Abstract: A laser machining system for machining a work-piece includes a laser scanning head, external optical subsystems, and an image acquisition device. The external optical subsystems correspond to optical channels that include a first optical channel and a second optical channel. The laser scanning head controls an optical path so that a laser beam is directed and focused on the work-piece through the first optical channel and the second optical channel at different times. The first optical channel and the second optical channel correspond to respective specific portions of the work-piece to be machined by the laser beam. The image acquisition device is positioned to view the work-piece through the optical path. The image acquisition device acquires via the first optical channel one or more images of the work-piece to determine a displacement of the work-piece with reference to a best optical focus position of the second optical channel.

Abstract: In one aspect, the present invention provides an imager, preferably portable, that includes a source of electromagnetic radiation capable of generating radiation with one or more frequencies in a range of about 1 GHz to about 2000 GHz. An optical system that is optically coupled to the source focuses radiation received therefrom onto an object plane, and directs at least a portion of the focused radiation propagating back from the object plane onto an image plane. The imager further includes a scan mechanism coupled to the optical system for controlling thereof so as to move the focused radiation over the object plane. A detector optically coupled to the lens at the image plane detects at least a portion of the radiation propagating back from a plurality of scanned locations in the object plane, thereby generating a detection signal. A processor that is in communication with the detector generates an image of at least a portion of the object plane based on the detection signal.

Abstract: In one aspect, the present invention provides an imager, preferably portable, that includes a source of electromagnetic radiation capable of generating radiation with one or more frequencies in a range of about 1 GHz to about 2000 GHz. An optical system that is optically coupled to the source focuses radiation received therefrom onto an object plane, and directs at least a portion of the focused radiation propagating back from the object plane onto an image plane. The imager further includes a scan mechanism coupled to the optical system for controlling thereof so as to move the focused radiation over the object plane. A detector optically coupled to the lens at the image plane detects at least a portion of the radiation propagating back from a plurality of scanned locations in the object plane, thereby generating a detection signal. A processor that is in communication with the detector generates an image of at least a portion of the object plane based on the detection signal.

Abstract: In one aspect, a measurement system is disclosed that includes a source of microwave radiation having one or more wavelengths capable of penetrating through a visibly opaque obstruction, e.g., a wall. The source can be movably positioned on one side of the obstruction for illuminating thereof. The system can further include a microwave reflecting element disposed on another side of the obstruction, where the reflecting element is capable of reflecting at least a portion of the radiation transmitted through the obstruction. A plurality of radiation sensors are positioned relative to the obstruction so as to differentially detect at least a portion of the reflected radiation transmitted through the obstruction so as to determine a position of the source relative to the reflective element.

Abstract: Embodiments of the present invention are directed to methods and systems for laser micro-machining, which may include dividing a long line illumination field into a plurality of individual fields, wherein each of the plurality of fields includes an aspect ratio of about 4:1 or greater, directing the plurality of individual fields onto at least one mask, wherein each individual field illuminates a corresponding area on the mask and translating the mask and/or workpiece relative to one another along a scan axis.

Abstract: In one aspect, the present invention provides an imager, preferably portable, that includes a source of electromagnetic radiation capable of generating radiation with one or more frequencies in a range of about 1 GHz to about 2000 GHz. An optical system that is optically coupled to the source focuses radiation received therefrom onto an object plane, and directs at least a portion of the focused radiation propagating back from the object plane onto an image plane. The imager further includes a scan mechanism coupled to the optical system for controlling thereof so as to move the focused radiation over the object plane. A detector optically coupled to the lens at the image plane detects at least a portion of the radiation propagating back from a plurality of scanned locations in the object plane, thereby generating a detection signal. A processor that is in communication with the detector generates an image of at least a portion of the object plane based on the detection signal.

