Patents by Inventor David P. Wanamaker

David P. Wanamaker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Toroidal plasma source for plasma processing
    Patent number: 6712020
    Abstract: A toroidal plasma source (28) within a substrate processing chamber (10). The toroidal plasma source forms a poloidal plasma with theta symmetry. The poloidal plasma current is essentially parallel to a surface of the plasma generating structure, thus reducing sputtering erosion of the inner walls. The plasma current is similarly essentially parallel to a process surface (32) of a substrate (34) within the chamber. In a further embodiment, a shaped member (66) between the substrate and the plasma source controls the plasma density in a selected fashion to enhance plasma processing uniformity.
    Type: Grant
    Filed: June 12, 2002
    Date of Patent: March 30, 2004
    Assignee: Applied Materials Inc.
    Inventors: Michael S. Cox, Canfeng Lai, Robert B. Majewski, David P. Wanamaker, Christopher T. Lane, Peter Loewenhardt, Shamouil Shamouilian, John P. Parks
  • Toroidal plasma source for plasma processing
    Publication number: 20020157793
    Abstract: A toroidal plasma source (28) within a substrate processing chamber (10). The toroidal plasma source forms a poloidal plasma with theta symmetry. The poloidal plasma current is essentially parallel to a surface of the plasma generating structure, thus reducing sputtering erosion of the inner walls. The plasma current is similarly essentially parallel to a process surface (32) of a substrate (34) within the chamber. In a further embodiment, a shaped member (66) between the substrate and the plasma source controls the plasma density in a selected fashion to enhance plasma processing uniformity.
    Type: Application
    Filed: June 12, 2002
    Publication date: October 31, 2002
    Applicant: Applied Materials, Inc.
    Inventors: Michael S. Cox, Canfeng Lai, Robert B. Majewski, David P. Wanamaker, Christopher T. Lane, Peter Loewenhardt, Shamouil Shamouilian, John P. Parks
  • Toroidal plasma source for plasma processing
    Patent number: 6418874
    Abstract: A toroidal plasma source (28) within a substrate processing chamber (10). The toroidal plasma source forms a poloidal plasma with theta symmetry. The poloidal plasma current is essentially parallel to a surface of the plasma generating structure, thus reducing sputtering erosion of the inner walls. The plasma current is similarly essentially parallel to a process surface (32) of a substrate (34) within the chamber. In a further embodiment, a shaped member (66) between the substrate and the plasma source controls the plasma density in a selected fashion to enhance plasma processing uniformity.
    Type: Grant
    Filed: May 25, 2000
    Date of Patent: July 16, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Michael S. Cox, Canfeng Lai, Robert B. Majewski, David P. Wanamaker, Christopher T. Lane, Peter Loewenhardt, Shamouil Shamouilian, John P. Parks