Abstract: Events associated with a user are determined. The events may be activities that were provided by the user with start and end times such as appointments. Tasks associated with the user are determined. The tasks may be similar to events, but may not have start and end times. Monitored user behavior is used to estimate how long each task will take to complete. Events or tasks not associated with the user, but that may be of interest to the user, are determined. Location information about the events and tasks is received, and traffic and map information is used to estimate travel time between the locations. The tasks and the events are ranked using user interest data. An itinerary is generated using a subset of the ranked events and/or tasks that considers travel time between the locations as well as the ranking.

Abstract: This document describes techniques and apparatuses enabling brand detection in audiovisual media. The techniques detect a brand exposed within audiovisual media, such as a name or logo for a product or service, and based on this brand, present a brand advertisement or enable selection of an interactive experience that is associated with the brand. By so doing, marketers enable viewers to quickly and easily learn more about the product or service.

Abstract: Methods and apparatus relating to the inspection of photomasks are described. In an embodiment, an inspection tool may be automatically focused on a reticle utilizing various topographic mapping techniques. Other embodiments are also described.

Abstract: This document describes techniques and apparatuses enabling brand detection in audiovisual media. The techniques detect a brand exposed within audiovisual media, such as a name or logo for a product or service, and based on this brand, present a brand advertisement or enable selection of an interactive experience that is associated with the brand. By so doing, marketers enable viewers to quickly and easily learn more about the product or service.

Abstract: Embodiments for generating advertising effectiveness surveys are presented. One example method, performed in a computing device comprising a data-holding subsystem and logic subsystem, comprises receiving a request, the request associated with an identified user, from a video presentation device for a video content item, and providing the video content item to the video presentation device. Information relating to an image analysis is received in order to identify one or more image elements in the video content item, and information regarding user playback actions during playback of the video content item is received and stored. A user survey based upon the information related to the image analysis and the user playback actions is automatically retrieved, the user survey is sent to a device associated with the identified user, and a response to the user survey is received.

Abstract: This document describes techniques and apparatuses enabling brand detection in audiovisual media. The techniques detect a brand exposed within audiovisual media, such as a name or logo for a product or service, and based on this brand, present a brand advertisement or enable selection of an interactive experience that is associated with the brand. By so doing, marketers enable viewers to quickly and easily learn more about the product or service.

Abstract: This document describes techniques and apparatuses enabling brand detection in audiovisual media. The techniques detect a brand exposed within audiovisual media, such as a name or logo for a product or service, and based on this brand, present a brand advertisement or enable selection of an interactive experience that is associated with the brand. By so doing, marketers enable viewers to quickly and easily learn more about the product or service.

Abstract: Methods and apparatus relating to the inspection of photomasks are described. In an embodiment, an inspection tool may be automatically focused on a reticle utilizing various topographic mapping techniques. Other embodiments are also described.

Abstract: Methods and apparatus relating to the inspection of photomasks are described. In an embodiment, an inspection tool may be automatically focused on a reticle utilizing various topographic mapping techniques. Other embodiments are also described.

Abstract: The present invention discloses methods of conducting surface inspections using summed light. One method includes the steps of measuring summed light intensity values for the substrate, generating comparison values for the substrate, and then comparing the measured summed light intensity values with the comparison values to determine whether there are defects in the substrate. In another embodiment, a method includes the steps of generating a reference cluster using measured summed light intensity values for selected portions of the inspection surface. Other summed light intensity values are measured and then compared with the reference cluster. Using this comparison, a determination is made as to whether a defect is present. Another embodiment uses a constant baseline signal which is compared to actual light intensity values to determine whether a substrate defect is present.

Abstract: A reusable circuit design for use with electronic design automation EDA tools in designing integrated circuits is disclosed, as well as reticle inspection and fabrication methods that are based on such reusable circuit design. The reusable circuit design is stored on a computer readable medium and contains an electronic representation of a layout pattern for at least one layer of the circuit design on an integrated circuit. The layout pattern includes a flagged critical region which corresponds to a critical region on a reticle or integrated circuit that is susceptible to special inspection or fabrication procedures. In one aspect of the reusable circuit design, the special analysis is performed during one from a group consisting of reticle inspection, reticle production, integrated circuit fabrication, and fabricated integrated circuit inspection.

