Abstract: A cutting element assembly includes a cutter support including a cutter bore. A cutting element is in the cutter bore and a resilient element is integral with the cutter support. The resilient element is longitudinally compressible and has a displacement of greater than 0.1 mm and optionally less than 2 mm. Another cutting assembly includes a cutter support coupled to multiple cutting elements. A resilient element of the cutter support is compressible based on a force applied to the cutter support through one or more of the cutting elements. The resilient element can include a slit in the cutter support. A slit may, for instance, extend perpendicular or transverse to an axis of the cutting elements and allow the cutter support to flex and close off or reduce a size of the slit when forces act on one or more of the cutting elements.

Abstract: A system for monitoring and optimizing fuel consumption by a genset at an oil rig is described. Gensets require large amounts of fuel to initiate and to maintain in a standby, idling position. The system accesses data in a drill plan to determine the present and future power requirements and initiates gensets if needed; otherwise gensets can be shut down. Excess power can be stored in a power storage unit such as a capacitor, battery, or a liquid air energy storage unit.

Abstract: A system for monitoring and optimizing fuel consumption by a genset at an oil rig is described. Gensets require large amounts of fuel to initiate and to maintain in a standby, idling position. The system accesses data in a drill plan to determine the present and future power requirements and initiates gensets if needed; otherwise gensets can be shut down. Excess power can be stored in a power storage unit such as a capacitor, battery, or a liquid air energy storage unit.

Abstract: In some general aspects, a surface of a structure within a chamber of an extreme ultraviolet (EUV) light source is cleaned using a method. The method includes generating a plasma state of a material that is present at a location adjacent to a non-electrically conductive body that is within the chamber. The generation of the plasma state of the material includes electromagnetically inducing an electric current at the location adjacent the non-electrically conductive body to thereby transform the material that is adjacent the non-electrically conductive body from a first state into the plasma state. The plasma state of the material includes plasma particles, at least some of which are free radicals of the material. The method also includes enabling the plasma particles to pass over the structure surface to remove debris from the structure surface without removing the structure from the chamber of the EUV light source.

Abstract: In some general aspects, a surface of a structure within a chamber of an extreme ultraviolet (EUV) light source is cleaned using a method. The method includes generating a plasma state of a material that is present at a location adjacent to a non-electrically conductive body that is within the chamber. The generation of the plasma state of the material includes electromagnetically inducing an electric current at the location adjacent the non-electrically conductive body to thereby transform the material that is adjacent the non-electrically conductive body from a first state into the plasma state. The plasma state of the material includes plasma particles, at least some of which are free radicals of the material. The method also includes enabling the plasma particles to pass over the structure surface to remove debris from the structure surface without removing the structure from the chamber of the EUV light source.

Abstract: A virtual transmission line includes a charge location and a discharge location. One or more mobile batteries are charged at the charge location. The mobile batteries are transported to the discharge location. At the discharge location, the mobile batteries are connected to electric equipment. The mobile batteries are then transported back to the charge location and the cycle repeated.

Abstract: A system and method of removing target material debris deposits simultaneously with generating EUV light includes generating hydrogen radicals in situ in the EUV vessel, proximate to the target material debris deposits and volatilizing the target material debris deposits and purging the volatilized target material debris deposits from the EUV vessel without the need of an oxygen containing species in the EUV vessel.

Abstract: A system for monitoring and optimizing fuel consumption by a genset at an oil rig is described. Gensets require large amounts of fuel to initiate and to maintain in a standby, idling position. The system accesses data in a drill plan to determine the present and future power requirements and initiates gensets if needed; otherwise gensets can be shut down. Excess power can be stored in a power storage unit such as a capacitor, battery, or a liquid air energy storage unit.

Abstract: In some general aspects, a surface of a structure within a chamber of an extreme ultraviolet (EUV) light source is cleaned using a method. The method includes generating a plasma state of a material that is present at a location adjacent to a non-electrically conductive body that is within the chamber. The generation of the plasma state of the material includes electromagnetically inducing an electric current at the location adjacent the non-electrically conductive body to thereby transform the material that is adjacent the non-electrically conductive body from a first state into the plasma state. The plasma state of the material includes plasma particles, at least some of which are free radicals of the material. The method also includes enabling the plasma particles to pass over the structure surface to remove debris from the structure surface without removing the structure from the chamber of the EUV light source.

