Patents by Inventor David R. Setiz

David R. Setiz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Engraver and method for focusing and measuring areas on a workpiece engraved by the engraver
    Patent number: 6614558
    Abstract: An error detection apparatus and method for use with engravers, such as gravure engravers. An error value E corresponding to the difference between a set of predetermined setup parameters and actual measurement of a portion of an engraved area on the cylinder is determined. The error value E is then used to adjust the engraver to engrave an actual cut or etch in accordance with the set of predetermined setup parameters. Advantageously, an error detection and correction system is suitable for providing a closed-loop system for engraving a cylinder. The apparatus and method may be used during initial setup or during normal operation of the engraver. Other features include an autofocus routine to facilitate the auto-focus procedure. Also, image processing is further enhanced by gap filling, discontinuity removal, and light calibration methods which may be used alone, in combination with each other, or in combination with the automatic focus system and/or automatic shoe system.
    Type: Grant
    Filed: March 16, 1998
    Date of Patent: September 2, 2003
    Assignee: MDC Max Daetwyler AG
    Inventors: Michael Duane Christopher, David Flannery, David R. Setiz, Eric J. Serenius, Wei Zhao
  • System and method for focusing, imaging and measuring areas on a workpiece engraved by an engraver
    Patent number: 5737090
    Abstract: An error detection apparatus and method for use with engravers, such as gravure engravers. An error value E corresponding to the difference between a set of predetermined setup parameters and actual measurement of a portion of an engraved area on the cylinder is determined. The error value E is then used to adjust the engraver to engrave an actual cut or etch in accordance with the set of predetermined setup parameters. Advantageously, an error detection and correction system is suitable for providing a closed-loop system for engraving a cylinder. The apparatus and method may be used during initial setup or during normal operation of the engraver. Other features include an autofocus routine to facilitate the auto-focus procedure. Also, image processing is further enhanced by gap filling, discontinuity removal, and light calibration methods which may be used alone, in combination with each other, or in combination with the automatic focus system and/or automatic shoe system.
    Type: Grant
    Filed: April 3, 1995
    Date of Patent: April 7, 1998
    Assignee: Ohio Electronic Engravers, Inc.
    Inventors: Michael Duane Christopher, David Flannery, David R. Setiz, Eric J. Serenius, Wei Zhao