Patents by Inventor David R. Dingler

David R. Dingler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method for seaming high-modulus, high-tenacity, low-elongation fabrics
    Patent number: 7954536
    Abstract: A seaming system for forming a seam is disclosed, wherein the seam consists of at least two opposed sections of high-modulus, high-tenacity, low-elongation fabric sections joined by a tape. The system comprises a seamer head, and a seamer base that includes a topography configured to impart a predetermined pressure gradient to the adhesive layer, tape, and fabric sections of the seam. The resultant seam has a cross-section or thickness profile that generally corresponds to that of the applied pressure gradient. As such, the constructed seam more efficiently distributes stress imparted from any applied load.
    Type: Grant
    Filed: February 9, 2010
    Date of Patent: June 7, 2011
    Assignee: Lockheed Martin Corporation
    Inventors: John F. Brewer, Dhiraj H. Darjee, David R. Dingler
  • Method for seaming high-modulus, high-tenacity, low-elongation fabrics
    Patent number: 7799165
    Abstract: A seaming system for forming a seam is disclosed, wherein the seam consists of at least two opposed sections of high-modulus, high-tenacity, low-elongation fabric sections joined by a tape. The system comprises a seamer head, and a seamer base that includes a topography configured to impart a predetermined pressure gradient to the adhesive layer, tape, and fabric sections of the seam. The resultant seam has a cross-section or thickness profile that generally corresponds to that of the applied pressure gradient. As such, the constructed seam more efficiently distributes stress imparted from any applied load.
    Type: Grant
    Filed: February 9, 2010
    Date of Patent: September 21, 2010
    Assignee: Lockheed Martin Corporation
    Inventors: John F. Brewer, Dhiraj H. Darjee, David R. Dingler
  • SYSTEM AND METHOD FOR SEAMING HIGH-MODULUS, HIGH-TENACITY, LOW-ELONGATION FABRICS
    Publication number: 20100139859
    Abstract: A seaming system for forming a seam is disclosed, wherein the seam consists of at least two opposed sections of high-modulus, high-tenacity, low-elongation fabric sections joined by a tape. The system comprises a seamer head, and a seamer base that includes a topography configured to impart a predetermined pressure gradient to the adhesive layer, tape, and fabric sections of the seam. The resultant seam has a cross-section or thickness profile that generally corresponds to that of the applied pressure gradient. As such, the constructed seam more efficiently distributes stress imparted from any applied load.
    Type: Application
    Filed: February 9, 2010
    Publication date: June 10, 2010
    Inventors: John F. BREWER, Dhiraj H. Darjee, David R. Dingler
  • SYSTEM AND METHOD FOR SEAMING HIGH-MODULUS, HIGH-TENACITY, LOW-ELONGATION FABRICS
    Publication number: 20100139869
    Abstract: A seaming system for forming a seam is disclosed, wherein the seam consists of at least two opposed sections of high-modulus, high-tenacity, low-elongation fabric sections joined by a tape. The system comprises a seamer head, and a seamer base that includes a topography configured to impart a predetermined pressure gradient to the adhesive layer, tape, and fabric sections of the seam. The resultant seam has a cross-section or thickness profile that generally corresponds to that of the applied pressure gradient. As such, the constructed seam more efficiently distributes stress imparted from any applied load.
    Type: Application
    Filed: February 9, 2010
    Publication date: June 10, 2010
    Inventors: John F. BREWER, Dhiraj H. Darjee, David R. Dingler
  • System for seaming high-modulus, high-tenacity, low-elongation fabrics
    Patent number: 7704579
    Abstract: A seaming system for forming a seam is disclosed, wherein the seam consists of at least two opposed sections of high-modulus, high-tenacity, low-elongation fabric sections joined by a tape. The system comprises a seamer head, and a seamer base that includes a topography configured to impart a predetermined pressure gradient to the adhesive layer, tape, and fabric sections of the seam. The resultant seam has a cross-section or thickness profile that generally corresponds to that of the applied pressure gradient. As such, the constructed seam more efficiently distributes stress imparted from any applied load.
    Type: Grant
    Filed: March 29, 2006
    Date of Patent: April 27, 2010
    Assignee: Lockheed Martin Corporation
    Inventors: John F. Brewer, Dhiraj H. Darjee, David R. Dingler