Abstract: Disclosed is a method of inspecting a reticle defining a circuit layer pattern that is used within a corresponding semiconductor process to generate corresponding patterns on a semiconductor wafer. A test image of the reticle is provided, and the test image has a plurality of test characteristic values. A baseline image containing an expected pattern of the test image is also provided. The baseline image has a plurality of baseline characteristic values that correspond to the test characteristic values. The test characteristic values are compared to the baseline characteristic values such that a plurality of difference values are calculated for each pair of test and baseline characteristic values. Statistical information is also collected.

Abstract: A reusable circuit design for use with electronic design automation EDA tools in designing integrated circuits is disclosed, as well as reticle inspection and fabrication methods that are based on such reusable circuit design. The reusable circuit design is stored on a computer readable medium and contains an electronic representation of a layout pattern for at least one layer of the circuit design on an integrated circuit. The layout pattern includes a flagged critical region which corresponds to a critical region on a reticle or integrated circuit that is susceptible to special inspection or fabrication procedures. In one aspect of the reusable circuit design, the special analysis is performed during one from a group consisting of reticle inspection, reticle production, integrated circuit fabrication, and fabricated integrated circuit inspection.

Abstract: Disclosed is a method of inspecting a reticle defining a circuit layer pattern that is used within a corresponding semiconductor process to generate corresponding patterns on a semiconductor wafer. A test image of the reticle is provided, and the test image has a plurality of test characteristic values. A baseline image containing an expected pattern of the test image is also provided. The baseline image has a plurality of baseline characteristic values that correspond to the test characteristic values. The test characteristic values are compared to the baseline characteristic values such that a plurality of difference values are calculated for each pair of test and baseline characteristic values. Statistical information is also collected.

Abstract: A reusable circuit design for use with electronic design automation EDA tools in designing integrated circuits is disclosed, as well as reticle inspection and fabrication methods that are based on such reusable circuit design. The reusable circuit design is stored on a computer readable medium and contains an electronic representation of a layout pattern for at least one layer of the circuit design on an integrated circuit. The layout pattern includes a flagged critical region which corresponds to a critical region on a reticle or integrated circuit that is susceptible to special inspection or fabrication procedures. In one aspect of the reusable circuit design, the special analysis is performed during one from a group consisting of reticle inspection, reticle production, integrated circuit fabrication, and fabricated integrated circuit inspection.

Abstract: Disclosed is a method of inspecting a reticle defining a circuit layer pattern that is used within a corresponding semiconductor process to generate corresponding patterns on a semiconductor wafer. A test image of the reticle is provided, and the test image has a plurality of test characteristic values. A baseline image containing an expected pattern of the test image is also provided. The baseline image has a plurality of baseline characteristic values that correspond to the test characteristic values. The test characteristic values are compared to the baseline characteristic values such that a plurality of difference values are calculated for each pair of test and baseline characteristic values. Statistical information is also collected.

Abstract: By modifying the raster scanning mode of operation of an electron beam exposure system, it is practicable to directly define low-density features (100-102) in a relatively insensitive positive photoresist (10) that exhibits high resolution and good processing characteristics. As a result, it is feasible to utilize such a system as an adjunct in what is otherwise a photolithographic fabrication process to define certain critical features of a microminiature device.

Abstract: In fabricating very-high-resolution devices with a lithographic tool such as an EBES machine, it is crucial that the planar mask or wafer members utilized therein be loaded into and maintained in the work chamber of the machine in a way that minimally affects their planarity. In accordance with the present invention this is accomplished by loading each member into a three-point-suspension cassette unit by means of a fixture that performs the loading in a precise and essentially stress-free manner.