Patents by Inventor David Norman Jamieson

David Norman Jamieson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Implanted counted dopant ions
    Patent number: 7834422
    Abstract: This invention concerns semiconductor devices of the general type comprising a counted number of dopant atoms (142) implanted in regions of a substrate (158) that are substantially intrinsic semiconductor. One or more doped surface regions (152) of the substrate (158) are metallized to form electrodes (150) and a counted number of dopant ions (142) are implanted in a region of the substantially intrinsic semiconductor.
    Type: Grant
    Filed: May 18, 2005
    Date of Patent: November 16, 2010
    Assignee: Qucor Pty. Ltd.
    Inventors: Soren Andresen, Andrew Steven Dzurak, Eric Gauja, Sean Hearne, Toby Felix Hopf, David Norman Jamieson, Mladen Mitic, Steven Prawer, Changyi Yang
  • Method and system for single ion implantation
    Patent number: 7002166
    Abstract: This invention concerns a method and system for single ion doping and machining by detecting the impact, penetration and stopping of single ions in a substrate. Such detection is essential for the successful implantation of a counted number of 31P ions into a semi-conductor substrate for construction of a Kane quantum computer. The invention particularly concerns the application of a potential across two electrodes on the surface of the substrate to create a field to separate and sweep out electron-hole pairs formed within the substrate. A detector is then used to detecting transient current in the electrodes, and so determine the arrival of a single ion in the substrate.
    Type: Grant
    Filed: August 27, 2002
    Date of Patent: February 21, 2006
    Assignee: Qucor Pty Ltd
    Inventors: David Norman Jamieson, Steven Prawer, Andrew Steven Dzurak, Robert Graham Clark, Changyi Yang
  • Method and system for single ion implanation
    Publication number: 20040232353
    Abstract: This invention concerns a method and system for single ion doping and machining by detecting the impact, penetration and stopping of single ions in a substrate. Such detection is essential for the successful implantation of a counted number of 31P ions into a semi-conductor substrate for construction of a Kane quantum computer. The invention particularly concerns the application of a potential across two electrodes on the surface of the substrate to create a field to separate and sweep out electron-hole pairs formed within the substrate. A detector is then used to detecting transient current in the electrodes, and so determine the arrival of a single ion in the substrate.
    Type: Application
    Filed: June 22, 2004
    Publication date: November 25, 2004
    Inventors: David Norman Jamieson, Steven Prawer, Andrew Steven Dzurak, Robert Graham Clark, Changyi Yang