Abstract: Embodiments of the present invention are directed to methods and systems for micromachining a conical surface. In one embodiment, such a system may include a rotating platform for receiving a long line of laser illumination, a mask having a predetermined pattern comprising a sector of a planar ring, the mask being positioned on the rotating platform, a workpiece stage having a rotational axis for rotating a removably-affixed workpiece comprising a conical surface, wherein the sector comprises the planar image of the conical surface, an excimer laser for producing a laser beam, a homogenizer for homogenizing the laser beam in at least a single direction, at least one condenser lens, a turning mirror and at least one projection lens.

Abstract: Embodiments of the present invention are directed to methods and systems for micromachining a conical surface. In one embodiment, such a system may include a rotating platform for receiving a long line of laser illumination, a mask having a predetermined pattern comprising a sector of a planar ring, the mask being positioned on the rotating platform, a workpiece stage having a rotational axis for rotating a removably-affixed workpiece comprising a conical surface, wherein the sector comprises the planar image of the conical surface, an excimer laser for producing a laser beam, a homogenizer for homogenizing the laser beam in at least a single direction, at least one condenser lens, a turning mirror and at least one projection lens.

Abstract: In one aspect, the present invention provides an imager, preferably portable, that includes a source of electromagnetic radiation capable of generating radiation with one or more frequencies in a range of about 1 GHz to about 2000 GHz. An optical system that is optically coupled to the source focuses radiation received therefrom onto an object plane, and directs at least a portion of the focused radiation propagating back from the object plane onto an image plane. The imager further includes a scan mechanism coupled to the optical system for controlling thereof so as to move the focused radiation over the object plane. A detector optically coupled to the lens at the image plane detects at least a portion of the radiation propagating back from a plurality of scanned locations in the object plane, thereby generating a detection signal. A processor that is in communication with the detector generates an image of at least a portion of the object plane based on the detection signal.

Abstract: In one aspect, the present invention provides an imager, preferably portable, that includes a source of electromagnetic radiation capable of generating radiation with one or more frequencies in a range of about 1 GHz to about 2000 GHz. An optical system that is optically coupled to the source focuses radiation received therefrom onto an object plane, and directs at least a portion of the focused radiation propagating back from the object plane onto an image plane. The imager further includes a scan mechanism coupled to the optical system for controlling thereof so as to move the focused radiation over the object plane. A detector optically coupled to the lens at the image plane detects at least a portion of the radiation propagating back from a plurality of scanned locations in the object plane, thereby generating a detection signal. A processor that is in communication with the detector generates an image of at least a portion of the object plane based on the detection signal.

Abstract: An apparatus and method of determining location of an object hidden from view. The apparatus includes an imaging tool for detecting hidden objects. The imaging tool includes a housing including a first end and a second end, a display supported by the first end of the housing, and a tracking device supported by the second end of the housing. The imaging tool also includes a transmitter supported by the housing and operable to transmit electromagnetic radiation toward a hidden target, an analysis module supported by the housing and operable to analyze feedback data related to the interaction between the target and the electromagnetic radiation, and an image module operable to receive data from the analysis module to generate an image on the display.

Abstract: In one aspect, the present invention provides an imager, preferably portable, that includes a source of electromagnetic radiation capable of generating radiation with one or more frequencies in a range of about 1 GHz to about 2000 GHz. An optical system that is optically coupled to the source focuses radiation received therefrom onto an object plane, and directs at least a portion of the focused radiation propagating back from the object plane onto an image plane. The imager further includes a scan mechanism coupled to the optical system for controlling thereof so as to move the focused radiation over the object plane. A detector optically coupled to the lens at the image plane detects at least a portion of the radiation propagating back from a plurality of scanned locations in the object plane, thereby generating a detection signal. A processor that is in communication with the detector generates an image of at least a portion of the object plane based on the detection signal.

