Abstract: An interferometric optical fibre sensor comprises optical fibre defining an optical circuit configured to propagate a first optical wave via an environment in which the optical fibre can be exposed to a stimulus that modifies the first optical wave, and a second optical wave, and to combine the first optical wave and the second optical wave to create an interference signal containing information about the stimulus, wherein optical fibre propagating either or both of the first optical wave and the second optical wave comprises hollow core optical fibre configured to propagate the optical wave or waves by an antiresonant optical guidance effect.

Abstract: An interferometric optical fibre sensor comprises optical fibre defining an optical circuit configured to propagate a first optical wave via an environment in which the optical fibre can be exposed to a stimulus that modifies the first optical wave, and a second optical wave, and to combine the first optical wave and the second optical wave to create an interference signal containing information about the stimulus, wherein optical fibre propagating either or both of the first optical wave and the second optical wave comprises hollow core optical fibre configured to propagate the optical wave or waves by an antiresonant optical guidance effect.

Abstract: An interferometric optical fibre sensor comprises optical fibre defining an optical circuit configured to propagate a first optical wave via an environment in which the optical fibre can be exposed to a stimulus that modifies the first optical wave, and a second optical wave, and to combine the first optical wave and the second optical wave to create an interference signal containing information about the stimulus, wherein optical fibre propagating either or both of the first optical wave and the second optical wave comprises hollow core optical fibre configured to propagate the optical wave or waves by an antiresonant optical guidance effect.

Abstract: An interferometric optical fibre sensor comprises optical fibre defining an optical circuit configured to propagate a first optical wave via an environment in which the optical fibre can be exposed to a stimulus that modifies the first optical wave, and a second optical wave, and to combine the first optical wave and the second optical wave to create an interference signal containing information about the stimulus, wherein optical fibre propagating either or both of the first optical wave and the second optical wave comprises hollow core optical fibre configured to propagate the optical wave or waves by an antiresonant optical guidance effect.

Abstract: The present disclosure provides methodologies for manufacturing photovoltaic devices. In particular, the disclosure relates to the use of hydrogen during manufacturing of photovoltaic devices for passivating defects in the silicon and addressing light-induced degradation. The methodologies in the present disclosures take advantage of generation and manipulation of hydrogen in the neutral or charged state to optimise defect passivation. Some of the methodologies disclose use thermal treatments, illumination with sub-bandgap photons, electric fields or defects in the silicon to control the state of charge or hydrogen, move hydrogen to different locations in the device or retain hydrogen at specific locations.

Abstract: The present disclosure is directed to a method for processing a silicon wafer that allows improving performance by exploiting the properties of crystallographic imperfections. The method comprises the steps of: forming a silicon layer with crystallographic imperfections in the proximity of a surface of the silicon; exposing at least a portion of the device to hydrogen atoms in a manner such that hydrogen atoms migrate towards the region with crystallographic imperfections and into the silicon along the crystallographic imperfections; and controlling the charge state of hydrogen atoms located at the crystallographic imperfections to be positive when the imperfections are in a p-type region of the wafer; and negative when the imperfections are at an n-type region of the wafer by thermally treating the silicon while exposing the silicon to an illumination intensity of less than 10 mW/cm2.

Abstract: The present disclosure is directed to a method for processing a silicon wafer that allows improving performance by exploiting the properties of crystallographic imperfections. The method comprises the steps of: forming a silicon layer with crystallographic imperfections in the proximity of a surface of the silicon; exposing at least a portion of the device to hydrogen atoms in a manner such that hydrogen atoms migrate towards the region with crystallographic imperfections and into the silicon along the crystallographic imperfections; and controlling the charge state of hydrogen atoms located at the crystallographic imperfections to be positive when the imperfections are in a p-type region of the wafer; and negative when the imperfections are at an n-type region of the wafer by thermally treating the silicon while exposing the silicon to an illumination intensity of less than 10 mW/cm2.

Abstract: The present disclosure provides methodologies for manufacturing photovoltaic devices. In particular, the disclosure relates to the use of hydrogen during manufacturing of photovoltaic devices for passivating defects in the silicon and addressing light-induced degradation. The methodologies in the present disclosures take advantage of generation and manipulation of hydrogen in the neutral or charged state to optimise defect passivation. Some of the methodologies disclose use thermal treatments, illumination with sub-bandgap photons, electric fields or defects in the silicon to control the state of charge or hydrogen, move hydrogen to different locations in the device or retain hydrogen at specific locations.

Abstract: The present disclosure provides methods for manufacturing a photovoltaic device that comprise a sequence of annealing steps and exposure to electromagnetic radiation during annealing that allow passivating electrically active defects and stabilising the performance of photovoltaic device.

Abstract: The present disclosure provides methods for manufacturing a photovoltaic device that comprise a sequence of annealing steps and exposure to electromagnetic radiation during annealing that allow passivating electrically active defects and stabilising the performance of photovoltaic device.

Abstract: A method of producing a planar substrate having waveguide channels, which method comprises: (i) providing a tube (6) of a substrate material; (ii) depositing silica layers (110) on the inside of the tube (6), the silica layers (110) being doped with a photosensitive material; (iii) drawing the tube (6) so that the cross-sectional size of the tube (109) is reduced; (iv) before or after the reducing of the cross-sectional size of the tube (6), causing the tube (6) to collapse into a flat shape by applying a low pressure to the tube, whereby the deposited silica layers together form a photosensitive silica layer (111); (v) cutting to required lengths the tube (6) which has been collapsed and reduced in cross-sectional size; and (vi) using laser writing to define waveguide channels in the cut lengths of the tube (6) and thereby to produce the planar substrate having the waveguide channels.

