Abstract: A reactor for coating particles includes one or more motors, a rotary vacuum chamber configured to hold particles to be coated, wherein the rotary vacuum chamber is coupled to the motors, a controller configured to cause the motors to rotate the rotary vacuum chamber about an axial axis of the rotary vacuum chamber such that the particles undergo tumbling agitation, a vacuum port to exhaust gas from the rotary vacuum chamber, a paddle assembly including a rotatable drive shaft extending through the rotary vacuum chamber and coupled to the motors and at least one paddle extending radially from the drive shaft, such that rotation of the drive shaft by the motors orbits the paddle about the drive shaft in a second direction, and a chemical delivery system including a gas outlet on the paddle configured inject process gas into the particles.

Abstract: An additive manufacturing apparatus includes a platform, a dispenser configured to deliver a plurality of successive layers of feed material on the platform, at least one energy source to selectively fuse feed material in a layer on the platform, and an air knife supply unit. The air knife supply unit includes a tube having a plurality of holes spaced along a length of the tube, a multi-fluted helical screw positioned in the tube, a gas inlet configured to supply a gas into an end of the tube with the screw configured to guide the gas from the gas inlet through the tube and out the holes, and a spiral plenum surrounding the tube with the spiral plenum including an inner end to receive gas from the holes and an outer end to deliver the gas over the platform.

Abstract: A chemical mechanical polishing apparatus includes a platen to support a polishing pad, and an in-situ acoustic emission monitoring system including an acoustic emission sensor supported by the platen, a waveguide configured to extending through at least a portion of the polishing pad, and a processor to receive a signal from the acoustic emission sensor. The in-situ acoustic emission monitoring system is configured to detect acoustic events caused by deformation of the substrate and transmitted through the waveguide, and the processor is configured to determine a polishing endpoint based on the signal.

Abstract: A gas distribution assembly for applying a coating on an interior of a plurality of components includes a support with a plurality of component cavities formed within the support. Each component cavity corresponds to a respective component to fluidly couple with an interior of the respective component. A first gas source flow line is fluidly coupled with each of the component cavities to provide a first gas from a first gas source to each of the component cavities, and a second gas source flow line is fluidly coupled with each of the component cavities to provide a second gas from a second gas source to each of the component cavities.

Abstract: An additive manufacturing apparatus includes a platform, a dispenser configured to deliver a plurality of successive layers of feed material onto the platform, a light source assembly to generate a first light beam and a second light beam, a beam combiner configured to combine the first light beam and the second light beam into a common light beam, and a mirror scanner configured to direct the common light beam towards the platform to deliver energy along a scan path on an outermost layer of feed material.

Abstract: A retaining ring for a polishing process is disclosed. The retaining ring includes a body comprising an upper portion and a lower portion, and a sacrificial surface disposed on the lower portion, the sacrificial surface comprising a negative tapered surface having a taper height that is about 0.0003 inches to about 0.00015 inches.

Abstract: A retaining ring for a polishing process is disclosed. The retaining ring includes a body comprising an upper portion and a lower portion, and a sacrificial surface disposed on the lower portion, the sacrificial surface comprising a negative tapered surface having a taper height that is about 0.0003 inches to about 0.00015 inches.

Abstract: An additive manufacturing apparatus includes a platform, a dispenser to dispense successive layers of feed material on the platform, a heat source above the platform, an energy source to emit a beam of energy to impinge a second region of the topmost layer, a sensor system to measure temperatures of the topmost layer of feed material and to measure a dimension of a melt pool in the second region, and a controller. The heat source is configured to deliver energy to a first region of a topmost layer of the successive layers of feed material to pre-heat and/or heat-treat the first region. The controller is configured to operate the heat source to heat the topmost layer of feed material based on the measured temperatures, and operate the energy source to fuse feed material in the topmost layer based on the measured dimension.

Abstract: An additive manufacturing system includes a platform, a dispenser to dispense a plurality of layers of feed material on a top surface of the platform, a light source to generate a first light beam and a second light beam, a polygon mirror scanner, a galvo mirror scanner positioned adjacent to the polygon mirror scanner, and a controller. The controller is coupled to the light source, the polygon mirror scanner and the galvo mirror scanner, and the controller is configured to cause the light source and polygon mirror scanner to apply the first light beam to a region of the layer of feed material, and to cause the light source and galvo mirror scanner to apply the second light beam to at least a portion of the region of the layer of feed material.

Abstract: A method of additive manufacturing includes storing a plurality of predetermined cell processing recipes, dispensing a layer of a plurality of successive layers of feed material on a platform, receiving data describing an area of the layer of the feed material to fuse, determining a combination of a plurality of non-overlapping cells that substantially cover the area, and sequentially processing the plurality of cells. Each cell processing recipe includes scan path data indicating a path for an energy beam to follow, and different cell processing recipes having different paths for the energy beam. Each cell of the plurality of cells gets an associated cell processing recipe selected from the plurality of predetermined cell processing recipes. Each cell is processed by causing an energy beam to follow the first path for the cell processing recipe associated with the cell.

