Patents by Inventor David Russel

David Russel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7579620
    Abstract: Provided is a field-effect transistor (10) which comprises a metal or carbon source electrode (14) and a layer of a functional organic semiconductor (28). A column of an injection material (48) extends through the layer of the functional organic semiconductor (28), the column being in contact with both the source electrode (14) and the layer of the functional organic semiconductor (28). This column (48) facilitates the transfer charge carriers between the source electrode (14) and semiconductor layer (28). The injection material is preferably an organic compound such as 3-hexylthiophene, polyarylamine, poly(3,4-ethylenedioxythiophene)-polystyrenesulphonic acid or polyaniline.
    Type: Grant
    Filed: September 2, 2005
    Date of Patent: August 25, 2009
    Assignee: Seiko Epson Corporation
    Inventors: David Russel, Christopher Newsome, Thomas Kugler, Shunpu Li
  • Patent number: 7517719
    Abstract: Provided is a method for forming a semiconductor element such as film. The method comprises the steps of: (i) depositing a suspension of particles of a first semiconductor and a solution of a second semiconductor or a precursor thereof on a surface of a substrate such that a mixture comprising the particles of the first semiconductor suspended in a liquid phase comprising the second semiconductor or precursor thereof results thereon; and (ii) solidifying the mixture to form the semiconductor element comprising particles of the first semiconductor in a matrix of the second semiconductor which electrically connects adjacent particles of the first semiconductor, the first and second semiconductors being of the same conductivity type and being formed from either the same or different materials. The method does not require any step of vacuum deposition or sintering. Also provided is a semiconductor element itself.
    Type: Grant
    Filed: May 10, 2005
    Date of Patent: April 14, 2009
    Assignee: Seiko Epson Corporation
    Inventors: Thomas Kugler, Christopher Newsome, David Russel, Shunpu Li
  • Publication number: 20060049398
    Abstract: Provided is a field-effect transistor (10) which comprises a metal or carbon source electrode (14) and a layer of a functional organic semiconductor (28). A column of an injection material (48) extends through the layer of the functional organic semiconductor (28), the column being in contact with both the source electrode (14) and the layer of the functional organic semiconductor (28). This column (48) facilitates the transfer charge carriers between the source electrode (14) and semiconductor layer (28). The injection material is preferably an organic compound such as 3-hexylthiophene, polyarylamine, poly(3,4-ethylenedioxythiophene)-polystyrenesulphonic acid or polyaniline.
    Type: Application
    Filed: September 2, 2005
    Publication date: March 9, 2006
    Applicant: SEIKO EPSON CORPORATION
    Inventors: David Russel, Christopher Newsome, Thomas Kugler, Shunpu Li
  • Publication number: 20060014365
    Abstract: Provided is a method for forming a semiconductor element such as film. The method comprises the steps of: (i) depositing a suspension of particles of a first semiconductor and a solution of a second semiconductor or a precursor thereof on a surface of a substrate such that a mixture comprising the particles of the first semiconductor suspended in a liquid phase comprising the second semiconductor or precursor thereof results thereon; and (ii) solidifying the mixture to form the semiconductor element comprising particles of the first semiconductor in a matrix of the second semiconductor which electrically connects adjacent particles of the first semiconductor, the first and second semiconductors being of the same conductivity type and being formed from either the same or different materials. The method does not require any step of vacuum deposition or sintering. Also provided is a semiconductor element itself.
    Type: Application
    Filed: May 10, 2005
    Publication date: January 19, 2006
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Thomas Kugler, Christopher Newsome, David Russel, Shunpu Li
  • Publication number: 20050250244
    Abstract: Provided is a method forming a desired pattern of electronically functional material 3 on a substrate 1. The method comprises the steps of: creating a first layer of patterning material 2 on the substrate whilst leaving areas of the substrate exposed to define said desired pattern; printing a suspension comprising particles of the electronically functional material 3 in a liquid dispersant, to which the patterning material is impervious, on the patterning material and the exposed substrate; removing at least some of the liquid dispersant from the suspension to consolidate the particles; and applying a first solvent to said consolidated particles which is capable of solubilizing the patterning material 2 and to which the consolidated particles are pervious so that the patterning material is removed from the substrate 1 together with any overlying electronically functional material 3.
    Type: Application
    Filed: April 11, 2005
    Publication date: November 10, 2005
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Shunpu Li, Christopher Newsome, Thomas Kugler, David Russel