Abstract: A method of manufacturing a wafer holder, the wafer holder having a frame having at least one cavity capable of receiving and supporting a wafer grown from an ingot to be polished in a polishing machine, the at least one cavity having a cross sectional footprint at least equal to a cross sectional footprint of the wafer, the wafer having a thickness to cross sectional area ratio of 0.001 per unit length or less, a polymer film pad being permanently affixed in the at least one cavity, including cutting a frame from a layer of a thermoset or thermoplastic material having a thickness tolerance and measuring a thickness of the frame at at least one location thereon. The method further includes forming a cavity in the frame having a predetermined depth, and permanently affixing a polymer film pad in the cavity.

Abstract: A wafer holder is provided for use in a polishing machine. The wafer holder has a frame composed of a thermoset material and/or a thermoplastic material. The frame has at least one cavity for receiving and supporting a wafer to be polished in the polishing machine. A polymer film pad is permanently affixed in the at least one cavity.

Abstract: A wafer holder is provided for use in a polishing machine. The wafer holder has a frame composed of a thermoset material and/or a thermoplastic material. The frame has at least one cavity for receiving and supporting a wafer to be polished in the polishing machine. A polymer film pad is permanently affixed in the at least one cavity.

Abstract: A work piece holder is provided for use in a polishing machine. The work piece holder has a frame composed of a thermoset material and/or a thermoplastic material. The frame has at least one cavity for receiving and supporting a work piece to be polished in the polishing machine. A polymer film is permanently affixed in the at least one cavity.