Patents by Inventor David McParland

David McParland has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6652712
    Abstract: An inductive antenna of a plasma reactor for processing a semiconductor wafer is connected to a radio frequency (RF) power source, and consists of a conductor arranged in successive loops that wind in opposing directions, adjacent pairs of the successive loops having facing portions in which current flow is parallel, the facing portions being sufficiently close to at least nearly share a common current path, whereby to form transitions across the facing portions between opposing magnetic polarizations.
    Type: Grant
    Filed: December 19, 2001
    Date of Patent: November 25, 2003
    Assignee: Applied Materials, Inc
    Inventors: Shiang-Bau Wang, Daniel J. Hoffman, Chunshi Cui, Yan Ye, Gerardo Delgadino, David McParland, Matthew L. Miller, Douglas A. Buchberger, Jr., Steven C. Shannon
  • Publication number: 20030111181
    Abstract: An inductive antenna of a plasma reactor for processing a semiconductor wafer is connected to a radio frequency (RF) power source, and consists of a conductor arranged in successive loops that wind in opposing directions, adjacent pairs of the successive loops having facing portions in which current flow is parallel, the facing portions being sufficiently close to at least nearly share a common current path, whereby to form transitions across the facing portions between opposing magnetic polarizations.
    Type: Application
    Filed: December 19, 2001
    Publication date: June 19, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Shiang-Bau Wang, Daniel J. Hoffman, Chunshi Cui, Yan Ye, Gerardo Delgadino, David McParland, Matthew L. Miller, Douglas A. Buchberger, Steven C. Shannon