Abstract: The application includes systems and methods for phenotyping. A request is received to identify a target population having a phenotype. Predefined characteristics associated with the phenotype are obtained. Using a retriever model, a set of subjects is identified as potential members of the target population by searching databases. Medical information is obtained by searching a second set of one or more databases and providing corresponding information to an artificial intelligence (AI) component. Natural language instructions are provided to the AI component to provide context to the AI component to determine whether a respective subject in the set of subjects has at least one of the one or more predefined characteristics. A subset of subjects is identified by the AI system to be, or to have a high likelihood of being, a member of the target population.

Abstract: A method includes detecting an incomplete entigen group within a knowledge database. The incomplete entigen group includes entigens and one or more entigen relationships between at least some of the entigens. The incomplete entigen group represents knowledge of a topic. The method further includes obtaining additive content for the topic based on the incomplete entigen group and generating an additive entigen group based on the additive content. The method further includes updating the incomplete entigen group utilizing the additive entigen group to produce an updated entigen group. The method further includes indicating that the updated entigen group has an un-curated status when the additive entigen group conflicts with the incomplete entigen group.

Abstract: Embodiments disclosed herein include methods of depositing a metal oxo photoresist using dry deposition processes. In an embodiment, the method for forming a photoresist layer over a substrate in a vacuum chamber comprises providing a metal precursor vapor into the vacuum chamber. In an embodiment, the method further comprises providing an oxidant vapor into the vacuum chamber, where a reaction between the metal precursor vapor and the oxidant vapor results in the formation of the photoresist layer on a surface of the substrate. In an embodiment, the photoresist layer is a metal oxo containing material.

Abstract: Embodiments disclosed herein include methods of depositing a metal oxo photoresist using dry deposition processes. In an embodiment, the method comprises forming a first metal oxo film on the substrate with a first vapor phase process including a first metal precursor vapor and a first oxidant vapor, and forming a second metal oxo film over the first metal oxo film with a second vapor phase process including a second metal precursor vapor and a second oxidant vapor.

Abstract: Embodiments disclosed herein include methods of depositing a metal oxo photoresist using dry deposition processes. In an embodiment, the method comprises forming a first metal oxo film on the substrate with a first vapor phase process including a first metal precursor vapor and a first oxidant vapor, and forming a second metal oxo film over the first metal oxo film with a second vapor phase process including a second metal precursor vapor and a second oxidant vapor.

Abstract: Embodiments disclosed herein include methods of depositing a metal oxo photoresist using dry deposition processes. In an embodiment, the method comprises forming a first metal oxo film on the substrate with a first vapor phase process including a first metal precursor vapor and a first oxidant vapor, and forming a second metal oxo film over the first metal oxo film with a second vapor phase process including a second metal precursor vapor and a second oxidant vapor.

Abstract: Embodiments disclosed herein include methods of depositing a metal oxo photoresist using dry deposition processes. In an embodiment, the method comprises forming a first metal oxo film on the substrate with a first vapor phase process including a first metal precursor vapor and a first oxidant vapor, and forming a second metal oxo film over the first metal oxo film with a second vapor phase process including a second metal precursor vapor and a second oxidant vapor.

Abstract: A client electronic device to provide custom functionality for video content playback. The client electronic device includes one or more processors and a non-transitory computer-readable medium having stored therein instructions, which when executed by the one or more processors, causes the client electronic device to receive a streaming manifest file and a first auxiliary manifest file, where the streaming manifest file includes references to video segments of a video content, where the first auxiliary manifest file includes timed metadata associated with the video content, where the streaming manifest file and the first auxiliary manifest file refer to a same timeline, provide the streaming manifest file to a core playback module to play the video content according to the streaming manifest file, and provide custom functionality using the timed metadata included in the first auxiliary manifest file that replaces or augments functionality provided by the core playback module.

Abstract: Embodiments disclosed herein include methods of depositing a metal oxo photoresist using dry deposition processes. In an embodiment, the method comprises forming a first metal oxo film on the substrate with a first vapor phase process including a first metal precursor vapor and a first oxidant vapor, and forming a second metal oxo film over the first metal oxo film with a second vapor phase process including a second metal precursor vapor and a second oxidant vapor.

Abstract: Embodiments disclosed herein include methods of depositing a metal oxo photoresist using dry deposition processes. In an embodiment, the method comprises forming a first metal oxo film on the substrate with a first vapor phase process including a first metal precursor vapor and a first oxidant vapor, and forming a second metal oxo film over the first metal oxo film with a second vapor phase process including a second metal precursor vapor and a second oxidant vapor.

Abstract: Embodiments disclosed herein include methods of depositing a metal oxo photoresist using dry deposition processes. In an embodiment, the method for forming a photoresist layer over a substrate in a vacuum chamber comprises providing a metal precursor vapor into the vacuum chamber. In an embodiment, the method further comprises providing an oxidant vapor into the vacuum chamber, where a reaction between the metal precursor vapor and the oxidant vapor results in the formation of the photoresist layer on a surface of the substrate. In an embodiment, the photoresist layer is a metal oxo containing material.

