve McCoy, Greg Stuart
-
Publication number: 20110177624Abstract: Methods and apparatus for heat-treating a workpiece are disclosed. An illustrative method includes measuring deformation of a workpiece during heat-treating thereof, and taking an action in relation to the heat-treating of the workpiece, in response to the measuring of the deformation of the workpiece. The workpiece may include a semiconductor wafer. Taking an action may include applying a deformation correction to a temperature or reflectivity measurement of the wafer during thermal processing, or may include modifying the heat-treating of the wafer, for example.Type: ApplicationFiled: May 15, 2009Publication date: July 21, 2011Inventors: David Malcolm Camm, Joseph Cibere, Greg Stuart, Steve McCoy
-
Publication number: 20100276611Abstract: An apparatus for producing electromagnetic radiation includes a flow generator configured to generate a flow of liquid along an inside surface of an envelope, first and second electrodes configured to generate an electrical arc within the envelope to produce the electromagnetic radiation, and an exhaust chamber extending outwardly beyond one of the electrodes, configured to accommodate a portion of the flow of liquid. In another aspect, the flow generator is electrically insulated. In another aspect, the electrodes are configured to generate an electrical discharge pulse to produce an irradiance flash, and the apparatus includes a removal device configured to remove particulate contamination from the liquid, the particulate contamination being released during the flash and being different than that released by the electrodes during continuous operation.Type: ApplicationFiled: July 13, 2010Publication date: November 4, 2010Applicant: Mattson Technology Canada, Inc.Inventors: David Malcolm Camm, Chee Chin, Rick Doolan, Tony Hewett, Arne Kjorvel, Tony Komasa, Mike Krasnich, Steve McCoy, Joseph Reyers, Igor Rudic, Ludmila Shepelev, Greg Stuart, Tilman Thrum, Alex Viel
-
Patent number: 7781947Abstract: An apparatus for producing electromagnetic radiation includes a flow generator configured to generate a flow of liquid along an inside surface of an envelope, first and second electrodes configured to generate an electrical arc within the envelope to produce the electromagnetic radiation, and an exhaust chamber extending outwardly beyond one of the electrodes, configured to accommodate a portion of the flow of liquid. In another aspect, the flow generator is electrically insulated. In another aspect, the electrodes are configured to generate an electrical discharge pulse to produce an irradiance flash, and the apparatus includes a removal device configured to remove particulate contamination from the liquid, the particulate contamination being released during the flash and being different than that released by the electrodes during continuous operation.Type: GrantFiled: February 12, 2004Date of Patent: August 24, 2010Assignee: Mattson Technology Canada, Inc.Inventors: David Malcolm Camm, Chee Chin, Rick Doolan, Tony Hewett, Arne Kjorvel, Tony Komasa, Mike Krasnich, Steve McCoy, Joseph Reyers, Igor Rudic, Ludmila Shepelev, Greg Stuart, Tilman Thrum, Alex Viel
-
Patent number: 7501607Abstract: Apparatuses and methods for suppressing thermally induced motion of a workpiece. An apparatus includes a workpiece heating system configured to thermally induce motion of a workpiece, and further includes a damping member spaced apart from the workpiece and configured to apply a damping force to dampen the motion of the workpiece. The damping member may be spaced apart from a rest position of the workpiece by a distance sufficiently small that gas pressure between the damping member and the workpiece opposes the motion of the workpiece. The distance is preferably adjustable.Type: GrantFiled: December 20, 2004Date of Patent: March 10, 2009Assignee: Mattson Technology Canada, Inc.Inventors: David Malcolm Camm, Mladen Bumbulovic, Joseph Cibere, J. Kiefer Elliott, Steve McCoy, Greg Stuart
-
Publication number: 20080273867Abstract: A method of heat-treating a workpiece includes generating an initial heating portion and a subsequent sustaining portion of an irradiance pulse incident on a target surface area of the workpiece. A combined duration of the initial heating portion and the subsequent sustaining portion is less than a thermal conduction time of the workpiece. The initial heating portion heats the target surface area to a desired temperature and the subsequent sustaining portion maintains the target surface area within a desired range from the desired temperature. Another method includes generating such an initial heating portion and subsequent sustaining portion of an irradiance pulse, monitoring at least one parameter indicative of a presently completed amount of a desired thermal process during the irradiance pulse, and modifying the irradiance pulse in response to deviation of the at least one parameter from an expected value.Type: ApplicationFiled: March 21, 2008Publication date: November 6, 2008Applicant: Mattson Technology Canada, Inc.Inventors: David Malcolm Camm, Steve McCoy, Greg Stuart
-
Publication number: 20080157452Abstract: An apparatus for supporting a workpiece during heat-treating includes a support plate having a non-planar upper surface, and a support system. The support system is configured to support the workpiece above the support plate during heat-treating of the workpiece, such that a lower surface of an initial shape of the workpiece is supported at a non-uniform spacing above the non-planar upper surface of the support plate, said non-uniform spacing including an edge gap beneath an outer perimeter of the workpiece, and a central gap at a central axis of the workpiece.Type: ApplicationFiled: November 15, 2007Publication date: July 3, 2008Applicant: Mattson Technology Canada, Inc.Inventors: David Malcolm Camm, Joseph Cibere, Mladen Bumbulovic