Patents by Inventor David Medieros

David Medieros has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist compositions comprising norbornene derivative polymers with acid labile groups
    Patent number: 6103445
    Abstract: Provided herein are photoresist compositions for use particularly in 193 nm lithography. These compositions generally comprise a polymer of norbornene and a photo acid generator. The disclosed compositions provide transparency at wavelengths of approximately 190-200 nm, combined with high etch resistance. The polymers also provide hydrophilicity for good positive-tone development characteristics and high glass transition temperatures. Also disclosed is a process for microfabrication utilizing the claimed compositions. A further aspect of the invention is a plasticizer comprising 4,8-di-t-butyl-tricyclo(5.2.1.0.sup.2,6)decanedicarboxylate.
    Type: Grant
    Filed: March 7, 1997
    Date of Patent: August 15, 2000
    Assignee: Board of Regents, The University of Texas System
    Inventors: C. Grant Willson, Uzodinma Okoroanyanwu, David Medieros