Patents by Inventor David O. Melville
David O. Melville has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10516767Abstract: A method of presenting data over a Web service interface includes: establishing, by a first computer process, a persistent transmission control protocol (TCP) network connection between the first computer process and a second computer process; dynamically allocating, by the second computer process, memory in response to receipt of static data over the persistent TCP network connection from the first computer process; updating, by the second computer process, the memory in response to receipt of dynamic data received over the persistent TCP network connection from the first computer process; and enabling, by the second computer process, a Web server to access the updated data for presentation by the Web service interface. The static data identifies a given entity and the dynamic data includes metric data provided for the entity.Type: GrantFiled: April 18, 2016Date of Patent: December 24, 2019Assignee: GLOBALFOUNDRIES INC.Inventors: Amith Singhee, Steven Hirsch, Ashok Pon Kumar Sree Prakash, Ulrich A. Finkler, David O. Melville, Scott M. Mansfield
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Patent number: 10169716Abstract: A system and method are provided for shared machine learning. The method includes providing a model to a plurality of agents included in a machine learning system. The model specifies attributes and attribute value data types for an event in which the agents act. The method further includes receiving agent-provided inputs during an instance of the event. The agent-provided inputs include estimated attribute values that are consistent with the attribute value data types. The method also includes determining expertise weights for at least some agents in response to at least one ground-truth which is learned from the estimated attribute values. The method additionally includes determining an estimate value for one or more of the attributes using respective adaptive mixtures of the estimated attribute values.Type: GrantFiled: June 24, 2015Date of Patent: January 1, 2019Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Brian P. Gaucher, Jonathan Lenchner, David O. Melville, Valentina Salapura
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Patent number: 10095918Abstract: A method for interpreting interpersonal communication includes monitoring a first interaction between two or more individuals using a set of monitoring devices including a camera, a microphone, and the like. A culture and personality type of at least one individual is identified based on the monitored first interaction. First cultural/personality profile information specific to the identified culture and personality type is retrieved from a database of cultural/personality profile information. A second interaction between the two or more individuals is monitored using the set of monitoring devices. A first facial expression, gesture, vocal intonation, or indication of emotional state derived from biometric data of the at least one individual is identified based on the monitored second interaction. The identified first expression is interpreted using the first cultural/personality profile information. The interpretation of the identified first expression is communicated to a user.Type: GrantFiled: July 20, 2017Date of Patent: October 9, 2018Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Dario Gil, Joseph N. Kozhaya, David O. Melville, Valentina Salapura
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Patent number: 9857676Abstract: A system and method for optimizing (designing) a mask pattern, in which SMO and OPC are collaboratively used to exert a sufficient collaborative effect or are appropriately used in different manners. The method for designing a source and a mask for lithography includes a step (S1) of selecting a set of patterns; a step of performing source mask optimization (SMO) using the set of patterns, under an optical proximity correction (OPC) restriction rule which is used for selectively restricting shifting of an edge position of a polygon when OPC is applied to the set of patterns; and a step (S3, S4) of determining a layout of the mask for lithography, by applying OPC to all patterns constituting the mask for lithography using the source optimized through the SMO.Type: GrantFiled: May 9, 2014Date of Patent: January 2, 2018Assignee: International Business Machines CorporationInventors: Tadanobu Inoue, David O. Melville, Alan E. Rosenbluth, Masaharu Sakamoto, Kehan Tian
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Publication number: 20170323153Abstract: A method for interpreting interpersonal communication includes monitoring a first interaction between two or more individuals using a set of monitoring devices including a camera, a microphone, and the like. A culture and personality type of at least one individual is identified based on the monitored first interaction. First cultural/personality profile information specific to the identified culture and personality type is retrieved from a database of cultural/personality profile information. A second interaction between the two or more individuals is monitored using the set of monitoring devices. A first facial expression, gesture, vocal intonation, or indication of emotional state derived from biometric data of the at least one individual is identified based on the monitored second interaction. The identified first expression is interpreted using the first cultural/personality profile information. The interpretation of the identified first expression is communicated to a user.Type: ApplicationFiled: July 20, 2017Publication date: November 9, 2017Inventors: Dario GIL, Joseph N. KOZHAYA, David O. MELVILLE, Valentina SALAPURA
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Publication number: 20170302764Abstract: A method of presenting data over a Web service interface includes: establishing, by a first computer process, a persistent transmission control protocol (TCP) network connection between the first computer process and a second computer process; dynamically allocating, by the second computer process, memory in response to receipt of static data over the persistent TCP network connection from the first computer process; updating, by the second computer process, the memory in response to receipt of dynamic data received over the persistent TCP network connection from the first computer process; and enabling, by the second computer process, a Web server to access the updated data for presentation by the Web service interface. The static data identifies a given entity and the dynamic data includes metric data provided for the entity.Type: ApplicationFiled: April 18, 2016Publication date: October 19, 2017Inventors: Amith Singhee, Steven Hirsch, Ashok Pon Kumar Sree Prakash, Ulrich A. Finkler, David O. Melville, Scott M. Mansfield