Abstract: An additive manufacturing apparatus and methods relating to forming multiple layers on an object on a support including dispensing a layer of feed material over the support, fusing a portion of the layer of feed material to form a fused portion in the layer, determining to rework a particular region in the fused portion, and reworking the particular region. Reworking the particular region includes establishing a gas flow directed towards the particular region and producing a melt pool having a keyhole within the particular region.

Abstract: An additive manufacturing apparatus includes a platform, a dispenser to deliver a plurality of successive layers of feed material on the platform, a light source to generate one or more light beams, a first galvo mirror scanner positioned to direct a first light beam onto a topmost layer of the plurality of successive layers, a second galvo mirror scanner positioned to direct a second light beam onto the topmost layer of the plurality of successive layers, and a controller configured to cause the first galvo mirror scanner to direct the first light beam to pre-heat or heat-treat an area of the topmost layer and to cause the second galvo mirror scanner to direct the second light beam to fuse the area of the topmost layer.

Abstract: An additive manufacturing system includes a platform, a dispenser to dispense a plurality of layers of feed material on a top surface of the platform, a light source to generate three light beams, a first polygon mirror scanner, a galvo mirror scanner, and a second polygon mirror scanner configured to direct the first, second and third light beams, respectively, to impinge the layer of the feed material on the platform, and a controller. The controller is configured to cause the light source and first and second polygon mirror scanners to apply the first light beam to a region of the layer of feed material, and to cause the light source and galvo mirror scanner to apply the second light beam to at least a portion of the region of the layer of feed material.

Abstract: An additive manufacturing system includes a platform to support an object to be fabricated, a dispenser to deliver a plurality of layers of a feed material over the platform, a controller configured to store digital data representing a pre-defined pattern, a laser configured to generate a laser beam to impinge an outermost layer of the feed material and coupled to the controller to fuse the feed material in the pre-defined pattern, and a plurality of independently controllable infrared lamps, each infrared lamp directed to a different section of an outermost layer of the feed material.

Abstract: An additive manufacturing system includes a platform to support an object to be fabricated, a dispenser to deliver a plurality of layers of a feed material over the platform, a controller configured to store digital data representing a pre-defined pattern, a laser configured to generate a laser beam to impinge an outermost layer of the feed material and coupled to the controller to fuse the feed material in the pre-defined pattern, and a plurality of independently controllable infrared lamps, each infrared lamp directed to a different section of an outermost layer of the feed material.

Abstract: In some embodiments, an substrate processing system may include a chamber body, a heater assembly disposed within the chamber body, wherein the heater assembly includes a plurality of resistive heater elements coupled together to form an isothermal heated enclosure, and a process kit disposed within the isothermal heated enclosure and having an inner processing volume that includes a plurality of substrate supports to support substrates when disposed thereon, wherein the process kit includes a first processing gas inlet to provide processing gases to the inner processing volume, a first carrier gas inlet to provide a carrier gas to the inner processing volume, and a first exhaust outlet, and a first gas heater coupled via a first conduit to the first carrier gas inlet to heat the carrier gas prior to flowing into the inner processing volume.

Abstract: In some embodiments, an substrate processing system may include a chamber body, a heater assembly disposed within the chamber body, wherein the heater assembly includes a plurality of resistive heater elements coupled together to form an isothermal heated enclosure, and a process kit disposed within the isothermal heated enclosure and having an inner processing volume that includes a plurality of substrate supports to support substrates when disposed thereon, wherein the process kit includes a first processing gas inlet to provide processing gases to the inner processing volume, a first carrier gas inlet to provide a carrier gas to the inner processing volume, and a first exhaust outlet, and a first gas heater coupled via a first conduit to the first carrier gas inlet to heat the carrier gas prior to flowing into the inner processing volume.

Abstract: A chemical mechanical polishing apparatus includes a platen to support a polishing pad, and an in-situ acoustic emission monitoring system including an acoustic emission sensor supported by the platen, a waveguide configured to extending through at least a portion of the polishing pad, and a processor to receive a signal from the acoustic emission sensor. The in-situ acoustic emission monitoring system is configured to detect acoustic events caused by deformation of the substrate and transmitted through the waveguide, and the processor is configured to determine a polishing endpoint based on the signal.

Abstract: A retaining ring for a polishing process is disclosed. The retaining ring includes a body comprising an upper portion and a lower portion, and a sacrificial surface disposed on the lower portion, the sacrificial surface comprising a negative tapered surface having a taper height that is about 0.0003 inches to about 0.00015 inches.