Abstract: Each embodiment (10, 110 and 210) includes a magnetic element (12, 112 and 212) producing a magnetic field. In the first embodiment (10) of FIG. 1, the magnetic element (12) comprises a magnetic bit strip disposed extending in a circular arc on a fixed or stationary plate (14). In the second embodiment (110) of FIG. 2, the magnetic element (112) comprises a magnetic bit strip supported on a movable bar or rod (114). In the third embodiment (210) of FIG. 3, the magnetic element (212) comprises a magnetic bit strip disposed in a rectilinear path on a stationary plate (214). An electrical resistor (16, 116 and 216) is included for changing in electrical resistance in response to changes in the magnetic field produced by the magnetic element (12, 112 and 212). The resistor (16, 116 and 216) comprises a giant magnetoresistive sensor.

Abstract: The present invention relates to maskless photolithography using a patterned light generator for creating 2-D and 3-D patterns on objects using etching and deposition techniques. In an embodiment, the patterned light generator uses a micromirror array to direct pattern light on a target object. In an alternate embodiment, the patterned light generator uses a plasma display device to generate and direct patterned light onto a target object. Specifically, the invention provides a maskless photolithography system and method for photo stimulated etching of objects in a liquid solution, patterning glass, and photoselective metal deposition. For photo stimulated etching of objects in a liquid solution, the invention provides a system and method for immersing a substrate in an etchant solution, exposing the immersed substrate to patterned light, and etching the substrate according to the pattern of incident light.

Abstract: The present invention is a maskless photolithography system and method using a plasma display for creating two-dimensional and three-dimensional structures. Advantageously, the invention does not require masks, templates or stencils to create each of the planes or layers on a multi layer two-dimensional or three-dimensional structure. The invention employs a plasma display having individually addressable pixels to generate and direct light onto an object that has photoreactive or photoresist compounds applied to the exposed surface. Unlike conventional plasma displays that generate visible light, the plasma display of the current invention lacks the phosphor coating conventionally used to convert ultraviolet (UV) light to visible light. Therefore, the instant plasma display generates UV light appropriate for reactive processes typically used in photolithography.

Abstract: The present invention relates to maskless photolithography using a patterned light generator for creating 2-D and 3-D patterns on objects using photoreactive chemicals. In an embodiment, the patterned light generator uses a micromirror array to direct pattern light on a target object. In an alternate embodiment, the patterned light generator uses a plasma display device to generate and direct patterned light onto a target object. Specifically, the invention provides a maskless photolithography system and method for creating molecular imprinted array devices, integrated microsensors and fluidic networks on a substrate, integrated circuits of conducting polymers, and patterns on substrates using photochemical vapor deposition.

Abstract: The present invention is a system and method to create two dimensional and three dimensional structures using a maskless photolithography system that is semi-automated, directly reconfigurable, and does not require masks, templates or stencils to create each of the planes or layers on a multi layer two-dimensional or three dimensional structure. In an embodiment, the invention uses a micromirror array comprising up to several million elements to modulate light onto a substrate that has photoreactive or photoresist compounds applied to the exposed surface. The desired pattern is designed and stored using conventional computer aided drawing techniques and is used to control the positioning of the individual mirrors in the micromirror array to reflect the corresponding desired pattern. Light impinging on the array is reflected to or directed away from the substrate to create light and dark spots on the substrate according to the pattern.

Abstract: A portable mass spectrometer for underwater use includes a watertight case having an inlet and means for transforming an analyte gas molecule from a solution phase into a gas phase positioned within the case. Means for directing a fluid to the transforming means from the inlet and means for analyzing the gas-phase analyte molecule to determine an identity thereof are also positioned within the case.

Abstract: A portable mass spectrometer for underwater use includes a watertight case having an inlet and means for transforming an analyte gas molecule from a solution phase into a gas phase positioned within the case. Means for directing a fluid to the transforming means from the inlet and means for analyzing the gas-phase analyte molecule to determine an identity thereof are also positioned within the case.

Abstract: An antenna support structure has a base for mounting on a pole clamp. The position of the pole clamp on a pole is adjusted by use of a removable installation tool. The installation tool comprises front and back tool clamp plates that are frictionally secured about the pole by fasteners. One or more adjustment tools may be mounted on the tool clamp plates and interact with the pole clamp and the antenna support structure so as to effect movement of the pole clamp and the antenna relative to the installation tool and the pole. Movement of the pole clamp and the antenna relative to the pole allows an operator to finely tune the azimuth and/or elevation angles of the antenna which is mounted on the pole clamp.

Abstract: A heavy ion generator is used with a plasma desorption mass spectrometer to provide an appropriate neutron flux in the direction of a fissionable material in order to desorb and ionize large molecules from the material for mass analysis.The heavy ion generator comprises a fissionable material having a high n,f reaction cross section. The heavy ion generator also comprises a pulsed neutron generator that is used to bombard the fissionable material with pulses of neutrons, thereby causing heavy ions to be emitted from the fissionable material. These heavy ions impinge on a material, thereby causing ions to desorb off that material. The ions desorbed off the material pass through a time-of-flight mass analyzer, wherein ions can be measured with masses greater than 25,000 amu.

Abstract: A heavy ion generator is used with a plasma desorption mass spectrometer to provide an appropriate neutron flux in the direction of a fissionable material in order to desorb and ionize large molecules from the material for mass analysis.The heavy ion generator comprises a fissionable material having a high n,f reaction cross section. The heavy ion generator also comprises a pulsed neutron generator that is used to bombard the fissionable material with pulses of neutrons, thereby causing heavy ions to be emitted from the fissionable material. These heavy ions impinge on a material, thereby causing ions to desorb off that material. The ions desorbed off the material pass through a time-of-flight mass analyzer, wherein ions can be measured with masses greater than 25,000 amu.