Abstract: A client electronic device to provide custom functionality for video content playback. The client electronic device includes one or more processors and a non-transitory computer-readable medium having stored therein instructions, which when executed by the one or more processors, causes the client electronic device to receive a streaming manifest file and a first auxiliary manifest file, where the streaming manifest file includes references to video segments of a video content, where the first auxiliary manifest file includes timed metadata associated with the video content, where the streaming manifest file and the first auxiliary manifest file refer to a same timeline, provide the streaming manifest file to a core playback module to play the video content according to the streaming manifest file, and provide custom functionality using the timed metadata included in the first auxiliary manifest file that replaces or augments functionality provided by the core playback module.

Abstract: A method by a media delivery system. The method includes generating a streaming manifest file and an auxiliary manifest file, where the streaming manifest file includes references to video segments of a video content, where the auxiliary manifest file includes timed metadata associated with the video content, and where the streaming manifest file and the auxiliary manifest file refer to a same timeline. The method further includes making the streaming manifest file and the auxiliary manifest file accessible to a client device.

Abstract: A trace comprising location data about a computing device is received at a mapping server, where the trace stores the location data about the computing device in an ordered set of points. The origin and destination of the trace are obscured. Then, the trace is then separated into a set of subtraces by dividing the received points of location data into a set of subtraces, and removing the links between subtraces of the set of subtraces. For example, subtraces can be divided based on size, distance, elapsed time, or features of interest present in the location data.

Abstract: A method by a media delivery system. The method includes generating a streaming manifest file and an auxiliary manifest file, where the streaming manifest file includes references to video segments of a video content, where the auxiliary manifest file includes timed metadata associated with the video content, and where the streaming manifest file and the auxiliary manifest file refer to a same timeline. The method further includes making the streaming manifest file and the auxiliary manifest file accessible to a client device.

Abstract: A trace comprising location data about a computing device is received at a mapping server, where the trace stores the location data about the computing device in an ordered set of points. The origin and destination of the trace are obscured. Then, the trace is then separated into a set of subtraces by dividing the received points of location data into a set of subtraces, and removing the links between subtraces of the set of subtraces. For example, subtraces can be divided based on size, distance, elapsed time, or features of interest present in the location data.

Abstract: This invention relates to processes for the production of organometallic compounds represented by the formula M(L)3 wherein M is a Group VIII metal, e.g., ruthenium, and L is the same or different and represents a substituted or unsubstituted amidinato group or a substituted or unsubstituted amidinato-like group, which process comprises (i) reacting a substituted or unsubstituted metal source compound, e.g., ruthenium (II) compound, with a substituted or unsubstituted amidinate or amidinate-like compound in the presence of a solvent and under reaction conditions sufficient to produce a reaction mixture comprising said organometallic compound, e.g., ruthenium (III) compound, and (ii) separating said organometallic compound from said reaction mixture. The organometallic compounds are useful in semiconductor applications as chemical vapor or atomic layer deposition precursors for film depositions.

Abstract: Disclosed herein is a xerographic print comprising a substrate with a toner-based image printed thereon, the printed substrate including low surface tension portions having a surface tension of no more than about 22 mN/m at 25 Deg. C. resulting in a surface tension gradient field on the substrate, the printed substrate being coated with a coating comprising at least one surfactant and a film-forming polymer, the coating having a liquid phase surface tension at 25 Deg. C. not exceeding the surface tension of the low surface tension portions of the printed substrate by more than about 2 mN/m, the coating having substantially no pinholes and being sufficiently resistant to permeation by the fuser oil to exhibit an effective absence of haze 24 hours after application. A system and a method of applying a substantially pinhole-free and haze-free coating substantially immediately after print fusing also are disclosed.

Abstract: This invention relates to processes for the production of organometallic compounds represented by the formula M(L)3 wherein M is a Group VIII metal, e.g., ruthenium, and L is the same or different and represents a substituted or unsubstituted amidinato group or a substituted or unsubstituted amidinato-like group, which process comprises (i) reacting a substituted or unsubstituted metal source compound, e.g., ruthenium (II) compound, with a substituted or unsubstituted amidinate or amidinate-like compound in the presence of a solvent and under reaction conditions sufficient to produce a reaction mixture comprising said organometallic compound, e.g., ruthenium (III) compound, and (ii) separating said organometallic compound from said reaction mixture. The organometallic compounds are useful in semiconductor applications as chemical vapor or atomic layer deposition precursors for film depositions.

Abstract: This invention relates to processes for the production of organometallic compounds represented by the formula M(L)3 wherein M is a Group VIII metal, e.g., ruthenium, and L is the same or different and represents a substituted or unsubstituted amidinato group or a substituted or unsubstituted amidinato-like group, which process comprises (i) reacting a substituted or unsubstituted metal source compound, e.g., ruthenium (II) compound, with a substituted or unsubstituted amidinate or amidinate-like compound in the presence of a solvent and under reaction conditions sufficient to produce a reaction mixture comprising said organometallic compound, e.g., ruthenium (III) compound, and (ii) separating said organometallic compound from said reaction mixture. The organometallic compounds are useful in semiconductor applications as chemical vapor or atomic layer deposition precursors for film depositions.