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Patent number: 9760766Abstract: A method for interpreting interpersonal communication includes monitoring a first interaction between two or more individuals using a set of monitoring devices including a camera, a microphone, and the like. A culture and personality type of at least one individual is identified based on the monitored first interaction. First cultural/personality profile information specific to the identified culture and personality type is retrieved from a database of cultural/personality profile information. A second interaction between the two or more individuals is monitored using the set of monitoring devices. A first facial expression, gesture, vocal intonation, or indication of emotional state derived from biometric data of the at least one individual is identified based on the monitored second interaction. The identified first expression is interpreted using the first cultural/personality profile information. The interpretation of the identified first expression is communicated to a user.Type: GrantFiled: June 30, 2015Date of Patent: September 12, 2017Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Dario Gil, Joseph N. Kozhaya, David O. Melville, Valentina Salapura
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Patent number: 9665831Abstract: A system and method are provided for shared machine learning. The method includes providing a model to a plurality of agents included in a machine learning system. The model specifies attributes and attribute value data types for an event in which the agents act. The method further includes receiving agent-provided inputs during an instance of the event. The agent-provided inputs include estimated attribute values that are consistent with the attribute value data types. The method also includes determining expertise weights for at least some agents in response to at least one ground-truth which is learned from the estimated attribute values. The method additionally includes determining an estimate value for one or more of the attributes using respective adaptive mixtures of the estimated attribute values.Type: GrantFiled: October 24, 2014Date of Patent: May 30, 2017Assignee: International Business Machines CorporationInventors: Brian P. Gaucher, Jonathan Lenchner, David O. Melville, Valentina Salapura
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Patent number: 9651856Abstract: Methods and systems for determining a source shape, a mask shape and a target shape for a lithography process are disclosed. One such method includes receiving source, mask and target constraints and formulating an optimization problem that is based on the source, mask and target constraints and incorporates contour-based assessments for the target shape that are based on physical design quality of a circuit. Further, the optimization problem is solved by integrating over process condition variations to simultaneously determine the source shape, the mask shape and the target shape. In addition, the determined source shape and mask shape are output.Type: GrantFiled: December 30, 2015Date of Patent: May 16, 2017Assignee: International Business Machines CorporationInventors: Tadanobu Inoue, David O. Melville, Alan E. Rosenbluth, Masaharu Sakamoto, Kehan Tian
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Publication number: 20170004356Abstract: A method for interpreting interpersonal communication includes monitoring a first interaction between two or more individuals using a set of monitoring devices including a camera, a microphone, and the like. A culture and personality type of at least one individual is identified based on the monitored first interaction. First cultural/personality profile information specific to the identified culture and personality type is retrieved from a database of cultural/personality profile information. A second interaction between the two or more individuals is monitored using the set of monitoring devices. A first facial expression, gesture, vocal intonation, or indication of emotional state derived from biometric data of the at least one individual is identified based on the monitored second interaction. The identified first expression is interpreted using the first cultural/personality profile information. The interpretation of the identified first expression is communicated to a user.Type: ApplicationFiled: June 30, 2015Publication date: January 5, 2017Inventors: DARIO GIL, JOSEPH N. KOZHAYA, DAVID O. MELVILLE, VALENTINA SALAPURA
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Publication number: 20160328987Abstract: A system and method are provided. The method includes receiving, by a processor-based mood estimator, communications made by members of a group or representations of the communications. The method further includes estimating, by the processor-based mood estimator, a mood of the group based on a graph analysis of the communications made by the members of the group or the representations of the communications.Type: ApplicationFiled: May 8, 2015Publication date: November 10, 2016Inventors: Dario Gil, David O. Melville, Valentina Salapura
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Publication number: 20160328988Abstract: A system and method are provided. The method includes receiving, by a processor-based mood estimator, communications made by members of a group or representations of the communications. The method further includes estimating, by the processor-based mood estimator, a mood of the group based on a graph analysis of the communications made by the members of the group or the representations of the communications.Type: ApplicationFiled: June 19, 2015Publication date: November 10, 2016Inventors: Dario Gil, David O. Melville, Valentina Salapura
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Patent number: 9395622Abstract: In one embodiment, a source mask optimization (SMO) method is provided that includes controlling bright region efficiency during at least one optical domain step. The bright region efficiency being the proportion of the total transmitted light that is transferred to bright areas of a target pattern. The optical domain intermediate solution provided by the at least one optical domain step may then be binarized to obtain an initial spatial domain solution with a controlled MEEF (Mask Error Enhancement Factor). The MEEF is controlled during at least one spatial domain step that optimizes the initial spatial domain solution.Type: GrantFiled: February 20, 2014Date of Patent: July 19, 2016Assignee: GLOBALFOUNDRIES INC.Inventors: Tadanobu Inoue, David O. Melville, Alan E. Rosenbluth, Masaharu Sakamoto, Kehan Tian