Abstract: In one embodiment, a photo-darkening resistant optical fibre includes a waveguide having a numerical aperture less than 0.15. The waveguide includes a core having a refractive index n1 and a pedestal having a refractive index n2, and wherein the fibre includes a first cladding having a refractive index n3 surrounding the pedestal, wherein n1 is greater than n2, n2 is greater than n3. The core includes silica, a concentration of alumina of between approximately 0.3 to 0.8 mole percent, a concentration of phosphate of substantially 15 mole percent, a concentration of ytterbium substantially in the range 20000 to 45000 ppm. The pedestal can include silica, phosphate and germania. The core can have substantially zero thulium dopant.

Abstract: In one embodiment, a photo-darkening resistant optical fibre includes a waveguide having a numerical aperture less than 0.15. The waveguide includes a core having a refractive index n1 and a pedestal having a refractive index n2, and wherein the fibre includes a first cladding having a refractive index n3 surrounding the pedestal, wherein n1 is greater than n2, n2 is greater than n3. The core includes silica, a concentration of alumina of between approximately 0.3 to 0.8 mole percent, a concentration of phosphate of substantially 15 mole percent, a concentration of ytterbium substantially in the range 20000 to 45000 ppm. The pedestal can include silica, phosphate and germania. The core can have substantially zero thulium dopant.

Abstract: In one embodiment, a photo-darkening resistant optical fiber includes a waveguide having a numerical aperture less than 0.15. The waveguide includes a core having a refractive index n1 and a pedestal having a refractive index n2, and wherein the fiber includes a first cladding having a refractive index n3 surrounding the pedestal, wherein n1 is greater than n2, n2 is greater than n3. The core includes silica, a concentration of alumina of between approximately 0.3 to 0.8 mole percent, a concentration of phosphate of substantially 15 mole percent, a concentration of ytterbium substantially in the range 20000 to 45000 ppm. The pedestal can include silica, phosphate and germania. The core can have substantially zero thulium dopant.

Abstract: A method of producing a planar substrate having waveguide channels, which method comprises: (i) providing a tube (6) of a substrate material; (ii) depositing silica layers (110) on the inside of the tube (6), the silica layers (110) being doped with a photosensitive material; (iii) drawing the tube (6) so that the cross-sectional size of the tube (109) is reduced; (iv) before or after the reducing of the cross-sectional size of the tube (6), causing the tube (6) to collapse into a flat shape by applying a low pressure to the tube, whereby the deposited silica layers together form a photosensitive silica layer (111); (v) cutting to required lengths the tube (6) which has been collapsed and reduced in cross-sectional size; and (vi) using laser writing to define waveguide channels in the cut lengths of the tube (6) and thereby to produce the planar substrate having the waveguide channels.

Abstract: Apparatus for providing optical radiation (10) comprising a pump array (8) for providing pump radiation (7), a first pump combiner (1), and a waveguide (3), wherein the pump radiation (7) from the pump array (8) is coupled into the waveguide (3) via the first pump combiner (1), and wherein the waveguide (3) comprises a pump guide (4) for guiding the pump radiation (7), and a gain medium (5) which emits the optical radiation (10) when it is pumped by the pump radiation (7).

Abstract: Apparatus for providing optical radiation includes a pump source and at least one first amplifying waveguide. The first amplifying waveguide emits optical radiation in excess of 1400 nm when pumped by the pump source. In one embodiment, the pump source can include a plurality of laser diodes and a plurality of second amplifying waveguides. In this arrangement the first amplifying waveguide is pumped by the second amplifying waveguides, the second amplifying waveguides are pumped by the laser diodes, and the second amplifying waveguides are configured to improve the beam quality of radiation emitted by the laser diodes.

Abstract: In one embodiment, a photo-darkening resistant optical fibre includes a waveguide having a numerical aperture less than 0.15. The waveguide includes a core having a refractive index n1 and a pedestal having a refractive index n2, and wherein the fibre includes a first cladding having a refractive index n3 surrounding the pedestal, wherein n1 is greater than n2, n2 is greater than n3. The core includes silica, a concentration of alumina of between approximately 0.3 to 0.8 mole percent, a concentration of phosphate of substantially 15 mole percent, a concentration of ytterbium substantially in the range 20000 to 45000 ppm. The pedestal can include silica, phosphate and germania. The core can have substantially zero thulium dopant.

Abstract: Apparatus for providing optical radiation (10) comprising a pump array (8) for providing pump radiation (7), a first pump combiner (1), and a waveguide (3), wherein the pump radiation (7) from the pump array (8) is coupled into the waveguide (3) via the first pump combiner (1), and wherein the waveguide (3) comprises a pump guide (4) for guiding the pump radiation (7), and a gain medium (5) which emits the optical radiation (10) when it is pumped by the pump radiation (7).

Abstract: A WDM transmitter comprising an array of M pump lasers multiplexed by an M×N multiplexer, in the form of a coupler, and used to feed an array of N optically pumped fiber lasers emitting at wavelengths ?1, ?2, . . . ?N. The parameter M determines the number of pump lasers as well as the number of inputs of the pump-multiplexing coupler and can be smaller or equal to parameter N that determines the number of optically pumped lasers. The fiber laser outputs are passed through N isolators before entering N modulators were the signals are monolithically modulated. The outputs of the modulators are passed through an array of N tunable attenuators. Finally all the individual channel outputs are recombined into a single output in a combiner. The output will typically lead to an optical network. The proposed architecture may also be used for optical amplifiers, especially fiber-based optical amplifiers.