Abstract: In one aspect, a measurement system is disclosed that includes a source of microwave radiation having one or more wavelengths capable of penetrating through a visibly opaque obstruction, e.g., a wall. The source can be movably positioned on one side of the obstruction for illuminating thereof. The system can further include a microwave reflecting element disposed on another side of the obstruction, where the reflecting element is capable of reflecting at least a portion of the radiation transmitted through the obstruction. A plurality of radiation sensors are positioned relative to the obstruction so as to differentially detect at least a portion of the reflected radiation transmitted through the obstruction so as to determine a position of the source relative to the reflective element.

Abstract: Methods and apparatus are provided for automatically tuning a charged particle beam system, such as an ion implanter. In one embodiment, a control parameter of a control component located upstream of a target component is modulated, and the beam current downstream of the target component is measured. The beam current measurements provide information that is used to evaluate tuning and, if necessary, to adjust the target component. The target component is typically a slow response component, such as a magnet. In another embodiment, evaluation of tuning is performed by modulating the target parameter and monitoring the effect of such modulation on the beam current. In a further embodiment, the spot size of the charged particle beam is evaluated by scanning the beam across the edge of an aperture and evaluating the sharpness of the beam focus. The tuning algorithms are preferably implemented in localized power supply interfaces for high speed operation.

Abstract: Embodiments of the present invention are directed to an illuminating optical device for forming a field of illumination. The optical device includes a first one-dimensional homogenizer positioned to homogenize a first dimension/axis of the field of illumination and a second one-dimensional homogenizer positioned to homogenize a second dimension/axis of the field of illumination.

Abstract: Embodiments of the present invention are directed to an illuminating optical device for forming a field of illumination. The optical device includes a first one-dimensional homogenizer positioned to homogenize a first dimension/axis of the field of illumination and a second one-dimensional homogenizer positioned to homogenize a second dimension/axis of the field of illumination.

Abstract: Methods and apparatus are provided for automatically tuning a charged particle beam system, such as an ion implanter. In one embodiment, a control parameter of a control component located upstream of a target component is modulated, and the beam current downstream of the target component is measured. The beam current measurements provide information that is used to evaluate tuning and, if necessary, to adjust the target component. The target component is typically a slow response component, such as a magnet. In another embodiment, evaluation of tuning is performed by modulating the target parameter and monitoring the effect of such modulation on the beam current. In a further embodiment, the spot size of the charged particle beam is evaluated by scanning the beam across the edge of an aperture and evaluating the sharpness of the beam focus. The tuning algorithms are preferably implemented in localized power supply interfaces for high speed operation.

Abstract: A system for aligning substrates when preparing flat panel displays by lithography. A spherical reflector (imaging mirror) is used to focus a small geometric object, such as a cross, etched at the center of the reflector. The cross is projected toward a beam splitter and is then reflected onto the mirror which, in turn, images it on the surface of the substrate being used in the lithographic process. This optical system, which has a numerical aperture of about 0.05 radians, provides maximum depth of field with essentially no aberrations, and produces a relatively large probe image on a large alignment mark.The surface of the substrate carries a grid of stepped patterns as an alignment mark. The steps diffract the light received, and the diffracted light passes through a lens system to a sensor associated with the lens system. The amount of light diffracted is dependent upon where the image strikes the steps in the grid.

Abstract: A direct reticle reference alignment system for use in photolithography for use with substrates having optical transmissivity. The system includes a movable stage (14), a transmissive substrate (11) held by the stage and bearing at least one plate mark (15) upon its upper surface, an optical system having a light source (1) for illuminating and projecting a reticle alignment image (4) upon the substrate (11) for alignment with the plate mark (15), a sensor (17) mounted in the stage (14) below the substrate (11) and the plate mark (15) to receive light from the projected alignment image (4), the sensor (17) producing an electrical signal related to the degree of alignment, and a stage control actuated by the signal to position the stage (14) and, so, align the substrate (11) with the reticle (4). The sensor (17) includes a light channel (19), such as a fiber optic rod, positioned to receive images from the lower surface (13) of said substrate ( 11) and carry them to the photocell.