Patents by Inventor David O. Patterson

David O. Patterson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Maskless micro-ion-beam reduction lithography system
    Patent number: 6888146
    Abstract: A maskless micro-ion-beam reduction lithography system is a system for projecting patterns onto a resist layer on a wafer with feature size down to below 100 nm. The MMRL system operates without a stencil mask. The patterns are generated by switching beamlets on and off from a two electrode blanking system or pattern generator. The pattern generator controllably extracts the beamlet pattern from an ion source and is followed by a beam reduction and acceleration column.
    Type: Grant
    Filed: April 9, 1999
    Date of Patent: May 3, 2005
    Assignee: The Regents of the University of California
    Inventors: Ka-Ngo Leung, William A. Barletta, David O. Patterson, Richard A. Gough