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Publication number: 20160117601Abstract: A system and method are provided for shared machine learning. The method includes providing a model to a plurality of agents included in a machine learning system. The model specifies attributes and attribute value data types for an event in which the agents act. The method further includes receiving agent-provided inputs during an instance of the event. The agent-provided inputs include estimated attribute values that are consistent with the attribute value data types. The method also includes determining expertise weights for at least some agents in response to at least one ground-truth which is learned from the estimated attribute values. The method additionally includes determining an estimate value for one or more of the attributes using respective adaptive mixtures of the estimated attribute values.Type: ApplicationFiled: October 24, 2014Publication date: April 28, 2016Inventors: Brian P. Gaucher, Jonathan Lenchner, David O. Melville, Valentina Salapura
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Publication number: 20160117603Abstract: A system and method are provided for shared machine learning. The method includes providing a model to a plurality of agents included in a machine learning system. The model specifies attributes and attribute value data types for an event in which the agents act. The method further includes receiving agent-provided inputs during an instance of the event. The agent-provided inputs include estimated attribute values that are consistent with the attribute value data types. The method also includes determining expertise weights for at least some agents in response to at least one ground-truth which is learned from the estimated attribute values. The method additionally includes determining an estimate value for one or more of the attributes using respective adaptive mixtures of the estimated attribute values.Type: ApplicationFiled: June 24, 2015Publication date: April 28, 2016Inventors: Brian P. Gaucher, Jonathan Lenchner, David O. Melville, Valentina Salapura
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Publication number: 20160109795Abstract: Methods and systems for determining a source shape, a mask shape and a target shape for a lithography process are disclosed. One such method includes receiving source, mask and target constraints and formulating an optimization problem that is based on the source, mask and target constraints and incorporates contour-based assessments for the target shape that are based on physical design quality of a circuit. Further, the optimization problem is solved by integrating over process condition variations to simultaneously determine the source shape, the mask shape and the target shape.Type: ApplicationFiled: December 30, 2015Publication date: April 21, 2016Inventors: TADANOBU INOUE, DAVID O. MELVILLE, ALAN E. ROSENBLUTH, MASAHARU SAKAMOTO, KEHAN TIAN
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Publication number: 20160103389Abstract: A system and method for optimizing (designing) a mask pattern, in which SMO and OPC are collaboratively used to exert a sufficient collaborative effect or are appropriately used in different manners. The method for designing a source and a mask for lithography includes a step (S1) of selecting a set of patterns; a step of performing source mask optimization (SMO) using the set of patterns, under an optical proximity correction (OPC) restriction rule which is used for selectively restricting shifting of an edge position of a polygon when OPC is applied to the set of patterns; and a step (S3, S4) of determining a layout of the mask for lithography, by applying OPC to all patterns constituting the mask for lithography using the source optimized through the SMO.Type: ApplicationFiled: May 9, 2014Publication date: April 14, 2016Inventors: Tadanobu Inoue, David O. Melville, Alan E. Rosenbluth, Masaharu Sakamoto, Kehan Tian
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Patent number: 9250535Abstract: Methods and systems for determining a source shape, a mask shape and a target shape for a lithography process are disclosed. One such method includes receiving source, mask and target constraints and formulating an optimization problem that is based on the source, mask and target constraints and incorporates contour-based assessments for the target shape that are based on physical design quality of a circuit. Further, the optimization problem is solved by integrating over process condition variations to simultaneously determine the source shape, the mask shape and the target shape. In addition, the determined source shape and mask shape are output.Type: GrantFiled: March 15, 2013Date of Patent: February 2, 2016Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Tadanobu Inoue, David O. Melville, Alan E. Rosenbluth, Masaharu Sakamoto, Kehan Tian
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Publication number: 20150234970Abstract: In one embodiment, a source mask optimization (SMO) method is provided that includes controlling bright region efficiency during at least one optical domain step. The bright region efficiency being the proportion of the total transmitted light that is transferred to bright areas of a target pattern. The optical domain intermediate solution provided by the at least one optical domain step may then be binarized to obtain an initial spatial domain solution with a controlled MEEF (Mask Error Enhancement Factor). The MEEF is controlled during at least one spatial domain step that optimizes the initial spatial domain solution.Type: ApplicationFiled: February 20, 2014Publication date: August 20, 2015Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Tadanobu Inoue, David O. Melville, Alan E. Rosenbluth, Masaharu Sakamoto, Kehan Tian
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Patent number: 8959462Abstract: A method, an article of manufacture, and a system for designing a mask. The method for designing a mask is implemented by a computer device having a memory, a processor device communicatively coupled to the memory, and a module configured to carry out the method including the steps of: generating an optical domain representation from a design pattern and an imaging light; and optimizing the optical domain representation under a constraint that values of negative excursions at predetermined evaluation points must be greater than or equal to predetermined negative threshold values assigned to the predetermined evaluation points; where: the optical domain representation is a variable representation of a wavefront; the imaging light is light that is transmitted through the mask; the negative excursions are in an object domain representation of the optical domain representation; and the predetermined evaluation points are in the object domain representation.Type: GrantFiled: March 12, 2013Date of Patent: February 17, 2015Assignee: International Business Machines CorporationInventors: Tadanobu Inoue, David O Melville, Alan E Rosenbluth, Masaharu Sakamoto, Kehan Tian