Abstract: A system and method of removing target material debris deposits simultaneously with generating EUV light includes generating hydrogen radicals in situ in the EUV vessel, proximate to the target material debris deposits and volatilizing the target material debris deposits and purging the volatilized target material debris deposits from the EUV vessel without the need of an oxygen containing species in the EUV vessel.

Abstract: A system and method of removing target material debris deposits simultaneously with generating EUV light includes generating hydrogen radicals in situ in the EUV vessel, proximate to the target material debris deposits and volatilizing the target material debris deposits and purging the volatilized target material debris deposits from the EUV vessel without the need of an oxygen containing species in the EUV vessel.

Abstract: A system and method of removing target material debris deposits simultaneously with generating EUV light includes generating hydrogen radicals in situ in the EUV vessel, proximate to the target material debris deposits and volatilizing the target material debris deposits and purging the volatilized target material debris deposits from the EUV vessel without the need of an oxygen containing species in the EUV vessel.

Abstract: A system and method of removing target material debris deposits simultaneously with generating EUV light includes generating hydrogen radicals in situ in the EUV vessel, proximate to the target material debris deposits and volatilizing the target material debris deposits and purging the volatilized target material debris deposits from the EUV vessel without the need of an oxygen containing species in the EUV vessel.

Abstract: A system and method of removing target material debris deposits simultaneously with generating EUV light includes generating hydrogen radicals in situ in the EUV vessel, proximate to the target material debris deposits and volatilizing the target material debris deposits and purging the volatilized target material debris deposits from the EUV vessel without the need of an oxygen containing species in the EUV vessel.

Abstract: A system and method of removing target material debris deposits simultaneously with generating EUV light includes generating hydrogen radicals in situ in the EUV vessel, proximate to the target material debris deposits and volatilizing the target material debris deposits and purging the volatilized target material debris deposits from the EUV vessel without the need of an oxygen containing species in the EUV vessel.

Abstract: A system and method of removing target material debris deposits simultaneously with generating EUV light includes generating hydrogen radicals in situ in the EUV vessel, proximate to the target material debris deposits and volatilizing the target material debris deposits and purging the volatilized target material debris deposits from the EUV vessel without the need of an oxygen containing species in the EUV vessel.

Abstract: A fluid used in a borehole containing suspended solid objects made by an additive manufacturing process. An additive process of solidifying a liquid composition at a succession of selected locations within a workspace, in accordance with a digital design allows a wide variety of shapes to be made. The fluid may be a drilling fluid or a borehole treatment fluid used prior to cementing and the objects may act, possibly in conjunction with other solids, to block loss of fluid into fractures in the formation around the borehole.

Abstract: Applying a photocurable coating to a downhole fixed surface surrounding the axis of a wellbore containing a wellbore fluid is carried out by skimming an applicator over the downhole surface while supplying a photocurable liquid composition between the applicator and the downhole surface thereby spreading the composition as a curable layer on the downhole surface, while providing a light output with a light-transmitting barrier facing and adjacent the curable layer on the downhole surface; and directing light of wavelength in a range from 100 nm to 1500 nm through the light-transmitting barrier onto the curable light-transmitting barrier so as to initiate curing of the layer on the downhole surface. The applicator may be an assembly comprising a belt or band of light-transmitting material and the light source may be positioned within the band or the loop of the belt. This portion of the belt can remain stationary in contact with the curable layer and separate from it by a peeling action.

Abstract: A composite optical device has a layer of a composite optical material mounted on a substrate. The layer of composite optical material has substantially uniform thickness. The composite optical material is a polymer opal, in that it has a three dimensional arrangement of core particles distributed in a matrix, the refractive index of the material of the core particles being different to the refractive index of the material of the matrix and the three dimensional arrangement being capable of having a periodicity such that, when a surface of the material is illuminated with white light, the composite material exhibits structural colour. The local stiffness of the substrate is different at different positions of the substrate.

Abstract: Application of a photocurable lining to a downhole fixed surface surrounding the axis of a wellbore is carried out by skimming an applicator over the downhole surface while delivering a porous tape impregnated with a photocurable liquid composition between the applicator and the downhole surface so that the tape lies on the downhole surface and directing light of wavelength in a range from 100 nm to 1500 nm onto the curable composition impregnating the tape so as to initiate curing of the composition and thereby attach the tape to the downhole surface.