Abstract: A wafer-cleaning brush includes a hollow core configured to receive a cleaning fluid and a plurality of fluid-permeable nodules disposed on the core. Each nodule includes a dispensing outlet at a distal tip in fluid communication with the core such that the cleaning fluid is dispensed at or near a brush–wafer interface during cleaning. In embodiments, the dispensing outlet comprises a pore at the distal tip and/or a passive slit-based outlet configured to regulate discharge of the cleaning fluid. Distal tips may include surface features that guide fluid laterally across a wafer surface. A cleaning system may combine deionized water and chemistry upstream of the brush, optionally monitor dissolved oxygen, and deliver fluid to a wet module for cleaning and subsequent drying.

Abstract: Textured polyvinyl alcohol (PVA) brush nodules and brush assemblies are disclosed for wet cleaning of sensitive substrates such as semiconductor wafers. A cylindrical brush includes a core configured for rotation and a plurality of PVA nodules disposed on the core. Each nodule has a nodule face including molded-in surface geometry (e.g., ridges and grooves) configured to disrupt and redistribute liquid at a brush/substrate interface, promote interface shear, and reduce hydroplaning-like fluid lift to help maintain contact under wet conditions. In certain embodiments, a fluid management arrangement directs cleaning liquid toward the nodule faces so that liquid exits predominantly at or through the nodule faces, improving purging and reducing water and chemistry consumption. Modular rail embodiments and manufacturing methods, including planar tray molds with CNC-machined cavity face surface geometry for forming textured nodule faces, are also described.

Abstract: A method for manufacturing a cylindrical brush of a cleaning tool, comprises a cylindrical brush having a core member, a plurality of rail plates, a plurality of polyvinyl alcohol (PVA) nodule foam bars and a pair of end caps. The core member includes an outer wall having a plurality of core holes and a pair of openings. The plurality of rail plates having a plurality of rail holes arranged along the outer wall of the core member. The plurality of polyvinyl alcohol (PVA) nodule foam bars is installed at each of the plurality of rail plates such that each of a plurality of nodules of the PVA nodule foam bar aligns with the plurality of core holes and with the plurality of rail holes. The pair of end caps encloses the pair of openings of the core member.

Abstract: A method for manufacturing a cylindrical brush of a cleaning tool, comprises a cylindrical brush having a core member, a plurality of rail plates, a plurality of polyvinyl alcohol (PVA) nodule foam bars and a pair of end caps. The core member includes an outer wall having a plurality of core holes and a pair of openings. The plurality of rail plates having a plurality of rail holes arranged along the outer wall of the core member. The plurality of polyvinyl alcohol (PVA) nodule foam bars is installed at each of the plurality of rail plates such that each of a plurality of nodules of the PVA nodule foam bar aligns with the plurality of core holes and with the plurality of rail holes. The pair of end caps encloses the pair of openings of the core member.

Abstract: The present invention provides a cylindrical brush assembly designed for precision cleaning of circular wafers and delicate surfaces. The brush features polyvinyl alcohol (PVA) nodules of varying lengths along one side of a cylindrical core, enabling conformity to changing gap sizes when applied at an angle to the wafer. This ensures consistent contact and uniform cleaning across the entire surface. A modular design with replaceable nodule holders allows for easy customization and maintenance. An integrated RFID tracking system embedded in the end cap monitors usage and wear levels in real time. The cleaning method involves rotating the brush at an angle relative to the wafer surface, with the nodules adapting to surface contours for optimal efficiency. While tailored for semiconductor wafer cleaning, the assembly is adaptable for other industrial applications requiring precision cleaning.

Abstract: A method for manufacturing a cylindrical brush of a cleaning tool, comprises a cylindrical brush having a core member, a plurality of rail plates, a plurality of polyvinyl alcohol (PVA) nodule foam bars and a pair of end caps. The core member includes an outer wall having a plurality of core holes and a pair of openings. The plurality of rail plates having a plurality of rail holes arranged along the outer wall of the core member. The plurality of polyvinyl alcohol (PVA) nodule foam bars is installed at each of the plurality of rail plates such that each of a plurality of nodules of the PVA nodule foam bar aligns with the plurality of core holes and with the plurality of rail holes. The pair of end caps encloses the pair of openings of the core member.